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Grant
Agency: European Commission | Branch: FP7 | Program: CP-FP | Phase: NMP-2007-2.1-2 | Award Amount: 4.74M | Year: 2008

The aim of this project is to develop high density defect-free ultra-thin sealing coatings with excellent barrier properties and improved corrosion resistance. Their successful functioning will be provided by the synergy of the coating perfect morphology and its complex structural design, which can be tailored at the nanoscale. The study will be focused on development of novel nanostructured coating systems, such as nanoscale multilayers, mixed and composite coatings. These impermeable sealing layers must be able to block the ion exchange between the substrate material and an aggressive environment, thus offering an efficient protection against corrosion over a long term. The coatings will be deposited by four alternative vapour deposition techniques, Filtered Cathodic Arc Deposition (FCAD), High Power Impulse Magnetron Sputtering (HIPIMS), Atomic Layer Deposition (ALD) and Plasma Enhanced Atomic layer Deposition (PEALD)). These techniques possess a unique advantage offering the deposition of highly conformal and uniform films of high density, free of defects. The technological objective of the project is to demonstrate the feasibility of corrosion protection by FCAD, HIPIMS and ALD techniques on an industrial scale. To fulfil this objective, a complete industrial process for the multi-stage surface treatment, including cleaning, pre-treatment, coating deposition, must be defined. All techniques will be evaluated in terms of technical effectiveness, production costs, environmental impact and safety, and the most suitable technique(s) will be selected for further development on a large scale for the applications in some targeted industrial sectors. The applications, tested within this project, concern high precision mechanical parts (bearings), aerospace components (break systems) and gas handling components. The coating application in the decorative and biomedical domains will be assessed.


Patent
Hauzer Techno Coating BV, Schaeffler Group and Picosun Inc. | Date: 2013-08-21

A coated article of steel having at least one layer having a high hardness and a high resistance to wear applied by a PVD (physical vapor deposition) process, by a CVD (chemical vapor deposition) process, or by a PECVD (plasma enhanced chemical vapor deposition) process, at least one surface region of said article and at least one ALD layer comprising at least one layer of a material deposited by an ALD (atomic layer deposition) process on said at least one layer having a high hardness and a high resistance to wear, wherein the steel of which the article is made is a martensitic grade of steel, wherein the at least one layer having a high hardness and a high resistance to wear applied by a PVD (physical vapor deposition) process, by a CVD (chemical vapor deposition) process, or by. a PECVD (plasma enhanced chemical vapor deposition) process is a DLC layer, a metal-DLC layer, or a CrAlN layer and has a thickness in the range from 0.5 microns to 4 microns and a hardness in the range from 20 GPa to 100 GPa especially in the range from 30 to 80 GPa, and wherein the ALD layer is selected from the group comprising Al_(2)O_(3), SiO_(2), TiO_(2), Ta_(2)O_(5), HfO_(2), mixed layers of any of the foregoing and multilayer structures of two or more of the foregoing, the ALD layer having a thickness in the range from 1 nm to 100 nm and especially in the range from 20 nm to 30 nm.


Patent
Hauzer Techno Coating BV, Schaeffler Group and Picosun Inc. | Date: 2013-08-21

A bearing component of a linear bearing of a rolling element bearing and a sliding bearing, for example a component selected from the group comprising a bearing race, a rolling element such as a tapered roller, a barrel roller, a needle roller, a bearing ball and a rolling element cage, the bearing component having at least one layer having a high hardness and a high current insulation property applied by a PVD (physical vapor deposition) process, by a CVD (chemical vapor deposition) process, or by. a PECVD (plasma enhanced chemical vapor deposition) process at at least one surface region of said article, said at least one layer comprising a nonconductive oxide layer selected from the group comprising an Al_(2)O_(3) layer, a TaO layer, an SiO2 layer, a mixed layer comprising two or more of the foregoing oxides, a multilayer structure comprising alternating layers of two or more of the foregoing oxides and a DLC layer such as a ta-C layer, there being at least one ALD layer comprising at least one layer of a material deposited by an ALD (atomic layer deposition) process on said at least one layer having a high hardness and a high current insulation property, the ALD layer itself having a high current insulation property and comprising a material or layer structure selected from the said group of materials.


