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Hubert J.,Faculte Des Sciencesservice Of Chimie Analytique Et Of Chimie Des Interfacesuniversite Libre Of Bruxellescp 255 | Vandencasteele N.,Faculte Des Sciencesservice Of Chimie Analytique Et Of Chimie Des Interfacesuniversite Libre Of Bruxellescp 255 | Mertens J.,Faculte Des Sciencesservice Of Chimie Analytique Et Of Chimie Des Interfacesuniversite Libre Of Bruxellescp 255 | Viville P.,Service Of Chimie Des Materiaux Nouveauxuniversite Of Mons Umons Materia Nova20 Place Du Parc7000 Monsbelgium | And 5 more authors.
Plasma Processes and Polymers | Year: 2015

The atmospheric pressure PECVD deposition and texturization of hydrophobic coatings using liquid fluorinated C6F12 and C6F14 precursors are investigated. The effect of the carrier gas (argon and helium) is discussed in terms of the behavior of the gas phase and of the characteristics of the deposited film. Mass spectrometry measurements indicate that the fragmentation is higher with argon while helium reacts very easily with oxygen impurities leading to the formation of CxFyOz compounds. These observations are consistent with the chemical composition of the films determined by XPS and the variation in the deposition rate. Moreover, the streamers present in the argon discharge affect the morphology of the surface by increasing the roughness, which leads to the increase in the hydrophobicity of the coatings. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Source

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