Entity

Time filter

Source Type

Hachioji, Japan

Yasui M.,Kanagawa Industrial Technology Center | Omata Y.,Elionix Inc. | Sugimoto K.-I.,Shinshu University | Kaneko S.,Kanagawa Industrial Technology Center | And 3 more authors.
Electronics and Communications in Japan | Year: 2011

The reactivity between nanoimprint mold materials and optical glass has been investigated by measuring the contact angle between these materials in a nitrogen atmosphere at high temperatures up to 1000 °C. Since low-softening-temperature optical glass was chosen in this study, the thermal upper limit of the contact angle measurement was set as 800 °C. As mold materials, electrodeposited Ni-W alloy containing 40 wt-% W and glasslike carbon (GC) were chosen. In the case of GC, the contact angle did not change greatly at temperatures up to 800 °C, and an obvious reactant phase in the interface layer between the GC and the molten glass was observed. In the case of the Ni-W alloy, the contact angle decreased with increasing temperature, and no reactant phase was observed at the interface. This indicates that the Ni-W alloy is suitable as a mold material for B2O3-La2O 3-based optical glass. © 2011 Wiley Periodicals, Inc.


The present invention provides a method and an apparatus for measuring a force (which will be referred to as surface force) acting between two material surfaces. A surface force measuring method includes moving an object (


Trademark
Elionix Inc. | Date: 2008-06-24

Microscope; surface roughness analyzer; electron beam lithography machine; electron probe micro analyzer; ion beam etching machine; plasma etching and deposition machine; indentation tester; focused ion beam etching machine.


Kiyohara S.,Maizuru National College of Technology | Matta S.,Maizuru National College of Technology | Ishikawa I.,Maizuru National College of Technology | Tanoue H.,Toyohashi University of Technology | And 5 more authors.
Materials Research Society Symposium Proceedings | Year: 2013

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 μm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 μm-square and 400 nm-height with an aspect ratio of 0.08. © 2013 Materials Research Society.


Kiyohara S.,Maizuru National College of Technology | Araki S.,Maizuru National College of Technology | Kurashima Y.,Yamanashi University | Taguchi Y.,Elionix Inc. | And 2 more authors.
Journal of Materials Science: Materials in Electronics | Year: 2011

We have investigated the nanofabrication for glass-like carbon molds with electron cyclotron resonance oxygen ion beam etching technologies using polysiloxane [-R 2SiO-] n as an electron beam mask and a room-temperature imprint resist material. The maximum etching selectivity of polysiloxane film against glass-like carbon was 27, which was obtained with ion energy of 400 eV. It was found that the optimum etching time to fabricate dots of 500 nm in height was 5 min, which was explored according to the computer simulation. The glass-like carbon molds with square pole and cylinder dots were fabricated with 500 nm in width and diameter, respectively. The optimum imprinting pressure and its depth obtained after the press for 5 min were 0.5 MPa and 0.5 μm, respectively. We carried out the room-temperature nanoimprint lithography process using glass-like carbon molds. The resulting width of imprinted polysiloxane patterns was obtained in good agreement with that of the mold. © 2010 Springer Science+Business Media, LLC.

Discover hidden collaborations