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Cadarso V.J.,Institute Microelectrnica Of Barcelona Imb Cnm Csic | Cadarso V.J.,Ecole Polytechnique Federale de Lausanne | Llobera A.,Institute Microelectrnica Of Barcelona Imb Cnm Csic | Villanueva G.,Institute Microelectrnica Of Barcelona Imb Cnm Csic | And 3 more authors.
Sensors and Actuators, A: Physical | Year: 2010

A system of two solid microlenses with uncoupled optical properties is presented. This structure has been designed in order to have one lens as a reference, while the other one can be mechanically tuneable. The reference lens presents a diameter of 2 μm and it is placed in the optical axis of the mechanically tuneable lens, which has a diameter of 10 μm. The proposed microoptical structure has been fabricated in poly(dimethilsiloxane) (PDMS) merging deep reactive ion etching, SU-8 and soft lithography, with a low-cost (mass-production), simple and highly repetitive technology. This device was numerically simulated prior to its fabrication, to optimize its design and improve its behaviour. In addition, an optical characterization of the fabricated devices was carried out. Both simulation and experimental results shows a good agreement, under mechanical actuation behaviour of the reference lens is invariable, while the tuneable lens become an elliptic lens and the interval of Sturm can be observed. These results provide a proof of concept of the proposed devices and validate both the design and the fabrication technology. © 2010 Elsevier B.V. All rights reserved.


Tosolini G.,Institute Microelectrnica Of Barcelona Imb Cnm Csic | Villanueva L.G.,California Institute of Technology | Perez-Murano F.,Institute Microelectrnica Of Barcelona Imb Cnm Csic | Bausells J.,Institute Microelectrnica Of Barcelona Imb Cnm Csic
IEEE International Conference on Microelectronic Test Structures | Year: 2012

In this work we present the development of a new set-up that allows on-wafer sensitivity characterization of piezoresistive cantilevers. In this way we reduce considerably the testing time compared to the techniques available up to date but at the same time we maintain a high measurement precision. Moreover it can be easily used for characterization of broad types of batch fabricated micro- and nanoelectromechanical systems (MEMS and NEMS). Together with the sensitivity measurement we present also the methods to test the cantilever spring constant and the electrical noise. Using these techniques we measured the performance of multiple piezoresistive cantilevers in two wafers and from these values we extracted important fabrication materials parameters such as Young modulus, Hooge and piezoresistive factors. © 2012 IEEE.

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