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Tokyo, Japan

Hoya Corporation is a Japanese company manufacturing optical products such as photomasks, photomask blanks and glass magnetic-memory disks, contact lenses and eyeglass lenses using wavefront technology for the health-care market, medical photonics,lasers, photographic filters, and software. The headquarters are in 2-7-5 Naka-Ochiai, Shinjuku, Tokyo. Hoya Corporation is one of the Forbes Global 2000 Leading Companies and Industry Week 1000 Company.Hoya acquired the camera company Pentax in 2007, for the price of US$1 billion, about 10% more than Pentax was valued at the time. In June 2010 the grandson of the corporation's founder Yutaka Yamanaka proposed changes to the Board of Directors to prevent what he called such "mistakes" from happening again.On October 1, 2011, Hoya sold its Pentax camera business to Ricoh. Wikipedia.


Patent
Hoya Corporation | Date: 2015-04-02

An imaging optical system includes a front lens group including a front lens element and a reflector element which reflects a light bundle that exits from the front lens element; and a rear lens group on the image side of the front lens group. The front lens element is a spherically-swingable lens group which suppresses image shake by spherically-swinging about a predetermined spherical-swing center in accordance with vibrations applied to the imaging optical system. The following conditions (1) and (2) are satisfied: wherein d designates the Abbe number with respect to the d-line of at least one lens element of the spherically-swingable lens group, f designates the focal length of the imaging optical system, in a state where the focal length is at a maximum, and y designates the maximum image height of the imaging plane.


Provided are a phase shift mask blank that is improved in the irradiation durability of a light-semitransmissive film (phase shift film), made of a material containing mainly a transition metal, silicon, and nitrogen, to exposure light having a wavelength of 200 nm or less and thus can improve the mask lifetime, a method of manufacturing such a phase shift mask blank, and a phase shift mask. The phase shift mask blank is used for manufacturing a phase shift mask adapted to be applied with ArF excimer laser exposure light. The phase shift mask blank has a light-semitransmissive film on a transparent substrate. The light-semitransmissive film is an incomplete nitride film containing mainly a transition metal, silicon, and nitrogen. The content ratio of the transition metal to the transition metal and the silicon in the light-semitransmissive film is less than 9%.


Patent
Hoya Corporation | Date: 2015-01-14

A lens barrel includes a first drive mechanism which rotates a cam ring to move a cam-driven lens frame, holding a lens group, in accordance with a cam groove; a second drive mechanism which screw-engages a nut with a feed screw, biases a nut-driven lens frame to abut the nut, and moves the nut-driven lens frame. The cam-driven lens frame is positioned adjacent to the nut-driven lens frame on a reverse side to the biasing direction, and driving ranges of these lens frames partially overlap each other. The first drive mechanism includes a cam-driven member, separate from the cam-driven lens frame, which is linearly guided and provided with a cam follower which engages with the cam groove of the cam ring; and a biasing member which biases the cam-driven lens frame to abut against the cam-drive member, so that the cam-driven lens frame moves with the cam-driven member.


A mask blank for use in the manufacture of a binary mask adapted to be applied with ArF excimer laser exposure light has, on a transparent substrate, a light-shielding film for forming a transfer pattern. The light-shielding film has a laminated structure of a lower layer and an upper layer and has an optical density of 2.8 or more for exposure light and a thickness of 45 nm or less. The lower layer is made of a material in which the total content of a transition metal and silicon is 90 at % or more, and has a thickness of 30 nm or more. The upper layer has a thickness of 3 nm or more and 6 nm or less. The phase difference between exposure light transmitted through the light-shielding film and exposure light transmitted in air for a distance equal to the thickness of the light-shielding film is 30 degrees or less.


Patent
Hoya Corporation | Date: 2015-10-09

A bending imaging apparatus provided with an imaging optical system, a bending optical element, an image sensor positioned on a post-bending optical axis of the bending optical element, and a housing, includes an inclination adjusting body having a mounting plate portion, onto which the image sensor is mounted, and an inclination-adjusting bent plate portion extending toward an underside of the bending optical element from the mounting plate portion; a swing pivot portion formed between the inclination-adjusting bent plate portion and the housing to pivotally support the inclination adjusting body; and an inclination adjusting portion positioned between the inclination-adjusting bent plate portion and the housing to overlap the bending optical element with respect to the post-bending optical axis direction and swings the inclination adjusting body about the swing pivot portion to adjust an inclination of the inclination adjusting body.

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