DISCO Corporation

Japan

DISCO Corporation

Japan
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Patent
Disco Corporation | Date: 2016-11-03

Disclosed herein is an SiC substrate separating method for separating an SiC substrate into at least two parts in a planar manner. The SiC substrate separating method includes an adhesive tape attaching step of attaching a transparent adhesive tape to a first surface of the SiC substrate, a support member attaching step of attaching a support member to a second, opposite surface of the SiC substrate, and a separation start point forming step of setting the focal point of a laser beam at a predetermined depth from the adhesive tape and next applying the laser beam to the adhesive tape while relatively moving the focal point and the SiC substrate to thereby form a modified layer parallel to the first surface of the SiC substrate and cracks propagating from the modified layer, thus forming a separation start point.


Patent
Disco Corporation | Date: 2016-11-10

A method for dividing a wafer having a wiring layer including Cu on the front side, the front side of the wafer being partitioned by a plurality of crossing division lines to define a plurality of separate regions where a plurality of devices are formed. The method includes a laser processed groove forming step of applying a laser beam to the wiring layer along each division line to thereby remove the wiring layer along each division line and form a laser processed groove along each division line, a cutting step of using a cutting blade having a thickness smaller than the width of each laser processed groove to fully cut the wafer along each laser processed groove after performing the laser processed groove forming step, and a dry etching step of dry-etching at least each laser processed groove after performing the laser processed groove forming step.


Patent
Disco Corporation | Date: 2016-11-10

A method for forming a water-soluble resin film on a wafer having a plurality of devices thereon. The wafer is supported through an adhesive tape to an annular frame. The method includes removing the resin scattered onto the surface of the frame in forming the film on the wafer held on a spinner table, and this step further includes: rotating the spinner table; positioning a water nozzle above the frame held on the spinner table, supplying water from the nozzle to the frame, positioning an air nozzle adjacent to the water nozzle on the downstream side thereof in the rotational direction of the spinner table, and supplying air from the air nozzle against the flow of the water on the frame, whereby the water is forced to temporarily stay on the surface of the frame by the air supplied and is then expelled outward of the frame.


Patent
Disco Corporation | Date: 2017-01-20

Disclosed herein is a wafer processing method including the steps of attaching a dicing tape to the back side of a wafer, the dicing tape being composed of a base tape, a DAF, and an adhesive layer for uniting the base tape and the DAF, imaging the wafer through the dicing tape to obtain an image of the wafer, detecting the positions of poor adhesion of the DAF from the image, storing the positions of poor adhesion detected above, dividing the wafer and the DAF into individual chips each having the DAF, curing the adhesive layer of the dicing tape by the application of ultraviolet light, selectively separating the chips with the DAF well adhered, at the boundary between the adhesive layer and the DAF according to the positions of poor adhesion stored above, and then picking up the chips with the DAF well adhered.


Patent
Disco Corporation | Date: 2017-01-19

A jig for assisting in aligning a plurality of rectangular workpieces is in the form of a plate having a plurality of grooves parallel to each other. The grooves have respective one ends aligned straight with each other and have a depth smaller than the thickness of the workpieces. After the workpieces have been fitted in the respective grooves, an adhesive tape is applied to the workpieces and the workpieces are transferred from the jig to the adhesive tape, so that the workpieces are arrayed in alignment with each other on the adhesive tape. The workpieces on the adhesive tape are prevented from being placed in different positions and orientations, and can subsequently be processed efficiently.


Patent
Disco Corporation | Date: 2017-01-03

A SiC wafer is produced from an SiC ingot having an end surface by setting the focal point of a laser beam at a predetermined depth from the end surface. The depth corresponds to the thickness of the SiC wafer to be produced. The laser beam is applied to the end surface of the SiC ingot while relatively moving the focal point and the SiC ingot to thereby form a modified layer parallel to the end surface and cracks extending from the modified layer, thus forming a separation start point. The separation start point is formed by setting the numerical aperture of a focusing lens to form the focal point to 0.45 to 0.9 and substantially setting the M^(2 )factor of the laser beam between 5 and 50 to thereby set the diameter of the focal point to 15 to 150 m.


Patent
Disco Corporation | Date: 2017-01-03

A wafer production method for producing a wafer from a lithium tantalate ingot includes a step of irradiating, from an end face of a lithium tantalate ingot which is a 42-degree rotation Y cut ingot having an orientation flat formed in parallel to a Y axis, a laser beam of a wavelength having transparency to lithium tantalate with a focal point of the laser beam positioned in the inside of the ingot to form a modified layer in the inside of the ingot while the ingot is fed for processing, and a step of applying external force to the ingot to peel off a plate-shaped material from the ingot to produce a wafer. At the step of forming a modified layer, the ingot is relatively fed for processing in a direction parallel or perpendicular to the orientation flat.


Patent
Disco Corporation | Date: 2017-01-06

A scanning mirror includes a mirror base and a reflective film formed on the mirror base. The mirror base is formed from a non-metallic material having a specific rigidity, determined by Youngs modulus (GPa) and density (g/cm^(3)), of at least 100 GPacm^(3)/g.


Patent
Disco Corporation | Date: 2017-01-04

Disclosed herein is a wafer processing method including a first modified layer forming step of applying a laser beam having a transmission wavelength to a wafer from the back side thereof along each division line in the condition where the focal point of the laser beam is set inside the wafer near the front side thereof, thereby forming a first modified layer inside the wafer along each division line. The wafer processing method further includes a second modified layer forming step of applying the laser beam to the wafer from the back side thereof along each division line in the condition where the focal point of the laser beam is set adjacent to the first modified layer thereabove toward the back side of the wafer, thereby forming a second modified layer for growing a crack from the first modified layer toward the front side of the wafer.


Patent
Disco Corporation | Date: 2017-01-26

An exposure apparatus includes a light source, an illumination optical system, a mask, and a projection optical system. The mask is configured from a plurality of small masks individually formed from small patterns in a plurality of regions into which a pattern to configure one device is divided. The projection optical system is configured in a size corresponding to a size of the small masks and projecting the small patterns in a reduced scale on a substrate. The necessity for a projection optical system for which accuracy against aberration is demanded and a high-price lens is used is eliminated, and it is possible to use a projection optical system configured from a small-sized lens having a small projection area and less liable to be influenced by aberration. Consequently, the exposure apparatus can be provided at a reduced cost.

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