An apparatus for the manufacture of at least substantially hydrogen-free ta-C layers on substrates (workpieces) of metal or ceramic materials is characterized by at least the following components:a) a vacuum chamber, which is connectable to an inert gas source and a vacuum pump,b) a support device for one or more substrates (workpieces) which is inserted into or insertable into the vacuum chamber,c) at least one graphite cathode having an associated magnet arrangement forming a magnetron, the graphite cathode serving as a source of carbon material,d) a bias power supply for applying a negative bias voltage to the substrate or substrates on the support device,e) at least one cathode power supply for the or each cathode, which is connectable to the at least one graphite cathode and to an associated anode and which is designed to transmit high power pulse sequences spaced at (preferably programmable) intervals of time, with each high power pulse sequence comprising a series of high frequency DC pulses adapted to be supplied, optionally after a build-up phase, to the at least one graphite cathode.


An apparatus for the manufacture of at least substantially hydrogen-free ta-C layers on substrates, which includes a vacuum chamber, which is connectable to an inert gas source and a vacuum pump, a support device in the vacuum chamber, at least one graphite cathode having an associated magnet arrangement forming a magnetron that serves as a source of carbon material, a bias power supply for applying a negative bias voltage to the substrates on the support device, at least one cathode power supply for the cathode, which is connectable to the at least one graphite cathode and to an associated anode and which is designed to transmit high power pulse sequences spaced at intervals of time, with each high power pulse sequence comprising a series of high frequency DC pulses adapted to be supplied, optionally after a build-up phase, to the at least one graphite cathode.


Patent
Hauzer Techno Coating BV | Date: 2012-08-30

A vacuum coating apparatus and method comprising a vacuum chamber, at least one pair of opposing cathodes, a power supply adapted to supply an AC voltage to said opposing cathodes to operate them in a dual magnetron sputtering mode, wherein at least one further cathode for PVD coating is provided in said vacuum chamber, characterized in that the at least one further cathode is a magnetron cathode and a further power supply is provided in the form of a pulsed power supply or a DC power supply is provided which is connectable to the magnetron cathode or arc cathode.


Patent
Hauzer Techno Coating BV | Date: 2013-03-06

A vacuum coating apparatus and method comprising a vacuum chamber, at least one pair of opposing cathodes, a power supply adapted to supply an AC voltage to said opposing cathodes to operate them in a dual magnetron sputtering mode, wherein at least one further cathode for PVD coating is provided in said vacuum chamber, characterized in that the at least one further cathode is a magnetron cathode and a further power supply is provided in the form of a pulsed power supply or a DC power supply is provided which is connectable to the magnetron cathode or arc cathode.


Patent
Hauzer Techno Coating BV | Date: 2011-01-27

A coating apparatus having a vacuum chamber, a plurality of cathodes arranged therein and also a HIPIMS power source, characterized in that in addition to at least one coating cathode which can be operated with the HIPIMS power source a plurality of etching cathodes is provided which are smaller in area in comparison to the coating cathode, with the etching cathodes being connectable in a predetermined or predeterminable sequence to the HIPIMS power source.


Patent
Hauzer Techno Coating BV, Picosun Inc. and Schaeffler Group | Date: 2012-12-27

Disclosed is a bearing component having at least one layer having a high hardness and a high current insulation property, the layer comprising a nonconductive oxide layer selected from the group comprising an Al_(2)O_(3 )layer, a TaO layer, an SiO_(2 )layer, a mixed layer comprising two or more of the foregoing oxides, a multilayer structure comprising alternating layers of two or more of the foregoing oxides and a DLC layer such as a ta-C layer, there being at least one ALD layer comprising at least one layer of a material deposited by an ALD (atomic layer deposition) process on the at least one layer having a high hardness and a high current insulation property, the ALD layer itself having a high current insulation property and comprising a material or layer structure selected from the said group of materials.


Patent
Hauzer Techno Coating BV, Picosun Inc. and Schaeffler Group | Date: 2012-12-27

A coated article of steel having at least one layer having a high hardness and a high resistance to wear applied by a deposition (e.g., PVD, a CVD, or PECVD) process, at least one surface region of said article and at least one ALD layer comprising at least one layer of a material deposited by an ALD (atomic layer deposition) process on said at least one layer, wherein the steel of which the article is made is a martensitic grade of steel, wherein the at least one layer, is a DLC layer, a metal-DLC layer, or a CrAlN layer and has a thickness in the range from 0.5 microns to 4 microns and a hardness in the range from 20 GPa to 100 GPa, and wherein the ALD layer has a thickness in the range from 1 nm to 100 nm.

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