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Patent
Fuchita Nanotechnology Ltd. | Date: 2010-12-15

[Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 m diameter) to be more stably deposited on a substrate by using a simple configuration. [Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container


Patent
Fuchita Nanotechnology Ltd. | Date: 2015-02-19

A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.


Patent
Nagoya University and Fuchita Nanotechnology Ltd. | Date: 2013-06-28

A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.


Fuchita E.,Fuchita Nanotechnology Ltd. | Tokizaki E.,Fuchita Nanotechnology Ltd. | Ozawa E.,Fuchita Nanotechnology Ltd. | Sakka Y.,Japan National Institute of Materials Science
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | Year: 2011

The aerosol gas deposition method (AGD) is a low temperature method. No heating procedure exists in the AGD process during the formation of the AGD films. We can form even ceramic films by using AGD method. However, the mechanism of synthesizing ceramic film has not been made clear until now. This paper is the first trial to clarify the mechanism by using two kinds of zirconia powder. The experimental results indicated that in wet type zirconia powder the film could be formed in the limited conditions of diameter and the specific surface area of powders although in dry-milled zirconia powder all powders used could form the films. At the same experiments we observed the high temperature phase of zirconia in the film and a light emission phenomenon at the deposition site during AGD process. In this paper, we discuss the formation mechanism of the AGD film at the ambient temperature correlating with the film formation condition, the appearance of the high temperature phase and the light emission. Source


Fuchita E.,Fuchita Nanotechnology Ltd. | Tokizaki E.,Fuchita Nanotechnology Ltd. | Ozawa E.,Fuchita Nanotechnology Ltd. | Sakka Y.,Japan National Institute of Materials Science
Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan | Year: 2011

The aerosol gas deposition method (AGD) is a low-temperature method. No heating occurs during the AGD process when forming the AGD films. Nevertheless, ceramic films can be synthesized at room temperature directly from the source ceramic powders. In this paper, we report that the high-temperature phase of zirconia was found in zirconia films synthesized by AGD and that a light emission phenomenon was observed at the deposition site. The generation of the high-temperature phase was dependent on the mean diameter of the source ceramic powders. Both a small powder of less than two or three microns in diameter and large powder particles of more than 10 microns in diameter have the low possibility of generating the high-temperature phase when compared to that of 7-micron diameter powder. The appearance of the high-temperature phase and the light emission might be related to the formation mechanism of the AGD film at ambient temperature. © 2011 The Ceramic Society of Japan. Source

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