JENOPTIK Optical Systems GmbH | Date: 2016-09-29
An adjustable lens mount with an outer mount ring, a laterally adjustable inner mount ring and at least two connection structures. The at least two connection structures communicate in each instance with a manipulator with a radial acting axis. The connection structures in each instance have a coupling member and a lever connected therewith. The coupling member is connected to the inner mount ring farther radially outside than the lever is connected to the outer mount ring.
JENOPTIK Optical Systems GmbH | Date: 2016-09-22
Optical mount assembly comprising a lens mount with a plurality of retaining arms (3.1) which are arranged in a rotationally symmetrical manner and with a lens (1) which is connected via its cylindrical circumferential surface (1.1) to the retaining arms (3.1) in each instance via at least two adhesive areas (4.1) within a joint area (4). The retaining arms (3.1) have within the joint area (4) a slot structure with at least one slot (5.2) which is filled with adhesive during assembly and proceeding from which the adhesive is transported into the adhesive gap (6) and which forms the adhesive areas (4.1).
JENOPTIK Optical Systems GmbH | Date: 2016-09-21
A stiffened lens mount with an outer mount ring having an axis of symmetry, an inner mount ring arranged coaxial to the outer mount ring and connection structures. The inner mount ring has at least one end face arranged perpendicular to the axis of symmetry, and a coaxially arranged stiffening ring fixedly connected to the inner mount ring via the at least one end face along an imaginary circle.
JENOPTIK Optical Systems GmbH | Date: 2016-09-21
A monolithic lens mount is formed by an annular body which is divided through material recesses into an outer mount ring, an inner mount ring and three connection structures which are arranged so as to be offset by 120 relative to one another. The connection structures in each instance form a chain of at least three, preferably five, connection webs which transition into one another and which are constructed as radial connection webs and axial connection webs. The axial flexural stiffness and radial flexural stiffness and the torsional stiffness of the connection structures can be determined via the dimensioning of the radial connection webs and axial connection webs.
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015
The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.
JENOPTIK Optical Systems GmbH and Micro Hybrid Electronic GmbH | Date: 2015-11-12
A method for production of window elements which can be soldered into a housing in a hermetically tight manner with optical coating and free-form window elements are disclosed. After application of optical coatings, a protective layer is applied to the optical coating, the two layer systems are selectively removed by means of a machining beam of high-energy radiation for the purpose of ablation of a desired optically active free-form surface for window elements with any geometric shape through a localized machining beam in edge regions of the optically active free-form surface such that the protective layer remains on the optical coating as lift-off mask which is lifted off after applying a metallization for a solder layer by an etching process that acts selectively only on the protective layer but not on the optical coating, and the metallization remains only on the peripheral edge regions circumscribing the free-form surfaces.
Jenoptik Optical Systems Gmbh | Date: 2015-02-20
A lens mount for radially fixing, or for radially adjusting and fixing, in a lens tube, having a mounting ring in which tangentially running first slots form cylindrical segments which, during the operation of turning the external diameter of the mounting ring to a nominal dimension are deformed by a screw by a width of the first slots, and therefore the circumferential surface of the mounting ring is not turned, at least in part, along the segment and the external diameter has an oversize.
JENOPTIK Optical Systems GmbH | Date: 2014-08-28
A device and method for measuring a power density distribution of a radiation source is provided. The device includes a radiation source designed to emit a light beam in a radiation direction; a substrate disposed downstream of the radiation source in the radiation direction and having an extent in an x-direction and a y-direction, the substrate having a first region and at least one further second region, and the first region comprises a diffractive structure designed to separate the light beam impinging on the substrate into a zeroth order of diffraction and at least one first order of diffraction; and a detector unit disposed downstream of the substrate in the radiation direction and designed to measure the intensity of the first order of diffraction transmitted through the substrate and to derive a power density distribution therefrom.
JENOPTIK Optical Systems GmbH | Date: 2014-07-16
An F-theta objective is provided that has five individual lenses with a first individual lens as biconcave lens with a focal length, a second individual lens as meniscus with a focal length, a third individual lens as meniscus with a focal length, a fourth individual lens as a biconvex lens with a focal length and a fifth individual lens as a plano-convex lens with a focal length and a total focal length f of the F-theta objective. A ratio between the focal lengths to the total focal lengthsatisfies predetermined conditions.
JENOPTIK Optical Systems GmbH | Date: 2015-07-15
A lens mount with a mount ring (1) having a mount ring axis (1.1), at which mount ring (1) is provided an edge support (1.2) which is radially extended with respect to the mount ring axis (1.1), with a round optical component (2) which contacts the edge support (1.2) by an end face and with an intermediate ring (3) which contacts the other end face of the optical component (2) and which is fixed in position opposite the mount ring (1), e.g., by means of a screw ring (4.1). Three point-shaped first protuberances (1.3) and second protuberances (3.3), respectively, are provided at the edge support (1.2) and at the intermediate ring (3) in each instance on an imaginary circular ring (1.4) of identical size at angular distances relative to one another, and one each of the first protuberances (1.3) and one each of the second protuberances (3.3) lie in each instance on an imaginary straight line (5) running parallel to the mount ring axis (1.1) through the edge region (2.2).