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Not Found, Germany

Trademark
Jenoptik Optical Systems Gmbh and Jenoptik Laser | Date: 2005-05-24

Electronic video cameras, digital LCD cameras and scanners.


Trademark
Jenoptik Optical Systems Gmbh | Date: 2014-11-25

Cameras, particular digital cameras, CCD (Charged Coupled Device) cameras; photographic apparatus; image analysis devices, in particular image analysis cameras; electronic image processing devices, electronic image recording devices, image storage devices and image display devices; microscope cameras; microscope cameras for medical purposes and as laboratory devices in forensics and clinical laboratories; microscope accessories, included in this class; scientific measurement, signal, control and testing devices and instruments as laboratory equipment; cameras photography as laboratory equipment in criminological laboratories; scientific laboratory instruments and devices for measuring, signal, control and testing devices in the medical field; computer software for the fields of photography, graphics, printing, pre-press and archival storage. Computer software design, in particular for digital image recording devices, image storage devices and image display devices; computer programming; software consultancy; conversion of computer programs and data not physical conversion; installation and maintenance of software.


Trademark
Jenoptik Optical Systems Gmbh | Date: 2012-11-06

Cameras, namely, CCD-cameras; image analysis devices, namely, image analysis cameras; electronic image processing devices, namely, multifunction electronic devices for use in copying, printing, scanning, video capturing and/or transmitting documents and images; electronic cards for processing images; electronic image recording device, namely, camera recorders, digital video recorders; video recorders; image storage devices and image display devices, namely, video players, computer storage devices, namely, blank flash drives; flat panel display screens; LCD large-screen displays; microscope cameras; microscope accessories, namely, microscope illuminating devices; microscope condensers; scientific measurement, signal, control and testing devices and instruments as laboratory equipment; cameras as laboratory equipment in criminological laboratories, medical measurement, signal, control and testing devices and instruments as laboratory equipment; cameras as laboratory equipment in forensic medicine and clinical laboratories. Cameras for medical purposes.


Grant
Agency: Cordis | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.

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