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Jiang L.,Tongji University | Wang Z.,Key Laboratory of Advanced Micro Structure Materials
Optics InfoBase Conference Papers | Year: 2013

A bi-functional multilayer was designed by optimizing the thickness of several layers that were close to the air-film interface. The multilayer structure was evaluated by comparison with another result obtained by optimizing all layer thickness. © OSA 2013. Source


Zhang J.,Key Laboratory of Advanced Micro Structure Materials | Zhang J.,Tongji University | Tikhonravov A.V.,Moscow State University | Liu Y.,Key Laboratory of Advanced Micro Structure Materials | And 5 more authors.
Optics Express | Year: 2014

We present the whole design-production chain of an ultra-steep hot mirror produced using the indirect monochromatic monitoring technique. The hot mirror without thin layers is designed utilizing the stochastic optimization procedure that takes in account upper and lower constraints for layer optical thickness. We produced the hot mirror with the ion-assisted electron beam deposition technique using indirect monochromatic monitoring strategy, performed reverse engineering of the deposited coatings, and illustrated that the random variation of the tooling factors in low-index layers is the main factor causing production errors. We modified the monitoring strategy with low-index layers monitored by quartz crystal monitor, and demonstrated the excellent correspondence to the theoretical spectral performance. © 2014 Optical Society of America. Source


Liu Y.,Tongji University | Liu Y.,Key Laboratory of Advanced Micro Structure Materials | Zhang J.,Tongji University | Zhang J.,Key Laboratory of Advanced Micro Structure Materials | And 2 more authors.
Guangxue Xuebao/Acta Optica Sinica | Year: 2014

Reflectance and transmittance are main optical property of optical thin films. Transmittance is easier to be measured and has a higher accuracy than reflectance. Therefore, it's frequently used to fit the optical constant and thickness of the film. Many coatings work in the oblique incidence case in application, and its oblique transmittances Ts and Tp are needed. A perfect polarizer with high extinction ratio is needed in this case. However, it costs too much for the compact spectrophotometer to provide such a polarizer. In order to solve this problem, rotation-incidence-plane (RIP) method is investigated deeply and generalized. Because RIP method makes measurement with a partially polarized beam, and the output beam of the spectrophotometer is partially polarized, RIP method can measure the oblique transmittance under certain condition. Advanced investigation found that if the absolute value of the polarization factor of the measurement beam is bigger than 0.167 the RIP method can make an accurate measurement about the oblique transmittance of optical coatings, and the polarization factor bigger the accuracy higher. This method has a good accuracy in the wavelength region, in which the transmittance is nearly flat or not sensitive very much to the incidence angle, when it's used to measure the Ts and Tp. What's more, the method has a better accuracy when it's used to measure the average transmittance. Source


Zhang J.,Key Laboratory of Advanced Micro Structure Materials | Zhang J.,Tongji University | Tikhonravov A.V.,Moscow State University | Trubetskov M.K.,Max Planck Institute of Quantum Optics | And 6 more authors.
Optics Express | Year: 2013

We present the design and production approach of an ultra-steep notch filter. The notch filter that does not have thin layers is optimized utilizing the constrained optimization technique, and this is well suitable for accurate monitoring with the electron beam deposition technique. Single layer SiO 2 and Ta2O5 films were deposited and carefully characterized in order to determine tooling factors and refractive indices wavelength dependencies accurately. We produced the ultra-steep notch filter with indirect monochromatic monitoring strategy and demonstrated the excellent correspondence to the theoretical spectral performance. © 2013 Optical Society of America. Source


Jiang Y.,Key Laboratory of Advanced Micro Structure Materials | Jiang Y.,Tongji University | Jiang Y.,Tianjin Jinhang Institute of Technical Physics | Liu H.,Tianjin Jinhang Institute of Technical Physics | And 8 more authors.
Applied Optics | Year: 2014

SiO2films were deposited on fused silica, silicon, glass, germanium, and sapphire substrates by an ion beam sputtering technique. The optical properties of SiO2films on different substrates and interfacial layer properties between SiO2films and different substrates were researched by the spectroscopic ellipsometry technique. The refractive indices of SiO2films deposited on different substrates are about 1.477 at the wavelength of 632.8 nm. The optical anisotropy property of SiO2films on fused silica substrate is the best. The impact of thermal treatment on surface roughness and interfacial layer properties between SiO2films and Si substrates were also investigated. When the annealing temperature is 550°C, the least surface thickness and thinnest interface layer thickness between SiO2films and silicon substrate can be achieved. The results indicate that the surface and interface layer properties between SiO2films and silicon substrate can be greatly improved when the optimum annealing temperature is selected. © 2013 Optical Society of America. Source

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