Gigaphoton Inc.

Oyama, Japan

Gigaphoton Inc.

Oyama, Japan
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Patent
Gigaphoton Inc. | Date: 2017-04-06

A vibrator unit may be configured to vibrate a target material in a target channel and include a vibration element configured to vibrate in response to an external electrical signal having a predetermined frequency. A resonance frequency of the vibration element may be different from the predetermined frequency of the electrical signal. A vibrator unit may include a vibration transmission member in contact with the first member including the target channel in interior; and a vibration element that is in contact with the vibration transmission member. A mode-1 natural frequency of the vibration transmission member may be different from a resonance frequency of the vibration element.


A target generation device may include a filter structure, a flange, a tank unit, and a nozzle section. The flange may accommodate the filter structure and contain a flow path passing through the filter structure. The tank unit may contain a space in communication with the flow path in the flange and store a predetermined target material. The nozzle section may be provided to the flange and in communication with the space in the tank unit through the flow path in the flange. The filter structure according to one embodiment of the present disclosure may include a filter of a porous material and a socket integrally formed with the filter.


A narrow band laser apparatus may include: a laser chamber; a line narrow module configured to narrow a band width of a laser beam outputted from the laser chamber and return the laser beam to the laser chamber, the line narrow module including a grating; a housing accommodating the line narrow module; three mounts fixed to the housing; and a housing moving device configured to support the housing and the line narrow module by supporting each of the three mounts and move the line narrow module by moving the housing with respect to the laser chamber in a direction substantially perpendicular to a dispersion plane of the grating.


An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.


There is provided a light source system that may include a free electron laser apparatus, a light concentrating mirror, and a delaying optical system. The free electron laser apparatus may include an undulator, and may be configured to output a pulsed laser light beam toward an exposure apparatus. The light concentrating mirror may be configured to concentrate the pulsed laser light beam to enter the exposure apparatus. The delaying optical system may be provided in an optical path between the undulator and the light concentrating mirror, and may be configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam.


Patent
Gigaphoton Inc. | Date: 2017-02-09

A laser apparatus includes: an oscillator configured to output seed light; an amplifier including a laser chamber provided in an optical path of the seed light and a pair of discharge electrodes provided inside the laser chamber; and a transform optical system provided in the optical path of the seed light between the oscillator and the amplifier and configured to transform the seed light in a way that suppresses a decrease in purity of polarization of a laser beam that is outputted from the amplifier.


The transmission system may include: an optical path adjustment device configured to substantially unify optical paths of a first pre-pulse laser beam and a second pre-pulse laser beam; an optical path separation device configured to separate the optical paths of the substantially unified first pre-pulse laser beam and the second pre-pulse laser beam to an optical path for the first pre-pulse laser beam and an optical path for the second pre-pulse laser beam; a first beam adjustment device disposed on the optical path for the first pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the first pre-pulse laser beam; and a second beam adjustment device disposed on the optical path for the second pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the second pre-pulse laser beam.


Patent
Institute For Laser Technology and Gigaphoton Inc. | Date: 2017-01-06

An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.010^(17 )atoms/cm^(3 )or higher and 1.310^(18 )atoms/cm^(3 )or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm^(2 )or higher and 52.3 J/cm^(2 )or lower in the predetermined region.


An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.


Patent
Gigaphoton Inc. | Date: 2017-03-09

A laser beam having desired properties is output at desired timings. A laser apparatus is a laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance, and may be equipped with: a semiconductor laser that outputs a laser beam when a trigger signal is input thereto; an optical switch that switches between a state in which the laser beam passes therethrough and a state in which the laser beam does not pass therethrough, provided along the optical path of the laser beam; and a control unit configured to output the trigger signal to the semiconductor laser at a frequency which is an integer multiple of the repetition frequency, and to control the optical switch such that the laser beam passes therethrough at the repetition frequency.

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