Institute Estudos Avancados CTA

São José dos Campos, Brazil

Institute Estudos Avancados CTA

São José dos Campos, Brazil
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Mansano R.D.,University of Sao Paulo | Mousinho A.P.,University of Sao Paulo | Mousinho A.P.,Institute Estudos Avancados CTA
Physica Status Solidi (C) Current Topics in Solid State Physics | Year: 2012

In this work, we deposited nano-structured diamond-like carbon (DLC) films by high density plasma chemical vapour deposition system (HDPCVD) and the study of mechanical stress of these films has been made using micro-Raman spectroscopy. Recently developed high-density plasma chemical vapour deposition techniques have made it possible to produce nano-structured DLC films with low surface roughness and high sp 3/sp 2 hybridization ratio. Thus, these parameters have been studied in this work. Nano-structured DLC films were obtained using four methods for the surface modification of the silicon wafers: diamond powder, surface roughness generated by plasma etching, surface roughness generated by wet chemical etching solution and reference sample (silicon wafer only submitted to a chemical clean). The samples were analysed by AFM and SEM, too. We related the mechanical stress with the position of G and D bands, creating a new method to analyze these films (analyzing the displacement of central position G band). Thus, the results obtained in this work, related the Raman spectroscopy bands with the mechanical stress in DLC films obtained with different surface topographies. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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