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Troitsk, Russia

Borisov V.M.,Troitsk Institute for Innovation and Fusion Research | Koshelev K.N.,Russian Academy of Sciences | Prokofiev A.V.,Troitsk Institute for Innovation and Fusion Research | Khadzhiyskiy F.Yu.,EUV Labs Ltd. | Khristoforov O.B.,Troitsk Institute for Innovation and Fusion Research
Quantum Electronics | Year: 2014

The results of the studies on the development of a highbrightness radiation source in the extreme ultraviolet (EUV) range are presented. The source is intended for using in projection EUV lithography, EUV mask inspection, for the EUV metrology, etc. Novel approaches to creating a light source on the basis of Z-pinch in xenon allowed the maximal brightness [130 W(mm2 sr)-1] to be achieved in the vicinity of plasma for this type of radiation sources within the 2% spectral band centred at the wavelength of 13.5 nm that corresponds to the maximal reflection of multilayer Mo/Si mirrors. In this spectral band the radiation power achieves 190 W in the solid angle of 2π at a pulse repetition rate of 1.9 kHz and an electric power of 20 kW, injected into the discharge. © 2014 Kvantovaya Elektronika and Turpion Ltd Source


Vinokhodov A.Yu.,EUV Labs Ltd. | Krivtsun V.M.,Russian Academy of Sciences | Lash A.A.,EUV Labs Ltd. | Borisov V.M.,Troitsk Institute for Innovation and Fusion Research | And 2 more authors.
Quantum Electronics | Year: 2016

Characteristics of a source of laser-induced radiation in the extreme ultraviolet (EUV) range, obtained in a discharge between two jets of liquid tin, are investigated. The possibility of designing a high-brightness EUV source on this basis for employing in mask inspection techniques in projection EUV lithography is demonstrated. The average efficiency of converting the electric energy to radiation in the spectral range of 13.5 ± 0.135 nm is approximately 2 %/2π sr with the size of emitting plasma 0.2 ± 0.35 mm. The possibility of producing a EUV source with a brightness of about 200 W (mm2 sr)-1 is demonstrated. © 2016 Kvantovaya Elektronika and Turpion Ltd. Source


Vinokhodov A.Yu.,EUV Labs Ltd. | Koshelev K.N.,Russian Academy of Sciences | Krivtsun V.N.,Russian Academy of Sciences | Krivokorytov M.S.,EUV Labs Ltd. | And 5 more authors.
Quantum Electronics | Year: 2016

We report the results of studying the dynamics of deformation and fragmentation of liquid-metal droplets under the action of ultrashort laser pulses. The experiments have been performed to optimise the shape of the droplet target used in extreme ultraviolet (EUV) radiation sources based on the laser-produced plasma using the pre-pulse technology. The pre-pulse is generated by a system incorporating a master Ti: sapphire oscillator and a regenerative amplifier, allowing one to vary the pulse duration from 50 fs to 50 ps. The power density of laser radiation at the droplet target, averaged over the pulse duration and spatial coordinates, has reached 3 × 1015 W cm-2. The production of liquid-metal droplets has been implemented by means of a droplet generator based on a nozzle with a ring piezoceramic actuator. The droplet material is the eutectic indium-tin alloy. The droplet generator could operate in the droplet and jet regime with a maximal rate of stable operation 5 and 150 kHz, respectively. The spatial stability of droplet position s = 1 %-2 % of its diameter is achieved. The size of the droplets varied within 30-70 mm, their velocity was 2-8 m s-1 depending on the operation regime. © 2016 Kvantovaya Elektronika and Turpion Ltd. Source


Vinokhodov A.Yu.,EUV Labs Ltd. | Krivokorytov M.S.,EUV Labs Ltd. | Sidelnikov Yu.V.,Russian Academy of Sciences | Krivtsun V.M.,Russian Academy of Sciences | And 2 more authors.
Quantum Electronics | Year: 2016

We present the study of a source of extreme ultraviolet (EUV) radiation based on laser plasma generated due to the interaction of radiation from a nanosecond Nd: YAG laser with a liquidmetal droplet target consisting of a low-temperature eutectic indium - tin alloy. The generator of droplets is constructed using a commercial nozzle and operates on the principle of forced capillary jet decomposition. Long-term spatial stability of the centre-of-mass position of the droplet with the root-mean-square deviation of ∼0.5 mm is demonstrated. The use of a low-temperature working substance instead of pure tin increases the reliability and lifetime of the droplet generator. For the time- and space-averaged power density of laser radiation on the droplet target 4 × 1011 W cm-2 and the diameter of radiating plasma ∼80 μm, the mean efficiency of conversion of laser energy into the energy of EUV radiation at 13.5 ± 0.135 nm equal to 2.3 % (2% sr)-1 is achieved. Using the doublepulse method, we have modelled the repetitively pulsed regime of the source operation and demonstrated the possibility of its stable functioning with the repetition rate up to 8 kHz for the droplet generation repetition rate of more than 32 kHz, which will allow the source brightness to be as large as ∼0.96 kW (mm2 sr)-1. © 2016 Kvantovaya Elektronika and Turpion Ltd. Source

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