Nordt S.,German Institute of Polymers |
Pasch H.,Stellenbosch University |
Radke W.,German Institute of Polymers
Microsystem Technologies | Year: 2010
Epoxy resin based negative photo resists are showing interesting properties which are useful for a series of applications in electronic industries (Mark et al. in Encyclopedia of polymer science and engineering, Wiley, New York, 1986; Potter in Epoxide resins, Springer, New York, 1970; May and Tanka in Epoxy resin chemistry and technology, Marcel Dekker, New York, 1973; Bauer in Epoxy resin chemistry, vol 114, American Chemical Society, Washington, 1979; Hood in RAPRA Rev Rep 38:4, 1990). Especially in micro system technologies they promise a high potential. To adjust the properties for the particular application modification of the chemical composition and crosslinker system must be performed. An actual problem is the constancy in behaviour during the LIGA-process of the resist mixture. In this work analytical techniques are used to get a detailed insight into the chemical composition of a commercial available epoxy novolac resin. Methods like size exclusion chromatography (SEC), matrix assisted laser desorption-time of flight (MALDI-ToF) and fourier transform infrared spectroscopy (FTIR) offer information about the molecular weight and functionality. The results reveal a distribution in molecular weight and functionality. Due this the resin was chemically modified. After processing a dependency of molecular weight and therefore the amount of epoxy groups existent was obtained. © 2010 Springer-Verlag.