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Patent
Micro Process Inc., Mitsubishi Rayon Co. and Everlight Chemical Industrial Corporation | Date: 2010-12-27

The present invention is related to a photosensitive resin composition containing: a vinyl-based copolymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group and a carboxyl group-containing vinyl monomer (b); a quinonediazide compound (II) and a compound (III) represented by the following formula (5), and to a photosensitive dry film and a method for forming a patter by using the photosensitive resin composition. According to the present invention, it is possible to provide a photosensitive resin composition which can form a resist film in which the occurrence of crack is suppressed, the film reduction of the unexposed area is suppressed, and sensitivity and resolution are excellent, and to provide a photosensitive dry film and a method for forming a pattern by using the photosensitive resist composition [In the formula, Y is a straight or branched hydrocarbon group of 1 to 6 carbon atoms; 1 and m are respectively independently an integer of 1 to 3; n is 1 or 2; p and q are respectively independently 0 or 1.]


Patent
Micro Process Inc., Mitsubishi Rayon Co. and Everlight Chemical Industrial Corporation | Date: 2010-12-27

A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5). [In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; 1 and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.]


Patent
Everlight Chemical Industrial Corporation | Date: 2016-04-26

The present invention is related to a novel high fixation ink composition for digital textile printing, which comprises: (A) at least one reactive dye compound with two reactive groups in an amount of 1% to 50% by weight; (B) an organic buffer in an amount of 0.05% to 10% by weight; (C) a humectant in an amount of 10% to 50% by weight; and (D) a solvent in remaining amount. When the aforesaid ink composition is applied in digital textile printing, fixation rate of dye on fabrics is high.


Patent
Everlight Chemical Industrial Corporation | Date: 2015-11-06

The present invention relates to a method for treprostinil diethanolamine synthesis. The present invention also relates to a novel intermediate used in the method for treprostinil diethanolamine synthesis. The novel intermediate is shown in the following formula (II): wherein R1 and R2 are described in the description.


Patent
Everlight Chemical Industrial Corporation | Date: 2016-11-09

The present invention is related to a novel high fixation ink composition for digital textile printing, which comprises: (A) at least one reactive dye compound with two reactive groups in an amount of 1% to 50% by weight; (B) an organic buffer in an amount of 0.05% to 10% by weight; (C) a humectant in an amount of 10% to 50% by weight; and (D) a solvent in remaining amount. When the aforesaid ink composition is applied in digital textile printing, fixation rate of dye on fabrics is high.


Patent
Everlight Chemical Industrial Corporation | Date: 2015-08-11

The present invention provides a softener composition, which attaches onto the fabric during the rinsing process, and thus enables the fabric to have the anti-ultraviolet function. The softener composition comprises (A) 0.05 to 50 wt % of polyurethane-based polymeric UV light absorber, (B) 2 to 15 wt % of cationic softener, and (C) 35 to 97 wt % of water.


Patent
Everlight Chemical Industrial Corporation | Date: 2014-03-24

The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film.


Patent
Everlight Chemical Industrial Corporation | Date: 2012-09-18

A polyurethane derivative and a composition thereof are disclosed. The polyurethane derivative of the present invention has a structure of formula (I). The polyurethane derivative and the composition thereof can be used for increasing light fastness.


Trademark
Everlight Chemical Industrial Corporation | Date: 2012-07-18

Dyestuffs; colorants.


Trademark
Everlight Chemical Industrial Corporation | Date: 2012-04-10

Chemical reagents, other than for medical or veterinary purposes; industrial chemicals; chemical agents for impregnating, binding or coating of textiles; chemical preparations to be applied to textiles, plastics and coatings to prevent damage from ultraviolet light; chemicals used in the manufacture of fabric or textiles; waterproofing chemical compositions for articles of fabric.

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