Dainippon Screen Manufacturing Co.

Kyoto, Japan

Dainippon Screen Manufacturing Co.

Kyoto, Japan
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Patent
Dainippon Screen Manufacturing Co. and Osaka University | Date: 2014-09-10

An inspecting device (100) includes: an irradiation part (12) for dividing pulsed light (LP1) emitted from a femtosecond laser (121) into pump light for measurement (LP13) and probe light for measurement (LP11), to irradiate a solar cell (9); a detection part for detecting an electromagnetic wave (LT1) emitted from the solar cell (9) in accordance with the irradiation with the probe light for measurement (LP11); and a delay part for measurement (14A) for delaying the time of arrival of the probe light for measurement (LP11) at the solar cell (9) relatively to the pump light for measurement (LP13). The irradiation part (12) is provided with a galvano mirror (125) for scanning with the probe light for measurement (LP11) a wide range (R11) which is wider than an irradiated range (pump light spot (SP13)) being irradiated with the pump light for measurement (LP13) in a solar cell (9).


Patent
Dainippon Screen Manufacturing Co. | Date: 2015-05-20

A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is held in a dryer chamber, liquid carbon dioxide is supplied to the surface of the substrate. Liquid nitrogen is supplied to cool down the interior of the dryer chamber. This solidifies the liquid carbon dioxide on the substrate into solid carbon dioxide. Thereafter, the pressure in the dryer chamber is returned to atmospheric pressure, and gaseous nitrogen is supplied into the dryer chamber. Thus, the temperature in the dryer chamber increases. The solid carbon dioxide on the surface of the substrate is sublimated, and is hence removed from the substrate. All of the steps are performed while carbon dioxide is not in a supercritical state but in a non-supercritical state.


Patent
Dainippon Screen Manufacturing Co. | Date: 2014-09-30

A substrate processing method includes a water removing unit for removing water from a substrate, a silylating agent supplying unit for supplying a silylating agent to the substrate and an etching agent supplying unit for supplying an etching agent to the substrate. A control unit controls the said units to execute a water removing step, a silylating step and an etching step in that order.


In the generation of a threshold matrix for N speed writing, first and second areas are set, the first area being a cluster of a plurality of first partial areas substantially evenly distributed in a matrix space, and the second area being an area of the matrix space excluding the first area. Next, at least two writing elements in each of the first partial areas are allocated occurrence numbers and changed into determined elements. Then, at least one writing element in the second area is allocated an occurrence number and changed into a determined element. Thereafter, the other writing elements are allocated occurrence numbers and changed into determined elements. In accordance with the occurrence numbers, the threshold value of each writing element is determined to obtain a threshold matrix for N speed writing. This results in a reduction in the graininess of an image in a highlight area.


When a differential page image is created by comparing a target inspection page image and an inspection page image, differential page image attribute information which is an inspection result is created by acquiring attribute information of an image region of the target inspection page image and an image region of the inspection page image corresponding to the differential page image, from target inspection page image data and inspection page image data.


Patent
Dainippon Screen Manufacturing Co. | Date: 2014-07-16

A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid forming the liquid film to the liquid film; a thawing liquid discharge nozzle which discharges a thawing liquid to a frozen film formed by freezing the liquid film; a thawing liquid supplier which supplies the heated thawing liquid to the thawing liquid discharge nozzle via a pipe; and a receiver which receives the cooling gas and the thawing liquid respectively discharged from the cooling gas discharge nozzle and the thawing liquid discharge nozzle at the respective retracted position and guides the cooling gas and the thawing liquid to a common flow passage.


Patent
Dainippon Screen Manufacturing Co. | Date: 2014-07-16

A substrate processing apparatus comprises: an air flow generator which generates a down flow by gas flowing from top to bottom around a substrate W held horizontally; a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid to the liquid film and thereby freezes the liquid film; and a remover which removes a frozen film formed by freezing the liquid film from the substrate. The air flow generator reduces a flow velocity of the down flow when the cooling gas is discharged to the liquid film from the cooling gas discharge nozzle than when the liquid is supplied to the substrate from the liquid film former.


Patent
Dainippon Screen Manufacturing Co. | Date: 2014-07-02

An image recording apparatus includes a plurality of recording heads arranged in a staggered configuration in a width direction. Adjacent ones of the recording heads have respective adjacent nozzles for ejecting ink droplets onto positions adjacent to each other in the width direction on a recording medium. For recording an image, a correction area rate less than a dot area rate of an input mage in a recording position of each of the adjacent nozzles is calculated from the dot area rate. Then, ink droplets are ejected from each of the adjacent nozzles in accordance with the correction area rate. As a result, the amounts of ink droplets ejected from the adjacent nozzles are limited. For a recording process using a head unit including the recording heads arranged in a staggered configuration, this suppresses the occurrence of unevenness in density due to an undesirable flow or bleeding of ink at the boundary between recording regions of the recording heads.


An image obtained by shrinking an original image in a row direction is halftoned, and this halftone dot image is enlarged in the row direction and recorded at double speed. In order to determine a threshold value of a threshold matrix used for halftoning an image, prepared is a matrix space in accordance with writing positions used for actual recording of an image. In the matrix space, writing elements are set alternately with non-writing elements both in the row direction and in a column direction. In the matrix space, turn-on numbers are allocated to all the writing elements in avoidance of the non-writing elements. Then, in accordance with the turn-on numbers, respective threshold values for the writing elements are determined. By shrinking the threshold matrix in the row direction with omission of the non-writing elements, a threshold matrix for double speed is obtained.


Patent
Dainippon Screen Manufacturing Co. | Date: 2014-08-11

A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step.

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