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Patent
Hitachi Kokusai Electrical Inc. | Date: 2017-02-01

IP-based monitor camera system has been used to accomplish savings in labor in operating railway vehicles, such as passenger-carrying vehicles, and to confirm safety at multiple doors thereof. Provided are a monitoring system and a monitoring method which allow a train driver or a train crew to use a monitor installed in a leading or rearmost vehicle or the like for visually confirming motions of passengers in association with opening or closing of doors of the passenger-carrying vehicles at a time so as to ensure more safe and efficient operation of the passenger-carrying vehicle. Additionally, in the case where a train set of passenger-carrying vehicles is formed, when the areas of the trimming frames of images captured by monitor cameras are set for displaying the images on a monitor screen, the areas of the trimming frames of the monitor cameras are automatically read and set so that the trimming frames can be set for the train set of vehicles quickly, readily and reliably.


A wireless communication system includes a first wireless communication device and a second wireless communication device that wirelessly communicates with the first wireless communication device. One of the first and second wireless communication devices is disposed in a mobile object, and the other is fixed. The first wireless communication device includes a wireless transmission/reception unit that transmits data to the second wireless communication device and performs wireless transmission and reception in order to detect whether the mobile object is stopped. When, in a first mode for transmitting data to the second wireless communication device and determining whether the reception strength of a received signal is equal to or greater than a first value, the first wireless communication device detects that the reception strength is equal to or greater than the first value, the first wireless communication device stops the transmission of data to the second wireless communication device, exits the first mode, and transitions to a second mode for determining whether the mobile object is stopped. Upon detecting in the second mode that the mobile object is stopped, the first wireless communication device exits the second mode and transmits data to the second wireless communication device.


Patent
Hitachi Kokusai Electrical Inc. | Date: 2017-04-05

In a monitoring system, each individual camera device divides image data acquired by an image sensor unit into a plurality of areas, and detects video-image abnormality from an average luminance signal value in each area or from a change thereof. The camera device that has detected video abnormality transmits video-image abnormality detection information to a server. In the plurality of areas, it is possible to use different detection algorithms such as a first algorithm in which it is determined that an abnormality has occurred when there is no change in the average luminance value, a second algorithm in which it is determined that an abnormality has occurred when there is a change in the average luminance value, and a third algorithm for observing a change in the video captured while a change is made to an aperture, exposure time, or the like.


There is provided a method for manufacturing a semiconductor device, including: providing a substrate with an oxide film formed on a surface thereof; pre-processing a surface of the oxide film; and forming a nitride film containing carbon on the surface of the oxide film which has been pre-processed, by performing a cycle a predetermined number of times, the cycle including non-simultaneously performing: supplying a precursor gas to the substrate; supplying a carbon-containing gas to the substrate; and supplying a nitrogen-containing gas to the substrate, or by performing a cycle a predetermined number of times, the cycle including non-simultaneously performing: supplying a precursor gas to the substrate; and supplying a gas containing carbon and nitrogen to the substrate, or by performing a cycle a predetermined number of times, the cycle including non-simultaneously performing: supplying a precursor gas containing carbon to the substrate; and supplying a nitrogen-containing gas to the substrate.


Patent
Hitachi Kokusai Electrical Inc. and Tokyo Technological Labo Co. | Date: 2016-09-22

A heating part of covering and heating a gas pipe includes: a thermal insulation portion disposed outside a heat generation body; an enclosure configured to enclose the thermal insulation portion and the heat generation body; a fastening part installed outside the enclose and configured to fasten one end portion and the other end portion of the enclosure in a state in which the one end portion and the other end portion of the enclosure adjoin each other; and a temperature sensing part disposed at the side of the gas pipe with respect to the enclosure at a position facing a surface of the gas pipe and formed in a plate shape with a major surface thereof oriented toward the gas pipe.


Patent
Hitachi Kokusai Electrical Inc. | Date: 2016-12-19

A substrate processing apparatus includes a reception part configured to receive film thickness distribution data of a substrate on which a channel region, an insulating film on the channel region, and a first silicon-containing layer as a portion of a silicon-containing film on the insulating film are formed; a substrate mounting part configured to mount the substrate; and a gas supply part configured to supply a gas to form a second silicon-containing layer as a portion of the silicon-containing film on the first silicon-containing layer to have a film thickness distribution different from a film thickness distribution of the film thickness distribution data, thereby correcting a film thickness of the silicon-containing film.


In the present invention, the productivity of a processing apparatus including a plurality of process chambers is improved. There is provided a substrate processing apparatus including a plurality of process chambers, a process gas supply unit configured to supply a process gas into each of the plurality of process chambers, a purge gas supply unit configured to supply a purge gas into each of the plurality of process chambers, an exhaust unit configured to exhaust each of the plurality of process chambers and a control unit configured to control the process gas supply unit, the purge gas supply unit and the exhaust unit to supply the process gas into a first process chamber of the plurality of process chambers to which a substrate is transferred while supplying the purge gas into process chambers other than the first process chamber and exhausting the plurality of process chambers.


A method of manufacturing a semiconductor device includes forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes non-simultaneously performing: forming a first layer by supplying a precursor gas including a chemical bond of a first element and carbon and a first catalyst gas to the substrate; exhausting the precursor gas and the first catalyst gas through an exhaust system; forming a second layer by supplying a reaction gas including a second element and a second catalyst gas to the substrate to modify the first layer; and exhausting the reaction gas and the second catalyst gas through the exhaust system. At least in a specific cycle, the respective gases are supplied and confined in the process chamber while closing the exhaust system in at least one of the act of forming the first layer and the act of forming the second layer.


Patent
Hitachi Kokusai Electrical Inc. | Date: 2017-01-30

A substrate processing apparatus includes a substrate retaining mechanism; a detecting unit detecting a placed state of the substrate retained by the substrate retaining mechanism; a first determination unit comparing detection data of the substrate obtained by the detecting unit with master data that is a reference to determine if the detection data is within a first allowed value; a confirmation unit confirming substrate type; a second determination unit comparing the detection data of the substrate with the master data to determine if the detection data is within a second allowed value; and a transfer control unit controlling the substrate retaining mechanism depending on a determination result of the second determination unit when substrate type is confirmed as a predetermined type by the confirmation unit when it is determined that the detection data is not within the first allowed value as determined by the first determination unit.


Patent
Hitachi Kokusai Electrical Inc. | Date: 2016-06-20

A substrate processing apparatus includes a gas supply part configured to supply at least one of a film-forming gas, a first inert gas, and a second inert gas supplied at a temperature higher than that of the first inert gas into a process chamber in which a substrate is processed; and a control part configured to control the gas supply part to perform a film-forming process of supplying the film-forming gas and the first inert gas from the gas supply part into the process chamber to process the substrate, and to control a deposited film removing process of directly supplying the second inert gas having a temperature higher than that of the first inert gas from the gas supply part to the process chamber, in a state where there is no substrate in the process chamber, to remove a deposited film deposited within the process chamber.

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