Entity

Time filter

Source Type


Hegemann D.,Empaswiss Federal Laboratories For Materials Science And Technologystgallenswitzerland | Michlicek M.,Central European Institute of TechnologyMasaryk UniversityBrnoCzech Republic | Blanchard N.E.,Empaswiss Federal Laboratories For Materials Science And Technologystgallenswitzerland | Schutz U.,Empaswiss Federal Laboratories For Materials Science And Technologystgallenswitzerland | And 4 more authors.
Plasma Processes and Polymers | Year: 2015

The deposition of functional plasma polymers such as a-C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a-C:H:O film properties was thus investigated in order to optimize cross-linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up-scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Source

Discover hidden collaborations