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Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-03-21

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-01-29

In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2010-01-22

Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90 with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-01-18

In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2011-10-19

In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region.

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