San Diego, CA, United States
San Diego, CA, United States

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Patent
Cymer Inc | Date: 2016-02-03

A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.


Patent
Cymer Inc | Date: 2015-12-22

Corrosion resistant electrodes are formed of brass that has been doped with phosphorus, arsenic, antimony, or combinations thereof. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, arsenic, or antimony, and the brass has no visible microporosity at a magnification of 400. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light.


Patent
Cymer Inc | Date: 2015-05-22

A metrology system includes an optical frequency separation apparatus in the path of the pulsed light beam and configured to interact with the pulsed light beam and output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; a plurality of sensing regions that receive and sense the output spatial components; and a control system connected to an output of each sensing region. The control system is configured to: measure, for each sensing region output, a property of the output spatial components from the optical frequency separation apparatus for one or more pulses; analyze the measured properties including averaging the measured properties to calculate an estimate of the spectral feature of the pulsed light beam; and determine whether the estimated spectral feature of the pulsed light beam is within an acceptable range of values of spectral features.


Patent
Cymer Inc | Date: 2015-07-08

A system includes a first actuation module coupled to a first actuatable apparatus of an optical source, the first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam; a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; and a control system configured to receive an indication regarding the operating state of the first actuatable apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or desaturate the first actuatable apparatus if the first actuatable apparatus is saturated.


A device is described herein which may comprise an optical amplifier having a gain band including wavelengths _(1 )and _(2), with _(1)_(2); a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength _(1); a main pulse seed laser generating a laser output having wavelength, _(2); and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.


A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.


Patent
Cymer Inc | Date: 2015-04-08

A wavelength error for each pulse in a first subset of pulses emitted from an optical source is determined, the wavelength error being the difference between a wavelength for a particular pulse and a target wavelength; a pulse-by-pulse correction signal is determined based on the determined wavelength error, the pulse-by-pulse correction signal including a correction signal associated with each pulse in the first subset of pulses; and a correction based on the determined pulse-by-pulse correction signal is applied to each pulse in a second subset of pulses emitted from the optical source, where applying a correction to a pulse in the second subset of pulses reduces the wavelength error of the pulse in the second subset of pulses.


An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.


Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.


A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor; and an electronic processor coupled to a computer-readable storage medium, the medium storing instructions that, when executed, cause the processor to: receive data from the first sensor and the second sensor, and determine, based on the received data, a location of the irradiating amplified light beam relative to the target material in more than one dimension.

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