Billerica, MA, United States
Billerica, MA, United States

Entegris, Inc. NASDAQ: ENTG is a leading provider of yield-enhancing materials and solutions for the most advanced manufacturing environments. Entegris’ customers include the world’s manufacturers of semiconductors and other electronics, as well their materials and equipment suppliers. Entegris operates out of its headquarters in Billerica, Mass. The company has about 3,500 employees in manufacturing, service center and research facilities in the United States, Malaysia, Singapore, Taiwan, China, Korea, Japan, Israel, Ireland, Germany and France.The company seeks to help manufacturers increase their yields by improving contamination control in several key processes, including photolithography, wet etching & cleaning, chemical-mechanical planarization, thin-film deposition, bulk chemical processing, wafer and reticle handling and shipping, and testing, assembly and packaging. Approximately 80% of the Company's products are used in the semiconductor industry.Manufacturing semiconductors is incredibly complex and requires levels of purity that are more stringent than any other industry. Entegris’ solutions help achieve these purity levels by protecting critical manufacturing materials from contaminants that are so small they are measured in width of atoms. In recent years, contamination control has become increasingly more difficult as semiconductor manufacturers drive their sub-20nm technology applications. At the same time these manufacturers are experiencing incredible pressure to increase productivity in the fab and stay cost competitive. As a result, companies are making the move to invest in technology that increases yields by minimizing product defects caused by contamination. Wikipedia.


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Patent
Entegris | Date: 2017-02-22

Systems and methods for delivering fluid-containing feed materials to process equipment are disclosed. A liner-based pressure dispensing vessel (220, 230) is subjected to filling by application of vacuum between the liner (224, 234) and overpack (222, 230). Multiple feed material flow controllers (321A-324A) of different calibrated flow ranges may be selectively operated in parallel for a single feed material. Feed material blending and testing for scale-up may be performed with feed materaisl supplied by multiple liner-based pressure dispensing containers. A gravimetric system may be used to determine concentration of at least one component of a multi-component solution or mixture.


A pumping system with a pressure sensor positioned on the fill side and a pressure sensor on the dispense side to obtain and provide pressure information that can be used by a controller in determining various operating profiles. To avoid trapping air in a process fluid, a pressure sensor can be flush mounted or mounted at an angle on the sidewall of a feed chamber, a bottle, or a reservoir tank at or near the bottom or half-height. The pressure information obtained from the fill side can have many beneficial uses, including filtration confirmation, air detection, and reduced pressure priming of a filter. The pumping system may further include a graphical user interface for displaying the operating profiles and various associated alarms in real time.


Cobalt silylamide and cobalt carbonyl precursors are described, which are usefully employed in vapor deposition processes, such as chemical vapor deposition and atomic layer deposition, to deposit cobalt and to form high purity cobalt-containing films at temperatures below 400 C. These precursors and processes can be utilized in the manufacture of integrated circuitry and production of devices such as microprocessors, and logic and memory chips.


Compositions and processes for leaching noble metals from materials comprising said noble metals. Advantageously, the halide-based composition is environmentally friendly and effectively removes noble metals at room temperature without the need for high pressures and electrodes.


Patent
Entegris | Date: 2017-01-25

Embodiments as disclosed herein may provide a sensor system including a container, such as a bag, having a port assembly integrated therewith. The port assembly includes an optically transparent window and be configured such that a sensor may be mechanically attached to the port assembly to interface with the optical window. The sensor may include an index of refraction (IoR) sensor that measures the chemical concentration of a liquid inside the container based on a refractive index.


Patent
Entegris | Date: 2017-06-28

A carbon pyrolyzate material is disclosed, having utility as an adsorbent as well as for energy storage and other applications. The pyrolyzate material comprises microporous carbon derived from low cost naturally-occurring carbohydrate source material such as polysaccharides. In adsorbent applications, the carbon pyrolyzate may for example be produced in a particulate form or a monolithic form, having high density and high pore volume to maximize gas storage and delivery, with the pore size distribution of the carbon pyrolyzate adsorbent being tunable via activation conditions to optimize storage capacity and delivery for specific gases of interest.


Patent
Entegris | Date: 2017-07-05

A front opening wafer container with a forward and rearward sets of stacked V- shaped wafer edge receiving portions, the rearward set part of a wafer shelf component and comprising a thin film of PBT preformed and overmolded with a polycarbonate. The sets of stacked V-shaped wafer edge receiving portions providing between-shelf seating positions above on-shelf seating positions. The PBT providing a low friction sliding engagement surface for the wafer edges thereby providing uniform and consistent dropping of wafers from the between shelf position to the on-shelf positon when the door of the wafer container is removed.


Patent
Entegris | Date: 2017-08-09

A gas storage and dispensing vessel, including a vessel container defining a gas storage interior volume, and a valve head regulator assembly secured to the vessel container, the valve head regulator assembly including a single gas pressure regulator disposed in the interior volume of the vessel container, and a valve head including a pneumatic flow control valve, wherein the single regulator is configured with a set point pressure of at least 0.5 MPa, and wherein the interior volume of the vessel container is at least 5 L.


Patent
Entegris | Date: 2017-07-26

A high torque polymer fittings useful in fluid handling systems. The fittings are especially useful for fluid handling fittings having diameters of one inch or greater. Various embodiments of the fittings disclosed accommodate specialized wrenches for securing the fittings, the wrenches being used to tighten the fittings to a desired torque.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.

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