Key Laboratory of Advanced Micro Structural Materials

Shanghai, China

Key Laboratory of Advanced Micro Structural Materials

Shanghai, China
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Xu D.,Key Laboratory of Advanced Micro Structural Materials | Huang Q.,Key Laboratory of Advanced Micro Structural Materials | Wen M.,Tongji University | Wang Z.,Tongji University
Thin Solid Films | Year: 2015

The extreme ultraviolet (EUV) performance of Mo/Y multilayer mirrors is known to be dependent on the base pressure before deposition. In this work, Mo/Y multilayers were fabricated at non-ultrahigh vacuum system with a base pressure of 8.0×10-4 Pa to 2.0×10-5 Pa. The multilayer structure and corresponding EUV reflectance were measured while a maximum value of 36% was achieved at λ=11.3nm (E=110eV). Thermal stability of the fabricated multilayer was studied by annealing the sample at different temperatures from 100°C to 500°C. Grazing incidence X-ray reflectance measurements and high resolution transmission electron microscopy revealed that the layered structure and its hard X-ray reflectivity were preserved although the interface area was increased at elevated temperatures. The broadened interfaces can be explained by a solid state amorphization effect. Unlike the reported results before, the multilayer period was almost constant during annealing up to 500°C, indicating a better thermal stability. © 2015.


Xu D.,Key Laboratory of Advanced Micro Structural Materials | Huang Q.,Key Laboratory of Advanced Micro Structural Materials | Huang Q.,Tongji University | Wen M.,Key Laboratory of Advanced Micro Structural Materials | Wang Z.,Key Laboratory of Advanced Micro Structural Materials
Thin Solid Films | Year: 2015

The extreme ultraviolet (EUV) performance of Mo/Y multilayer mirrors is known to be dependent on the base pressure before deposition. In this work, Mo/Y multilayers were fabricated at non-ultrahigh vacuum system with a base pressure of 8.0 × 10- 4 Pa to 2.0 × 10- 5 Pa. The multilayer structure and corresponding EUV reflectance were measured while a maximum value of 36% was achieved at λ = 11.3 nm (E = 110 eV). Thermal stability of the fabricated multilayer was studied by annealing the sample at different temperatures from 100 °C to 500 °C. Grazing incidence X-ray reflectance measurements and high resolution transmission electron microscopy revealed that the layered structure and its hard X-ray reflectivity were preserved although the interface area was increased at elevated temperatures. The broadened interfaces can be explained by a solid state amorphization effect. Unlike the reported results before, the multilayer period was almost constant during annealing up to 500 °C, indicating a better thermal stability. © 2015 Elsevier B.V.

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