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Song C.,Zhejiang University | Liu J.,Hangzhou Bluestar New Materials Technology Co. | Weng W.,Zhejiang University
Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society

A fluorine (F)-doped titania (TiO2)-based film on glass for self-cleaning purposes was prepared using Ti(OC3H7)4 and CF3CH2OH (TFE) as precursors by an atmospheric pressure chemical vapor deposition method. The effect of the TFE flow rate on the properties of the films was analyzed by scanning electron microscope, X-ray diffractometer and ultraviolet visible transmission spectrum. The results show that F can be doped into the TiO2 films, and the formation of anatase phase is suppressed by adding the TFE. The optimal TFE flow rate is 5.94 L/min. Source

Gao Q.,Zhejiang University | Li M.,Zhejiang University | Liu Q.,Hangzhou Bluestar New Materials Technology Co. | Wang Y.,Weihai Blue Star Glass Co. | And 7 more authors.
Materials Letters

Polycrystalline fluorine-doped SnO2 thin films with SiC xOy or SixSnyO2 barrier layer are deposited on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) method. The effect of barrier layer on structure and electrical property of FTO films was investigated. Results show that the inserting of barrier layer, especially the SiCxOy layer, has led to the improved crystallinity and the enhanced preferential orientation along the (2 0 0) crystallographic plane. SnO2:F/SiC xOy/Glass films with larger grain size and a columnar growth structure exhibited lower resistivity (~4.9×10-4), higher reflectance in the mid-far-infrared region (~80%) and lower emissivity (0.16), while maintaining high transmittance in the visible range. The SiC xOy film has therefore been considered as a more ideal potential barrier layer for FTO thin film production. © 2014 Elsevier B.V. Source

Gao Q.,Zhejiang University | Liu Q.,Hangzhou Bluestar New Materials Technology Co. | Li M.,Zhejiang University | Li X.,Zhejiang University | And 6 more authors.
Thin Solid Films

The low-emission glass was prepared via depositing fluorine-doped tin oxide thin film on glass substrate by atmospheric pressure chemical vapor deposition method. The as-deposited low-emission glass was found to present a SnO 2:F/SiCxOy/glass sandwich structure via focused ion beam technique and transmission microscopic measurement. After tempering process at ∼650 °C with varied periods, the electrical and optical properties of the SnO2:F thin film remained stable for less than 10 min, but decreased dramatically when the tempering period exceeded 10 min, which was mainly due to the oxygen chemisorptions and fluorine ion diffusion. It was observed that the SnO2:F thin films presented uniform polycrystalline nature of cassiterite structure throughout the tempering process. The study has therefore suggested the appropriate tempering conditions for the SnO2:F low-emission glass, and provided a critical guidance for further energy-saving glass applications. © 2013 Elsevier B.V. All rights reserved. Source

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