imecKapeldreef 753001 HeverleeBelgium

imecKapeldreef 753001 HeverleeBelgium

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Xu M.,ImecKapeldreef 753001 HeverleeBelgium | Bearda T.,ImecKapeldreef 753001 HeverleeBelgium | Radhakrishnan H.S.,ImecKapeldreef 753001 HeverleeBelgium | Filipic M.,ImecKapeldreef 753001 HeverleeBelgium | And 4 more authors.
Physica Status Solidi - Rapid Research Letters | Year: 2017

A detailed investigation of the laser damage to amorphous silicon (a-Si:H) layers patterned by laser ablation (LA) and wet chemical etching is presented. This approach can be applied to pattern the rear side of silicon heterojunction interdigitated back-contact solar cells. Only the top sacrificial a-Si:H laser-absorbing layer of an a-Si:H/SiOx/a-Si:H/c-Si stack is ablated. Laser damage in the bottom a-Si:H layer and a-Si:H/c-Si interface is analyzed by both scanning electron microscopy and transmission electron microscopy. We show that the a-Si:H/c-Si passivation is degraded by laser damage and that this degradation can be diminished by increasing laser processing speed. This is attributed to a decrease of laser-irradiated area, and particularly smaller overlapping zones of adjacent laser pulses. The re-passivation quality after LA and wet etching is similar to that of as-passivated samples. This indicates that laser damage is not present in the bulk c-Si substrate but only in the a-Si:H passivation layer, which is removed during subsequent wet etching, thus allowing high quality repassivation. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.


Breuil L.,imecKapeldreef 753001 HeverleeBelgium | Blomme P.,imecKapeldreef 753001 HeverleeBelgium | Meersschaut J.,imecKapeldreef 753001 HeverleeBelgium | Bergmaier A.,Institute For Angewandte Physik Und Messtechnik Lrt2 University Der Bundeswehrmunchengermany | And 3 more authors.
Physica Status Solidi (A) Applications and Materials Science | Year: 2016

This article discusses the materials aspects involved in the successful integration of hybrid floating gate (HFG) devices for NAND applications. In HFG, a Si(n type)\metal(p type) stack replaces the standard poly-Si FG. The high work function metal helps to enlarge the program window by limiting the leakage through the high-k intergate dielectric (IGD); the use of high-k IGD enables to scale the equivalent oxide thickness (EOT) of the HFG cell. Our recent progresses in the understanding of the materials characteristics (IGD crystallinity and HFG-IGD thermal stability) that influence memory performance have allowed to demonstrate that HFG can be a solution to scale planar flash beyond the 20nm node with the best preferable hybrid floating gate structure being a Ru-based HFG and a 3-layers IGD stack of HfAlO\Al2O3\HfAlO. Indeed, through the correct selection and combination of materials for process conditions that are relevant in flash memory fabrication flows, we will show that program windows can be suitably engineered. Finally, the materials challenges for keeping acceptable memory retention characteristics are also highlighted. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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