Yokkaichi, Japan
Yokkaichi, Japan

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A chemically amplified resist material contains: (1) a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the polymer component (1) contains a first polymer having a first structural unit that includes a fluorine atom and does not include a salt structure, or a second polymer having a second structural unit that includes a fluorine atom and a salt structure, and wherein the component (2) contains component (a), any two of components (a) to (c), or all of components (a) to (c).


An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R^(1 )represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R^(2 )and R^(3 )each independently represent a monovalent hydrocarbon group, or the like. R^(4 )and R^(5 )each independently represent a monovalent hydrocarbon group, or the like. R^(6 )and R^(7 )each independently represent a monovalent hydrocarbon group, or the like. R^(8 )represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R^(9 )represents a monovalent hydrocarbon group, or the like. R^(10 )represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R^(11 )and R^(12 )each independently represent a monovalent hydrocarbon group, or the like. R^(13 )and R^(14 )each independently represent a monovalent hydrocarbon group, or the like.


Patent
JSR Corporation | Date: 2017-05-03

Provided is an affinity chromatography carrier that suppresses nonspecific adsorption of impurities, suppresses a decrease in dynamic binding capacity due to long-term storage, and has high storage stability. The affinity chromatography carrier includes a solid support including a copolymer including (M-1) more than 20 parts by mass and 99.5 parts by mass or less of a structural unit derived from an epoxy group-containing monovinyl monomer with respect to and (M-2) 0.5 to 80 parts by mass of a structural unit derived from a polyvinyl monomer with respect to all structural units; ring-opened epoxy groups obtained by subjecting the epoxy groups to the ring-opening ; and a ligand coupled to the solid support, and is such that after a certain column vessel is packed with the affinity chromatography carrier and then purged with a 2 M NaCl-containing 20 mM sodium phosphate buffer with a pH of 7.5, allowing the column to stand at 40C for 7 days increases pH in the column by at most 2.


Patent
JSR Corporation | Date: 2017-01-10

A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R^(1 )to R^(4 )each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R^(1 )to R^(4 )has the fluorine atom or a group including the fluorine atom. R^(5 )represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).


A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R^(1 )to R^(4 )preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R^(5 )to R^(8 )preferably represents a monovalent carbon-carbon triple bond-containing group.


Patent
JSR Corporation | Date: 2017-05-24

A composition improves mechanical strength (e.g., impact resistance and flexural strength), and achieves improved mass productivity by reducing a situation in which a strand fuzzes during extrusion. The composition includes a conjugated diene-based polymer (A), fibers (B), and a thermoplastic resin (C), the composition including the conjugated diene-based polymer (A) in a ratio of 0.05 to 30 parts by mass based on 100 parts by mass of the thermoplastic resin (C), and including the fibers (B) in a ratio of 3 to 150 parts by mass based on 100 parts by mass of the thermoplastic resin (C), wherein the conjugated diene-based polymer (A) includes at least one functional group selected from the group consisting of an alkoxysilyl group and an amino group.


A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.


Patent
JSR Corporation | Date: 2017-03-16

A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.


Patent
JSR Corporation | Date: 2017-03-16

A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R^(1 )represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents COOH. In a case where n is 2 to 4, X represents OH, COOH, NCO, NHR^(a), COOR^(A )or COC(R^(L))_(2)COR^(A). R^(1)X)_(n)(1)


Patent
JSR Corporation | Date: 2017-05-31

A hydrogenated diene polymer composition comprises (A) a first hydrogenated diene polymer having a weight average molecular weight (Mw) of 100,000 to 1,700,000, a molecular weight distribution (Mw/Mn) of 1.0 to 3.0, and a hydrogenation degree of 72 to 96%, the first hydrogenated diene polymer (A) being obtained by hydrogenating the first diene polymer which has a vinyl bond content of 20 to 70%, and (B) a first filler. The hydrogenated diene polymer composition contains the first filler (B) in an amount of 5 to 100 parts by mass per 100 parts by mass of the first hydrogenated diene polymer (A).

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