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Wang L.,Tokyo Institute of Technology | Hayakawa T.,Tokyo Institute of Technology | Yoshida K.,JNC Petrochemical Corporation Ichihara
Journal of Photopolymer Science and Technology | Year: 2014

Two series of DDSQ (double-decker silsesquioxane)-containing oligomers were synthesized and their self-aggregation behaviors were investigated. Result shows that DDSQ-(C18-2A) could form well-organized lamellar structure with a d-spacing 8.2 nm. Considering the demand of microelectronic industry, this branched alkylated DDSQ may serve as an excellent candidate for the next generation fabricating materials. © 2014SPST.

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