Hachioji, Japan
Hachioji, Japan

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Kiyohara S.,Maizuru National College of Technology | Kumagai M.,Maizuru National College of Technology | Taguchi Y.,Elionix Inc. | Sugiyama Y.,Elionix Inc. | And 3 more authors.
Materials Research Society Symposium Proceedings | Year: 2011

We have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t1 of 1 min , pressure time t2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold. © 2011 Materials Research Society.


Kiyohara S.,Maizuru National College of Technology | Araki S.,Maizuru National College of Technology | Kurashima Y.,Yamanashi University | Taguchi Y.,Elionix Inc. | And 2 more authors.
Journal of Materials Science: Materials in Electronics | Year: 2011

We have investigated the nanofabrication for glass-like carbon molds with electron cyclotron resonance oxygen ion beam etching technologies using polysiloxane [-R 2SiO-] n as an electron beam mask and a room-temperature imprint resist material. The maximum etching selectivity of polysiloxane film against glass-like carbon was 27, which was obtained with ion energy of 400 eV. It was found that the optimum etching time to fabricate dots of 500 nm in height was 5 min, which was explored according to the computer simulation. The glass-like carbon molds with square pole and cylinder dots were fabricated with 500 nm in width and diameter, respectively. The optimum imprinting pressure and its depth obtained after the press for 5 min were 0.5 MPa and 0.5 μm, respectively. We carried out the room-temperature nanoimprint lithography process using glass-like carbon molds. The resulting width of imprinted polysiloxane patterns was obtained in good agreement with that of the mold. © 2010 Springer Science+Business Media, LLC.


Ishikawa I.,Maizuru National College of Technology | Okuno T.,Maizuru National College of Technology | Kiyohara S.,Maizuru National College of Technology | Taguchi Y.,Elionix Inc. | And 3 more authors.
Materials Research Society Symposium Proceedings | Year: 2012

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 μm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N′-Diphenyl-N,N′-di(m- tolyl)benzidine (TPD) [hole transport layer], Tris(8-quinolinolato)aluminum (Alq 3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 μm-square-dot by RTC-NIL using diamond molds. © 2012 Materials Research Society.


Kiyohara S.,Maizuru National College of Technology | Ito C.,Maizuru National College of Technology | Ishikawa I.,Maizuru National College of Technology | Takikawa H.,Toyohashi University of Technology | And 4 more authors.
Materials Research Society Symposium Proceedings | Year: 2012

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 μm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold. © 2012 Materials Research Society.


Ihara I.,Nagaoka University of Technology | Matsumoto T.,Nagaoka University of Technology | Yajima Y.,Nagaoka University of Technology | Uegaki J.-I.,Elionix Inc. | Shima Y.,Elionix Inc.
21st Conference on Measurement of Force, Mass and Torque Together with HARDMEKO 2010 and 2nd Meeting on Vibration Measurement, IMEKO TC3, TC5 and TC22 Conferences | Year: 2010

There are increasing demands for measuring mechanical properties of small volumes of metal or small-sized materials used for Micro-Electro-Mechanical- Systems (MEMS). This is basically because such mechanical properties are closely related to the strength and reliability of the metal or systems. In this work, a nanoindentation technique with a spherical-tip is applied to the evaluation of elastic-plastic properties such as stress-strain relationship of industrial materials such as steel and aluminium. A continuous multiple loading method is employed to determine the stress-strain curve. A set of 21 times of loading/unloading sequences with increasing terminal load are made and load-displacement curves with the different terminal loads from 0.1 mN to 100 mN are then continuously obtained and converted to a stress-strain curve. The influence of measurement condition on the obtained stress-strain curve is examined and an appropriate condition is determined. Based on the examinations, stress-strain curves have been estimated for steels and aluminium. It has been found that the estimated stress-strain curves correlate closely with those measured by tensile or compression tests when the influence of the residual stress of the specimen surface is taken into account. In addition, some issues affecting the results are discussed.


Taniguchi J.,Tokyo University of Science | Hasegawa M.,Elionix Inc. | Amemiya H.,Elionix Inc. | Kobayashi H.,Elionix Inc.
Japanese Journal of Applied Physics | Year: 2016

Ultraviolet nanoimprint lithography (UV-NIL) has advantages such as room-temperature operation, high through-put, and high resolution. In the UVNIL process, the mold needs a release coating material to prevent adhesion of the transfer resin. Usually, fluorinated silane coupling agents are used as release coating materials. To evaluate the release property, surface force analyzer equipment was used. This equipment can measure the surface forces between release-coated or noncoated mold material surfaces and UV-cured resin surfaces in the solid state. Lower surface forces were measured when a release coating was used on the mold material surface. © 2016 The Japan Society of Applied Physics.


Kiyohara S.,Maizuru National College of Technology | Matta S.,Maizuru National College of Technology | Ishikawa I.,Maizuru National College of Technology | Tanoue H.,Toyohashi University of Technology | And 5 more authors.
Materials Research Society Symposium Proceedings | Year: 2013

As an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 μm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 μm-square and 400 nm-height with an aspect ratio of 0.08. © 2013 Materials Research Society.


PubMed | Elionix Inc.
Type: Journal Article | Journal: Nanotechnology | Year: 2011

We carried out investigations on electron-beam-induced nanoparticle formation in thin (5-30nm) Au films on smooth SiO(2)/Si substrates. When the Au films were irradiated with an electron beam, the Au films broke up into nanoparticles through the dewetting process. The dominant wavelengths of the surface (corresponding to the pitch between nanoparticles) were closely related with the thickness of the Au. We then developed a new technique for the formation of periodically arranged Au nanoparticles using a holed substrate. The nanoholes induced heterogeneous nucleation and helped to form ordered nanoparticles between the holes. Two-dimensionally, periodically arranged Au nanoparticles with a pitch of 100nm wereobtained.


The present invention provides a method and an apparatus for measuring a force (which will be referred to as surface force) acting between two material surfaces. A surface force measuring method includes moving an object (1) toward a probe (4) until the probe (4) is adsorbed to the object (1), then applying a load from an electromagnetic-force generator (20) to a supporting member (6) in a direction as to separate the probe (4) from the object (1) while gradually increasing an electric current supplied to the electromagnetic-force generator (20), obtaining a value of the electric current supplied to the electromagnetic-force generator (20) when the probe (4) is separated from the object (1), and converting the value of the electric current into a surface force acting between the probe (4) and the object (1).


The present invention provides a method and an apparatus for measuring a force (which will be referred to as surface force) acting between two material surfaces. A surface force measuring method includes moving an object (1) toward a probe (4) until the probe (4) is adsorbed to the object (1), then applying a load from an electromagnetic-force generator (20) to a supporting member (6) in a direction as to separate the probe (4) from the object (1) while gradually increasing an electric current supplied to the electromagnetic-force generator (20), obtaining a value of the electric current supplied to the electromagnetic-force generator (20) when the probe (4) is separated from the object (1), and converting the value of the electric current into a surface force acting between the probe (4) and the object (1).

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