Institute Nanoestruturas

Caparica, Portugal

Institute Nanoestruturas

Caparica, Portugal
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Neagu E.R.,Institute Nanoestruturas | Neagu E.R.,Technical University Gheorghe Asachi | Neagu R.M.,Technical University Gheorghe Asachi | Dias C.J.,Institute Nanoestruturas | And 2 more authors.
Journal of Non-Crystalline Solids | Year: 2010

The measured isothermal charging and discharging currents are analyzed either in terms of polarization mechanisms or in terms of charge injection/extraction at the metal-dielectric interface and the conduction current through the dielectric material. We propose to measure the open-circuit isothermal charging and discharging currents just to overpass the difficulties related to the analysis of the conduction mechanisms through the dielectric materials. Besides a polarization current, there is a current related with charge injection or extraction at the metal-dielectric contact and a reverse current related to the charge trapped into the superficial trap states of the dielectric and that can jump at the interface in a reverse way. By fitting the experimental data, two important parameters can be determined (i) the highest value of the relaxation time for the polarization mechanisms still involved into the transient current and (ii) the height W0 of the potential barrier at the metal-dielectric interface immediately after the step voltage is applied. Only the initial part of the measured isothermal charging or discharging current can be used to obtain information about the polarization processes. By transforming the time-domain data into the frequency domain, a maximum for the imaginary part of the dielectric permittivity is obtained, in good agreement with the data obtained from AC dielectric measurements and the finally thermally stimulated discharge current measurements. © 2009 Elsevier B.V. All rights reserved.


PubMed | Institute Nanoestruturas
Type: Journal Article | Journal: Journal of nanoscience and nanotechnology | Year: 2010

Opposite results concerning the sign of the parasitic charge accumulated at the metal dielectric contact in RF microelectromechanical systems (MEMS) capacitive switches are found in the literature. The mechanism concerning charge injection/extraction at the metal-dielectric contact and its influence on the pull-in voltage needs to be further clarified. A model-switch, for which only one dimension is in the microns range, is used to study the behaviour of a capacitive RF MEMS switch. The aim is to analyze how the electric charge is injected/extracted into or from the dielectric material under the applied field and to obtain realistic data to understand how this parasitic charge influences the pull-in voltage Vpi and the pull-off voltage Vpo. A triangle voltage is employed to measure Vpi and Vpo, by measuring the isothermal charging/discharging currents. Our results demonstrate that Vpi is strongly dependent on the injected/extracted charge on the free surface of the dielectric. The charge injected/extracted at the bottom side of the dielectric has no influence on the actuation voltage. The charge injected/extracted on the free surface of the dielectric determines an increase of the modulus of Vpi and, eventually, the switch can fail to actuate. An estimation of the charge stored into the material was obtained (i) by measuring the charging current and the discharging current and (ii) from the value of the Vpi. The parasitic charge necessary to keep the bridge stick to the insulator is 5.3 x 10(-4) C m(-2) for our experimental conditions. The modification of the Vpi determined by the stored charge in the dielectric is analyzed. An increase of the relative dielectric permittivity by a factor of 2 produces a decrease of the actuation voltage of 10%. A variation of 30% in the elastic constant determines a variation of about 20% in the Vpi. A voltage threshold for charge injection/extraction was not observed.

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