Key Laboratory of Artificial Micro and Nano Structures of the Ministry of Education

Wuhan, China

Key Laboratory of Artificial Micro and Nano Structures of the Ministry of Education

Wuhan, China

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Zou X.,Key Laboratory of Artificial Micro and Nano Structures of the Ministry of Education | Zou X.,Jianghan University | Fang G.,Key Laboratory of Artificial Micro and Nano Structures of the Ministry of Education | Qin P.,Key Laboratory of Artificial Micro and Nano Structures of the Ministry of Education | And 5 more authors.
Thin Solid Films | Year: 2013

The electrical characteristics and reliability of Hf-In-Zn-O (HIZO) metal-oxide-semiconductor capacitors (MOSCAPs) with a microporous SiO 2-based electric-double-layer (EDL) dielectric were investigated. Experimental results indicated that the HfO2 interlayer could effectively improve the interface quality, thus leading to reduced interface states, suppressed hysteresis and decreased gate leakage current. Improved performance was achieved for the HIZO MOSCAPs with HfO2/EDL stack gate dielectrics (HECAPs), such as a large capacitance density of 0.7 μF/cm2, an interface state density of 5.7 × 1011 eV-1/cm2, a fixed charge density of 1.9 × 10 12 cm-2, a hysteresis voltage of 230 mV and a gate leakage current density of 3 × 10-6 A/cm2 at +1 V. Moreover, enhanced reliability of the HECAPs was obtained with an elevated dielectric breakdown voltage of 4.8 V and a small increase (b 15 %) of gate leakage after gate bias stressing at 2 V for 3600 s. © 2013 Elsevier B.V. All rights reserved.

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