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Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-01-29

In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2012-09-11

A plasma supply arrangement for supplying power to a plasma load has a quadrature coupler which has at least one capacitance and at least one inductivity and which is suitable for coupling together two HF power signals of the same frequency which are phase-shifted relative to each other by 90, an HF power signal being supplied respectively at a first useful signal connection and at a second useful signal connection of the quadrature coupler as a useful signal, to form a coupled HF power which can be output as a useful signal at a third useful signal connection, at least one useful signal connection being configured for a first impedance. The quadrature coupler has a fourth useful signal connection which is configured for a second impedance which is higher than the first impedance, or has only three useful signal connections.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2011-10-19

In some aspects, a power supply system for a plasma application and/or an induction heating system includes at least two controllable power generators of different types. Each controllable power generator includes an associated identifier, and at least one operating unit for controlling at least one of the power generators, the operating unit includes an operating application to import the respective identifiers from the power generators that are connected to the operating application, and based on generator-specific configuration data that are stored for each power generator and the identifiers, the operating application constructs a graphic user interface on a display device of the operating unit.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-03-21

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2013-01-18

In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2011-07-27

An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2012-06-15

In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2011-10-19

In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2010-01-12

In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver >500 W at a substantially constant fundamental frequency >3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range.


Patent
HUTTINGER Elektronik GmbH Co. KG | Date: 2014-01-14

Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90 with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.

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