Schaumburg, IL, United States
Schaumburg, IL, United States

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Patent
Hitachi High-Technologies | Date: 2016-07-21

A pattern measurement method and measurement apparatus are provided that appropriately evaluate the deformation of a pattern occurring due to a micro loading effect. In order to achieve the above-mentioned object, there are provided pattern measurement method and apparatus that measure a dimension of a pattern formed on a sample. In the pattern measurement method and apparatus, distances between a reference pattern and a plurality of adjacent patterns adjacent to the reference pattern or inner diameters of the reference pattern in a plurality of directions are measured, and the measurement results of the plurality of distances between the reference pattern and the adjacent patterns or the measurement results of the inner diameters of the reference pattern in the plurality of directions are classified according to distances between the reference pattern and the adjacent patterns or directions of the patterns adjacent to the reference pattern.


An object of the present invention is to provide an evaluation condition setting method and an evaluation condition setting apparatus of a semiconductor device which can select an appropriate evaluation pattern for exposure condition management with high accuracy. In order to solve the object, the present invention proposes an evaluation condition setting method or an evaluation condition setting apparatus which excludes a pattern corresponding to a process window chart defining a process window range smaller than a predetermined process window range from a measurement target, in a plurality of the process window charts which are obtained based on scanning of a charged particle beam with respect to another pattern formed on a sample.


Patent
Hitachi High-Technologies | Date: 2016-12-06

In the plasma etching method, a sample is placed on a stage in a chamber. A first gas is introduced into the chamber. Electric field is supplied within the chamber to plasma is generated from the first gas. A first RF power of a first frequency, which is for generating a bias voltage in the sample for etching the sample with radicals which are generated in the plasma while the plasma is generated, is supplied to the stage. A second gas is introduced from a position in outer periphery of a surface of the stage, on which the sample is placed. A second RF power of a second frequency higher than the first frequency and capable of generating plasma from the second gas above the stage that allows radicals generated in the plasma generated from the second gas to be supplied in the outer periphery, is supplied to the stage.


Patent
Hitachi High-Technologies | Date: 2017-04-05

Disclosed is an automatic analysis device in which a check item at a time of an analysis start can be set in accordance with a skill level of an operator, an analysis can be performed after the check item being displayed and confirmed, and erroneous measurement caused due to a missed check can be prevented. The check item such as checking the remaining quantity of a reagent or the like displayed in a check screen before the analysis start can be set for each type of operator, each day, each time. The set check item is configured to be displayed in a screen before the analysis start, and unless the operator confirms the check item, the analysis start is not allowed in principle. An automatic analysis device which can prevent erroneous measurement caused due to a missed check of the operator before the analysis start is realized.


Patent
Hitachi High-Technologies | Date: 2017-03-29

The purpose of the present invention is to provide a sample dispensing device in which device trouble is less likely to occur at the time of discarding a used nozzle tip, and with which it is possible to discard a nozzle tip safely and easily. More specifically, disclosed is a sample dispensing device that sucks a liquid sample from a predetermined container and then discharges the sample to another container, the sample dispensing device comprising: a nozzle tip that sucks and holds the sample; a dispensing nozzle to which the nozzle tip can be detachably attached via a fitting part; a dispensing nozzle position control means that controls the position of the dispensing nozzle with respect to the predetermined container and the other container; a nozzle tip removing means that removes the nozzle tip from the dispensing nozzle; and a discarding box into which water can be supplied, and in which the nozzle tip removed from the dispensing nozzle is discarded. The nozzle tip is made of a water-soluble material, and after being removed from the dispensing nozzle by the nozzle tip removing means, the nozzle tip is dissolved by water in the discarding box.


Patent
Hitachi High-Technologies | Date: 2017-01-25

Provided is a test apparatus in which a test for bacterial identification or antimicrobial susceptibility can be promptly determined. A division state of bacteria is monitored by performing microscopic observation of shapes and the number of the bacteria in each of wells in a culture plate for bacterial identification culture or an antimicrobial susceptibility test, and it is determined whether or not the bacteria grow in a stage shifted from an induction phase to a logarithmic phase, with reference to an image obtained through microscopic observation. In addition, determination performed based on turbidity in the related art may be combined with determination performed based on microscopic observation in which change and the like in the shapes of the bacteria are monitored. Accordingly, it is possible to realize a highly accurate test result.


Patent
Hitachi High-Technologies | Date: 2017-01-18

In order to increase the accuracy of dispensing liquid from a sealed liquid holding container without increasing device complexity, pressures inside and outside the sealed liquid holding container are measured with a pressure sensor connected to a dispensing probe, and the amount of discharge operation of a pump is corrected in accordance with the measured pressures. The amount of operation of the pump is corrected by calculating the amount of deformation of a dispensing flow passageway due to pressure change.


Patent
Hitachi High-Technologies | Date: 2017-03-22

The pressure signal process unit 98 acquires data under a predetermined condition. A calculation unit 94 calculates a statistic distance between the acquired data and determination-purpose reference data stored in a storage unit 93. An abnormal dispensing determination unit 97 determines whether or not dispensing is abnormal. A suitability verification unit 95 verifies whether the determination-purpose reference data is suitable for an abnormality detection function to be properly fulfilled. In a case where it is determined that the determination-purpose reference data is not suitable for an abnormality detection function to be properly fulfilled, temporary determination-purpose reference data is prepared so as to be compared with the previously acquired data under a predetermined condition. In a case where a difference therebetween is greater than a predetermined threshold value, the suitability verification unit 95 determines a possibility that an automatic analyzer may have an abnormal component or that a failure may occur in the automatic analyzer, transmits the result to the control instruction unit 99, and causes a display device 92 to display an alarm. In this manner, it is possible to accurately detect a state where component replacement or device adjustment is required, without being affected by a time-dependent change or replacement of each component configuring a channel.


Patent
Hitachi High-Technologies | Date: 2017-02-08

An automatic analytical apparatus includes a reaction container for mixing a sample with a reagent to react the sample to the reagent, a measurement unit that irradiates a reaction solution in the reaction container with light and measures the intensity of transmitted light or scattered light, a control unit that processes time-series light intensity data obtained through the measurement in the measurement unit, a storage unit that stores one or more approximation functions each approximating to a time-series change in the light intensity data, and an output unit that outputs a processing result of the control unit. The control unit selects any one of the approximation functions stored in the storage unit, calculates an approximate curve indicating a time-series change in the light intensity data using the selected approximation function, calculates deviation feature information based on deviation information between the light intensity data and the approximate curve, and detects and classifies an abnormality included in the light intensity data using the deviation feature information.


Patent
Hitachi High-Technologies | Date: 2017-04-12

A display unit displays, on a single screen (200), a first display area (211) configured from a first area (211 a) corresponding to the position on a reagent disc at which a reagent container is disposed and a second display area (212) configured from a second area (212a) corresponding to the position on a reagent loader at which a reagent container is disposed. A control unit changes the display state of the first area (211a) on the basis of whether a reagent container is placed at a position on the reagent disk corresponding to the first area (211a) and reagent information for the reagent accommodated in the placed reagent container and changes the display state of the second area (212a) on the basis of whether a reagent container is placed at a position on the reagent loader (6) corresponding to the second area (212a) and reagent-container-conveyance-state information for the placed reagent container.

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