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Patent
Changzhou Tronly New Electronic Materials Co. and Changzhou Tronly Advanced Electronic Materials Co. | Date: 2015-03-17

A bisoxime ester photoinitiator as represented by general formula (I). By introducing a bisoxime ester group and a cycloalkylalkyl group into the chemical structure, this photoinitiator not only has excellent performance in aspects of storage stability, photosensitivity, developability, pattern integrity, and the like, but also exhibits obviously improved photosensitivity and thermal stability compared to similar photoinitiators.


Zheng K.,Beijing University of Chemical Technology | Zhu X.,Beijing University of Chemical Technology | Qian X.,Changzhou Tronly New Electronic Materials Co. | Li J.,Changzhou Tronly New Electronic Materials Co. | And 2 more authors.
Polymer International | Year: 2016

The cationic photopolymerization of 3-benzyloxymethyl-3-ethyl-oxetane (MOX104) initiated by triphenylsulfonium hexafluoroantimonate under UV light was conducted. The kinetics were investigated by real-time Fourier transform IR spectroscopy and the mechanical and thermal properties of poly(MOX104) were examined by dynamic mechanical analysis and TGA. To adjust the properties of the polymer, different initiator concentrations and comonomer composition were applied. The results showed that the conversion of MOX104 was improved significantly from 17% to almost 90% by adding a certain amount of 3,4-epoxycyclohexane carboxylate or diglycidyl ether of bisphenol A epoxy resin, while not much effect was observed by adding 1,4-butanediol diglycidyl ether. Moreover, the glass transition temperature, decomposition temperature and Young's modulus of poly(MOX104) were improved by adding different amounts of diglycidyl ether of bisphenol A epoxy resin. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry


Ma G.,Beijing University of Chemical Technology | Ma G.,Changzhou Institute of Advanced Materials | Qian B.,Changzhou Tronly New Electronic Materials Co. | Yang J.,Changzhou Tronly New Electronic Materials Co. | And 3 more authors.
International Journal of Biological Macromolecules | Year: 2010

A novel chitosan derivative carrying the benzene group was synthesized by Michael reaction. The chemical structures of the compounds were characterized by FT-IR, UV-vis spectrometry, XRD, elemental analysis, and 1H NMR spectroscopy in detail. The degree of substitution (DS) of chitosan derivative was calculated by elemental analysis. The UV-vis results indicated that the derivatives had ultraviolet absorption at 265 and 273nm. XRD analysis showed that the derivatives were amorphous. The derivatives could dissolve in water. Taking advantage of the known capacity of solubility and ultraviolet absorption, the chitosan derivatives opened new possibilities for use as a sunscreen. © 2010.


Peng C.,Changzhou University | Wang K.-M.,Changzhou University | Lu J.,Changzhou University | Qian X.-C.,Changzhou Tronly New Electronic Materials Co. | And 3 more authors.
Yingxiang Kexue yu Guanghuaxue/Imaging Science and Photochemistry | Year: 2012

The photopolymerization kinetics of combination photoinitiator systems which were composed by 2, 2', 5-tris(2-fluorophenyl)-4-(3, 4-dimethoxypheny)-4', 5'-diphenyl-1, 1'-biimdazole (WJ-HABI), photosensitizer N, N-bis(diethylamino) benzophenone (EMK) and hydrogen donors N-pheylglycine (NPG) were investigated by Real-time Infrared (RT-IR) spectroscopy. The different initiator concentrations, the different compositions of photoinitiator systems, light intensity and different functional monomers on the polymerization were studied. The results indicated that with the increase of initiator concentration and light intensity, the double bond conversion and the polymerization rate increased.


Song G.-Q.,Changzhou University | Chen X.,Changzhou University | Shen L.,Changzhou University | Hu C.-Q.,Changzhou Tronly New Electronic Materials Co.
Xiandai Huagong/Modern Chemical Industry | Year: 2012

Bisphenol fluorene acrylate plays an important role in the synthesis of the optical resin material. In this study, 9, 9'-bis (4-hydroxyphenyl) fluorene (bisphenol fluorene, I) is synthesized with fluorenone and phenol as raw material. 9, 9'-Bis(4-oxiranylmethoxyphenyl) fluorene (bisphenol fluorene diglycidyl ether epoxy resin, II) is prepared by the reaction of I with epichlorohudrin. Finally, II reacts with acrylic acid to get 9, 9'-bis[4-(2'-hydroxy-3'acryloyloxy-propoxy)phenyl] fluorene (Bisphenol fluorene acrylic resin, III). The results indicate that the yield of I is more than 95.6% and the purity is up to 99.0% when using the acid catalyzed process and the weak base in the post-process. Moreover, in the presence of dimethylimidazole, the yield of II is up to 92.8% and the purity is more than 96.5%. Finally, when using tetrabutylammonium bromide as the catalyst and methoxyphenol as the inhibitor agent, the purity of III is 96.0% and the yield is 93.0%. The total yield of three steps is 83.0%. The clean production technology is optimized by studying the main factors affecting the reactions.


