Key Laboratory of Renewable Energy Advanced Materials and Manufacturing Technology of Ministry of Education of China

Kunming, China

Key Laboratory of Renewable Energy Advanced Materials and Manufacturing Technology of Ministry of Education of China

Kunming, China
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Duan L.,Key Laboratory of Renewable Energy Advanced Materials and Manufacturing Technology of Ministry of Education of China | Duan L.,Yunnan Normal University | Zhang L.,Key Laboratory of Renewable Energy Advanced Materials and Manufacturing Technology of Ministry of Education of China | Zhang L.,Yunnan Normal University | And 8 more authors.
Taiyangneng Xuebao/Acta Energiae Solaris Sinica | Year: 2015

Amorphous silicon (α-Si)/aluminum (Al) films were prepared by magnetron sputtering based on glass and monocrystalline silicon substrate at different temperatures, and then annealed by RTA in N2 atmosphere. X-ray diffraction (XRD) instrument and Raman scattering were used to analyse the structure and properties of μc- Si films. The results showed that monocrystalline silicon substrate and heating can improve the crystallization of α-Si/Al films; The crystalline volume fraction of μc-Si films increased with the increasing of substrate temperature from ambient to 200 ℃. And then crystalline volume fraction decreased with increasing of substrate temperature from 200 ℃ to 250 ℃. α-Si/Al films can be crystallized in the substrate of monocrystalline silicon with substrate temperatures 200 ℃. The effects of substrate parameters on crystallization rate, grain size, band gap and the volume fraction of interface were obtained by calculating. ©, 2015, Science Press. All right reserved.

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