Huynh K.,Digital Specialty Chemicals |
Laneman S.A.,Digital Specialty Chemicals |
Laxman R.,Digital Specialty Chemicals |
Gordon P.G.,Carleton University |
Barry S.T.,Carleton University
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | Year: 2014
The high volatility of 1 has made it a very attractive precursor for the ALD of ZrO2 thin-films to-date. Deposition of thin-films can be achieved at relatively low temperatures with good conformality. However, the long-term thermal stability of bulk quantities of 1 is known to be poor as the material suffers from significant decomposition after prolonged heating. Moreover, treating bulk quantities of 1 to elevated temperatures (180C) for short periods of time also results in significant decomposition. While the thermal stability of 3 and 4 are notably inferior to that of 1, compound 2 represents a viable alternative to 1 for ALD processes. The low evaporation rate of 2 could conceivably produce thin-films of ZrO2 with better conformality at high aspect ratios and better control of atomic thickness. In addition, the higher thermal stability of 2 compared to 1 and high onset of volatilization may render it to be a good candidate for the production of the desired tetragonal phase of ZrO2. Further investigations toward the application of 2 in ALD processes are currently underway.
Hao L.,Digital Specialty Chemicals |
Laxman R.K.,Digital Specialty Chemicals |
Laneman S.A.,Digital Specialty Chemicals
Solid State Technology | Year: 2014
Some of the HVM production challenges of UHP PDMAT for ALD-TaN are discussed. Device manufacturers working on sub-22nm device generations, are expected to adopt PDMAT precursor for ALD-TaN barrier films for copper interconnect structures. ALD deposition for very thin conformal barrier films could potentially reduce via resistance and does not impact electromigration of copper. Low via contact resistance at the contact area is also dependent on several factors such as trace impurities in the precursors, morphology of the barrier, deposition process, film nucleation, and surface interface. The manufacturing of extremely high purity in high volume poses several challenges. PDMAT is extremely sensitivity to oxygen and water, and the chemical synthesis of the PDMAT involves important sequence of purification technologies under inert conditions for this and other reasons.
ENVIRONMENTAL & SOCIAL RESPONSIBILITY The global environment is of great importance to DSC and our people. Digital is committed to responsible stewardship and a legacy of health and safety, social and environmental accountability ...
Anwar Chowdhury,Operations Manager Anwar joined Digital in 1997. He has a PhD in Chemistry, with a focus on the synthesis of organometallic compounds ...
To address requirements of global pharmaceutical, specialty chemical and semiconductor markets for efficient and effective technologies, DSC is pleased to announce that our worldwide license for the Buchwald organophosphine ligands from M.I ...
News Article | May 21, 2015
TORONTO, Ontario--(BUSINESS WIRE)--Digital Specialty Chemicals Limited (DSC), a dual bottom line corporation and leading provider of advanced materials to the semiconductor, pharmaceutical, and specialty chemical markets, announced today that it has received an equity investment from Intel Capital, Intel Corporation’s global investment organization. The investment will enhance the company’s research and development capabilities and will accelerate manufacturing capacity expansion. DSC specializes in the manufacture of organophosphorus and organometallic chemistries used in both memory and logic thin film atomic layer deposition (ALD) manufacturing processes at leading semiconductor integrated circuit (IC) fabrication sites worldwide. The company is a leader in the manufacturing and handling of both novel specialty chemicals in large volume, high purity air- sensitive chemicals that require nitrogen and vacuum-operated vessels, using high pressure reactors and multiple distillation techniques. “Since 1987, we have provided custom and high volume high purity chemicals to the semiconductor, pharmaceutical and specialty chemical markets worldwide. Our people, processes and facilities combine to offer the agility of a small, fine- chemical operation with the capacity of a large supplier,” said Dr. Ravi R. Gukathasan, CEO. “We believe that the continuation of Moore’s Law for semiconductor processing will depend greatly on continued innovation of advanced precursors which provides a growth opportunity for DSC. The funding from Intel Capital will help enable us to construct state-of-the-art R&D and manufacturing facilities to meet growing demand for thin film technologies.” “Materials innovation is critical to enabling new capabilities in semiconductor device design and manufacturing,” said Robert Bruck, corporate vice president and general manager of Global Supply Management at Intel. “We look forward to supporting DSC’s growth including development of new materials technologies for advanced semiconductor manufacturing process technology nodes.” Digital Specialty Chemicals Ltd is a private dual bottom line corporation, manufacturing fine-chemicals, specializing in organophosphorus and organometallic chemistry. Since 1987, the company has supplied custom and stock chemicals to semiconductor, pharmaceutical, and specialty chemical markets worldwide. Talented and dedicated people are a key source of the company’s competitive advantage and technology; quality, environmental and social responsibility along with an entrepreneurial spirit drives everything they do. Digital operates facilities in Toronto, Canada. Further information about Digital is available at www.digitalchem.com. Intel Capital, Intel's global investment organization, makes equity investments in innovative technology start-ups and companies worldwide. Intel Capital invests in a broad range of companies offering hardware, software, and services targeting enterprise, mobility, consumer Internet, digital media and semiconductor manufacturing. Since 1991, Intel Capital has invested more than US$11.4 billion in over 1,400 companies in 57 countries. In that timeframe, 211 portfolio companies have gone public on various exchanges around the world, and 366 were acquired or participated in a merger. In 2014, Intel Capital invested $359 million in 125 investments, including 59 new deals. For more information on what makes Intel Capital one of the world’s most powerful venture capital firms, visit www.intelcapital.com or follow @Intelcapital.