Wu W.-T.,Changzhou University | Ma G.-P.,Changzhou Institute of Advanced Materials | Lu J.,Changzhou University | Fang D.-W.,Changzhou University | And 3 more authors.
Yingxiang Kexue yu Guanghuaxue/Imaging Science and Photochemistry | Year: 2013

2, 2', 4-(2-chlorophenyl)-5-(3, 4-dimethoxyphenyl)-4', 5'-diphenyl-1, 1'-two imidazole (CZ-HABI) is a highly efficient UV initiator. Its characteristics were investigated by FTIR and 1HNMR and UV absorption spectra. The compound photointiator systems consisted of photoinitiator 2, 2', 4-(2-chlorophenyl)-5-(3, 4-dimethoxyphenyl)-4', 5'-diphenyl-1, 1'-two imidazole (CZ-HABI), photosensitizer 4, 4'-bis (diethylamino)benzophenone(EMK) and hydrogen donor N-phenyl glycine (NPG). Real time infrared spectroscopy (RT-IR) was used to study the effect of polymerized kinetics of compound photointiator systems. The results indicated that basically no initiation efficient without hydrogen donor, while the effect of initiation efficient boosted greatly in the case of adding hydrogen donor. When concentration of compound photointiator systems increased, the conversion rate of the double bond can been enhanced. Its maximum polymerization rate accorded with the direct proportion relationship of Rp∝(PI)1/2. The conversion rate of the double bond of the monomer and maximum reaction rate were enlarged accompanying with the light intensity strengthened. The final conversion rate of the double bond of diacrylate monomer was higher than that of triacrylate monomer. Initiator efficiency of complex photoinitiator system was better than conventional ITX/EDAB initiator system, and similar to initiator efficiency of 184, 1173.


Patent
Changzhou Tronly New Electronic Materials Co. and Changz Pioneer Electronic Materials Co. | Date: 2015-03-17

This present invention discloses a nitro-containing bisoxime ester photoinitiator having a structure represented by general formula (I). This photoinitiator has excellent application performances in terms of storage stability, photosensitivity, developability, pattern integrity, etc., and it has good adaptability to single-wavelength UV-LED light sources and exhibits a photosensitive property, which is obviously superior to those of existing photoinitiators, under the irradiation of UV-LEDs.


Patent
Changzhou Tronly New Electronic Materials Co. | Date: 2012-01-18

A carbazole oxime ester photoinitiator and the preparation method thereof. The structure of the carbazole oxime ester photoinitiator is shown as the formula ( I ), in which the group R is the aliphatic hydrocarbon group substituted by the cycloalkyl, the cycloalkyl is the aliphatic cycle from cyclopropyl to cyclooctyl; the linking group between the cycloalkyl and the oxime ester group is the linear aliphatic hydrocarbon group, generally, the chain length thereof is 1-5 carbon atoms. The carbazole oxime ester compound with this structure is a new compound, and it has good performance of photoinitiators.


Patent
Changzhou Tronly New Electronic Materials Co. | Date: 2012-03-28

A kind of ketoxime ester compound used as photoinitiator, especially a kind of ketoxime ester photoinitiator used as the photocuring material, wherein said ketoxime ester photoinitiator has following general formula (I): wherein R_(1) is formula (II), n is the integer of 14, m is the integer of 16; R_(2) is C1-8 alkyl, phenyl, substituted phenyl, benzyl, or substituted benzyl; R_(3) is diphenylthioether group, substituted diphenylthioether group, carbazyl group or substituted carbazyl. The ketoxime ester photoinitiator solves the problems that the existing ketoxime ester photoinitiator such as OXE-1 has bad application performance and bad thermal stability.


Trademark
Changzhou Tronly New Electronic Materials Co. | Date: 2015-11-24

Chemicals used in industry; photographic sensitizers; photographic developers.

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