Oyama, Japan
Oyama, Japan

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Patent
Kyushu University and Gigaphoton Inc. | Date: 2016-12-19

A laser irradiation apparatus may include a plasma generator, a laser unit configured to output a pulsed laser light beam, and a controller. The plasma generator may be configured to supply an atmospheric pressure plasma containing a dopant to a predetermined region on a semiconductor material. The controller may be configured to control the plasma generator and the laser unit to perform one of first and second controls to thereby perform doping of the dopant into the semiconductor material. The first control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam from start to finish of supply of the atmospheric pressure plasma to the predetermined region. The second control may cause irradiation of the predetermined region with one or more pulses of the pulsed laser light beam after supply of the atmospheric pressure plasma to the predetermined region.


Patent
Institute For Laser Technology and Gigaphoton Inc. | Date: 2017-01-06

An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.010^(17 )atoms/cm^(3 )or higher and 1.310^(18 )atoms/cm^(3 )or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm^(2 )or higher and 52.3 J/cm^(2 )or lower in the predetermined region.


There is provided a light source system that may include a free electron laser apparatus, a light concentrating mirror, and a delaying optical system. The free electron laser apparatus may include an undulator, and may be configured to output a pulsed laser light beam toward an exposure apparatus. The light concentrating mirror may be configured to concentrate the pulsed laser light beam to enter the exposure apparatus. The delaying optical system may be provided in an optical path between the undulator and the light concentrating mirror, and may be configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam.


Patent
Gigaphoton Inc. | Date: 2017-02-09

A laser apparatus includes: an oscillator configured to output seed light; an amplifier including a laser chamber provided in an optical path of the seed light and a pair of discharge electrodes provided inside the laser chamber; and a transform optical system provided in the optical path of the seed light between the oscillator and the amplifier and configured to transform the seed light in a way that suppresses a decrease in purity of polarization of a laser beam that is outputted from the amplifier.


The transmission system may include: an optical path adjustment device configured to substantially unify optical paths of a first pre-pulse laser beam and a second pre-pulse laser beam; an optical path separation device configured to separate the optical paths of the substantially unified first pre-pulse laser beam and the second pre-pulse laser beam to an optical path for the first pre-pulse laser beam and an optical path for the second pre-pulse laser beam; a first beam adjustment device disposed on the optical path for the first pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the first pre-pulse laser beam; and a second beam adjustment device disposed on the optical path for the second pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the second pre-pulse laser beam.


Patent
Gigaphoton Inc. | Date: 2016-02-05

An example of the disclosure is a laser apparatus including a master oscillator capable of outputting a pulse laser beam, a plurality of optical amplifiers disposed on an optical path of the pulse laser beam outputted from the master oscillator and configured to sequentially amplify the pulse laser beam, an optical reflector capable of passing the pulse laser beam therethrough and reflecting a self-oscillation beam generated in one of the plurality of optical amplifiers, and an optical absorber capable of receiving and absorbing the self-oscillation beam reflected by the optical reflector.


Patent
Gigaphoton Inc. | Date: 2016-09-06

An extreme ultraviolet light generation apparatus may include: a target supply device configured to supply targets from a nozzle; a first illumination device configured to output light having a first characteristic to illuminate targets outputted from the nozzle; a second illumination device configured to output light having a second characteristic different from the first characteristic to illuminate the targets outputted from the nozzle; a first imaging device configured to photograph light reflected off the targets illuminated with the light having the first characteristic; and a second imaging device configured to photograph light reflected off the targets illuminated with the light having the second characteristic.


Patent
Gigaphoton Inc. | Date: 2016-08-18

A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.


Patent
Gigaphoton Inc. | Date: 2016-09-09

A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.


Patent
Gigaphoton Inc. | Date: 2016-10-04

An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm^(2 )and equal to or lower than a fluence of the main pulse laser beam.

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