San Diego, CA, United States
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Patent
Cymer Inc and ASML Netherlands BV | Date: 2017-04-12

A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus, The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.


Patent
Cymer Inc | Date: 2017-04-24

A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.


Patent
Cymer Inc | Date: 2016-04-19

A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.


Patent
Cymer Inc | Date: 2015-10-28

A photolithography system includes an optical system, an actuation apparatus, and a control module. The optical system includes an optical source that produces a pulsed light beam traveling along a beam path; a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; and an optical element positioned to interact with the pulsed light beam. The actuation apparatus is coupled to the optical element. The actuation apparatus is configured to adjust a physical property of the optical element based on a control signal from the control module to thereby adjust a polarization of the pulsed light beam.


Patent
Cymer Inc | Date: 2017-02-17

A system includes a first actuatable apparatus of an optical source, the first actuatable apparatus being altered within a range of values about a target value to thereby alter a spectral feature of the light beam; a second actuatable apparatus of the optical source, the second actuatable apparatus being altered to thereby alter the spectral feature of the light beam; a metrology system including an observation system configured to output an indication of a deviation between the actual value at which the first actuatable apparatus is operating and the target value; and a control system configured to determine whether the deviation is greater than an acceptable deviation, and, if it is greater than the acceptable deviation, then send a signal to a second actuation module controlling the second actuatable apparatus to adjust the actual value at which the first actuatable apparatus is operating to be closer to the target value.


Patent
Cymer Inc and Asml Netherlands B.V. | Date: 2015-12-21

Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.


Patent
Cymer Inc | Date: 2015-10-27

A lithography system includes an optical source configured to emit a pulsed light beam; a lithography apparatus including an optical system, the optical system being positioned to receive the pulsed light beam from the optical source at a first side of the optical system and to emit the pulsed light beam at a second side of the optical system; and a control system coupled to the optical source and the optical lithography apparatus, the control system configured to: receive an indication of an amount of energy in the pulsed light beam at the second side of the optical system, determine an energy error, access an initial control sequence, the initial control sequence being associated with the optical source, determine a second control sequence based on the determined energy error and the initial control sequence, and apply the second control sequence to the optical source.


Patent
Cymer Inc | Date: 2016-02-03

A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.


Patent
Cymer Inc | Date: 2015-12-22

Corrosion resistant electrodes are formed of brass that has been doped with phosphorus, arsenic, antimony, or combinations thereof. The electrodes are formed of brass that contains about 100 ppm to about 1,000 ppm of phosphorus, arsenic, or antimony, and the brass has no visible microporosity at a magnification of 400. The brass may be cartridge brass that contains about 30 weight percent of zinc and the balance copper. Corrosion resistant electrodes also may be formed by subjecting brass to severe plastic deformation to increase the resistance of the brass to plasma corrosion. The corrosion resistant electrodes can be used in laser systems to generate laser light.


Patent
Cymer Inc | Date: 2015-07-08

A system includes a first actuation module coupled to a first actuatable apparatus of an optical source, the first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam; a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; and a control system configured to receive an indication regarding the operating state of the first actuatable apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or desaturate the first actuatable apparatus if the first actuatable apparatus is saturated.

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