San Diego, CA, United States
San Diego, CA, United States

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Patent
Cymer Inc | Date: 2015-10-28

A photolithography system includes an optical system, an actuation apparatus, and a control module. The optical system includes an optical source that produces a pulsed light beam traveling along a beam path; a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; and an optical element positioned to interact with the pulsed light beam. The actuation apparatus is coupled to the optical element. The actuation apparatus is configured to adjust a physical property of the optical element based on a control signal from the control module to thereby adjust a polarization of the pulsed light beam.


Patent
Cymer Inc | Date: 2015-10-27

A lithography system includes an optical source configured to emit a pulsed light beam; a lithography apparatus including an optical system, the optical system being positioned to receive the pulsed light beam from the optical source at a first side of the optical system and to emit the pulsed light beam at a second side of the optical system; and a control system coupled to the optical source and the optical lithography apparatus, the control system configured to: receive an indication of an amount of energy in the pulsed light beam at the second side of the optical system, determine an energy error, access an initial control sequence, the initial control sequence being associated with the optical source, determine a second control sequence based on the determined energy error and the initial control sequence, and apply the second control sequence to the optical source.


Patent
Cymer Inc and ASML Netherlands BV | Date: 2017-04-12

A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus, The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.


Patent
Cymer Inc | Date: 2016-02-03

A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.


Patent
Cymer Inc | Date: 2015-12-22

Corrosion resistant electrodes are formed of brass that has been doped with phosphorus, arsenic, antimony, or combinations thereof. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, arsenic, or antimony, and the brass has no visible microporosity at a magnification of 400. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light.


Patent
Cymer Inc | Date: 2015-05-22

A metrology system includes an optical frequency separation apparatus in the path of the pulsed light beam and configured to interact with the pulsed light beam and output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; a plurality of sensing regions that receive and sense the output spatial components; and a control system connected to an output of each sensing region. The control system is configured to: measure, for each sensing region output, a property of the output spatial components from the optical frequency separation apparatus for one or more pulses; analyze the measured properties including averaging the measured properties to calculate an estimate of the spectral feature of the pulsed light beam; and determine whether the estimated spectral feature of the pulsed light beam is within an acceptable range of values of spectral features.


Patent
Cymer Inc | Date: 2015-07-08

A system includes a first actuation module coupled to a first actuatable apparatus of an optical source, the first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam; a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; and a control system configured to receive an indication regarding the operating state of the first actuatable apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or desaturate the first actuatable apparatus if the first actuatable apparatus is saturated.


A device is described herein which may comprise an optical amplifier having a gain band including wavelengths _(1 )and _(2), with _(1)_(2); a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength _(1); a main pulse seed laser generating a laser output having wavelength, _(2); and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.


A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.


Patent
Cymer Inc | Date: 2015-04-08

A wavelength error for each pulse in a first subset of pulses emitted from an optical source is determined, the wavelength error being the difference between a wavelength for a particular pulse and a target wavelength; a pulse-by-pulse correction signal is determined based on the determined wavelength error, the pulse-by-pulse correction signal including a correction signal associated with each pulse in the first subset of pulses; and a correction based on the determined pulse-by-pulse correction signal is applied to each pulse in a second subset of pulses emitted from the optical source, where applying a correction to a pulse in the second subset of pulses reduces the wavelength error of the pulse in the second subset of pulses.

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