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Ding T.,Key Laboratory of Advanced Microstructure Materials | Xie Y.,Key Laboratory of Advanced Microstructure Materials | Shen Z.,Key Laboratory of Advanced Microstructure Materials | Cheng X.,Key Laboratory of Advanced Microstructure Materials | Wang Z.,Tongji University
Optical Engineering | Year: 2014

Micron and submicron scale artificial silica spheres were used to quantitatively detect the ultrasonic cleaning procedure for an ultrasmooth optical substrate. Silica spheres with sizes from 1 to 3 μ m were explored to efficiently reduce the ultrasonic power for ultrasonic frequencies of 40, 80, and 120 kHz. On account of submicron silica spheres with sizes from 0.3 to 1.0 μm, the cleaning efficiencies for the ultrasonic frequencies of 170, 220, and 270 kHz were quantity evaluated, and the removal efficiency was effectively increased by employing a solution of NH4OH, H2O2, and deionized water with an optimized configuration. Furthermore, for the range from 40 to 270 kHz, according to investigations of the ultrasonic time, the particles' removal process was explored during the ultrasonic treatments, and the damages of ultrasound on the ultrasmooth substrate within the ultrasonic time were also detected. The quantitative results give us many clues for realizing the optimization of an ultrasonic cleaning procedure for ultrasmooth optical substrates. © 2014 Society of Photo-Optical Instrumentation Engineers. Source


Lu M.,Key Laboratory of Advanced Microstructure Materials | Lu M.,Tongji University | Ma B.,Key Laboratory of Advanced Microstructure Materials | Ma B.,Tongji University | And 6 more authors.
Optical Engineering | Year: 2014

The cracks and scratches inevitably generated by previous grinding and polishing significantly lower the ability of laser resistance of optical substrates. In this study, the artificial indentations, scratches, and structural defects imbedded with metal nanoparticles are fabricated. The laser-induced damage characteristics of such defects in different types and sizes are investigated qualitatively and quantitatively under 1064-nm laser irradiation. Moreover, the etching effect on improving the laser-induced damage threshold (LIDT) of artificial defects under different etching conditions is analyzed. LIDT is then evaluated according to the etching depth and the morphologies of artificial defects. © 2014 Society of Photo-Optical Instrumentation Engineers. Source


Zhang J.,Key Laboratory of Advanced Microstructure Materials | Zhang J.,Tongji University | Xie Y.,Key Laboratory of Advanced Microstructure Materials | Xie Y.,Tongji University | And 6 more authors.
Applied Optics | Year: 2013

We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match layers can effectively suppress the sidelobes of the passband. Using this approach, we can design minus filters with layer thicknesses close to half-wave of the rejection wavelength, making this method well suited for accurate monitoring during the deposition. © 2013 Optical Society of America. Source

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