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Midland, MI, United States

The Dow Chemical Co., commonly referred to as Dow, is an American multinational chemical corporation headquartered in Midland, Michigan, United States. As of 2007, it is the second-largest chemical manufacturer in the world by revenue and as of February 2009, the third-largest chemical company in the world by market capitalization . It ranked third in the world by chemical production in 2013.Dow manufactures plastics, chemicals, and agricultural products. With a presence in about 160 countries, it employs about 54,000 people worldwide. The company has seven different major operating segments, with a wide variety of products made by each one. Dow's 2012 sales totaled approximately $57 billion.Dow has been called the "chemical companies' chemical company" in that most of its sales are to other industries rather than end-users. Dow sells directly to end-users primarily in the human and animal health and consumer products markets.Dow is a member of the American Chemistry Council. The company tagline is "Solutionism". Wikipedia.


Desai A.A.,Dow Chemical Company
Angewandte Chemie - International Edition | Year: 2011

Generation gap: Three generations of process research and development towards the industrial manufacture of sitagliptin phosphate (1), a leading drug for type2 diabetes, are highlighted. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Source


Desai A.A.,Dow Chemical Company
Angewandte Chemie - International Edition | Year: 2012

Quite a process: Recent pioneering reports establishing proof of concept for conducting lithiation chemistry to produce organoboron products in a continuous fashion are highlighted (see scheme). © 2012 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. Source


Bedell S.A.,Dow Chemical Company
International Journal of Greenhouse Gas Control | Year: 2011

The use of amines for CO2 capture from flue gases involves one distinct difference and challenge from traditional amine acid gas capture: the presence of dioxygen and its role in the oxidative degradation of the amine. Insights on mechanisms of degradation in flue gas CO2 capture can be obtained from observations of other gas treating processes - primarily trace O2 contamination in "traditional" gas treating amine units as well as the autoxidation of amino acids during oxidative dehydrosulfurization using iron chelates. Three distinct pathways for degradation initiation have been identified: thermal, autoxidation (reaction involving dioxygen) and direct reactions with CO2. This paper will focus on the dioxygen pathway and insights that have been gained from observations of other gas treating processes - primarily trace O2 contamination in "traditional" gas treating amine units as well as the autoxidation of amino acids during oxidative dehydrosulfurization using iron chelates. © 2010 The Dow Chemical Company. Source


Krishnan M.,IBM | Nalaskowski J.W.,IBM | Cook L.M.,Dow Chemical Company
Chemical Reviews | Year: 2010

Slurry chemistry, materials, and mechanisms with respect to chemical mechanical planarization (CMP) have been reported. The CMP process has been used to planarize a variety of materials including dielectrics, semiconductors, metals, polymers, and composites. Applications of CMP in microelectronics can be found in all three main areas of semiconductor device manufacturing. CMP involves removal of materials by a unique combination of chemical and abrasive action to achieve highly planar surfaces that are also very smooth. Modern CMP is a highly evolved and sophisticated process technology involving several disciplines. An alternative means is to add components to the conventional silica slurry to enhance the oxide polish rate or suppress the nitride polish rate. The higher polish rate selectivity of the ceria systems has been attributed to the preferential adsorption of poly (acrylic acid) on the silicon nitride layer. The critical properties are significantly altered after CMP, and these materials need to be protected during post-CMP cleaning as well. Source


Kresge C.T.,Dow Chemical Company | Roth W.J.,Jagiellonian University | Roth W.J.,J. Heyrovsky Institute of Physical Chemistry
Chemical Society Reviews | Year: 2013

By the combination of prior knowledge, observation skills, and novel synthetic approaches, we discovered a family of mesoporous molecular sieves including discrete structures-MCM-41 (hexagonal), MCM-48 (cubic), and MCM-50 (lamellar). These materials were formed unlike that of our classical microporous structures involving reagent induced-macromolecular templating mechanism. Based on synthetic data and working with others, we were able to establish a predictive mechanism of formation and identify a broad class of templating reagents. These initial findings generated great interest and effort worldwide. It resulted in tremendous expansion of knowledge and skills with many new additional discoveries that established a new area of ordered mesoporous materials. They are integrated with zeolites (microporous materials) and based on surfactant inorganic chemistry. © The Royal Society of Chemistry 2013. Source

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