Ube, Japan
Ube, Japan

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Patent
Central Glass Company | Date: 2016-12-12

Disclosed in the present invention are a fluorine-containing polymerizable compound of the general formula (1) and a polymer compound obtained therefrom: where A represents a single bond, an oxygen atom, a sulfur atom, SO_(2), CH_(2), CO, C(CH_(3))_(2), C(CH_(3))(CH_(2)CH_(3)), C(CF_(3))_(2), C(CH_(3))(C_(6)H_(5)), CH_(2)C_(6)H_(4)CH_(2 )or a divalent organic group obtained by elimination of two hydrogen atoms from benzene, biphenyl, naphtharene, cyclohexene or fluorene; and a and b each independently represent an integer of 0 to 2 and satisfy a relationship of 1a+b4. The thus-obtained polymer compound combines adequate hydrophilicity and high transparency with low water adsorption of fluorine-containing compound.


Automotive window glass to which a molding for sealing space between a car body and the window glass is to be attached, the window glass including, an attachment starting point mark indicating an attachment starting point of the molding, and at least one of a termination starting point mark and a termination last point mark in a specification range in which a termination of the molding, of which an attachment to the window glass being started from the attachment starting point, is to be placed.


Patent
Central Glass Company | Date: 2016-09-13

A dry etching method provided to involve the steps of: (a) disposing a substrate within a chamber, the substrate having an amorphous carbon film; (b) preparing a plasma gas by converting a dry etching agent into a plasma, the dry etching agent containing at least oxygen and alkylsilane; and (c) conducting plasma etching on the amorphous carbon film by using the plasma gas and an inorganic film as a mask.


Patent
Tokyo Electron and Central Glass Co. | Date: 2016-07-25

An etching method includes a step of etching a cobalt film formed on a surface of a target object by supplying an etching gas containing -diketone and an oxidizing gas for oxidizing the cobalt film to the target object. The supply of the etching gas and the oxidizing gas is carried out such that a flow rate ratio of the oxidizing gas to the etching gas is ranging from 0.5% to 50% while heating the target object to a temperature lower than or equal to 250 C.


Patent
Central Glass Company | Date: 2016-11-10

[Problem] To provide a method for preparing a protective film-forming liquid chemical, in a method for producing a wafer having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern. The liquid chemical forms a water-repellent protective film on the uneven pattern of the wafer and improves a cleaning step which tends to induce a pattern collapse, and particularly provides a good persistence (pot life) of the improving effect. [Solution] A method for preparing a liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming a water-repellent protective film at the time of cleaning the wafer at least on surfaces of recessed portions of the uneven pattern, the liquid chemical containing a nonaqueous organic solvent, a silylation agent, and an acid or base. The method for preparing a liquid chemical for forming a water-repellent protective film is characterized by including:


Patent
Central Glass Company | Date: 2017-01-04

Disclosed is a method for producing a fluoroalkanesulfonic anhydride, which is characterized in that a reaction is conducted while kneading a fluoroalkanesulfonic acid and diphosphorus pentoxide in a molar ratio of 2.0 or greater and less than 3.0, at a temperature that is 40 C or higher and is lower than 100 C by using a kneader-type reactor having a maximum power of 1.0 kW or greater per an actual capacity of 100 L and equipped with at least two-shaft blades, that the fluoroalkanesulfonic anhydride to be generated is discharged, and that, while the residue in the reactor after the discharge is kneaded at a temperature that is 100 C or higher and is lower than 140 C, the unreacted fluoroalkylsulfonic acid is discharged, recovered and reused as the raw material. It is possible by this method to obtain a fluoroalkanesulfonic anhydride with a high yield.


Patent
Central Glass Company | Date: 2016-06-22

Provided is a novel non-flammable heat transmission composition having little load on the environment and having improved heat transmission characteristics. A heat transmission method using a high-temperature heat pump system accommodating a heat transmission composition includes the step of evaporating the heat transmission composition, the step of compressing the heat transmission composition, the step of condensing the heat transmission composition, and the step of decreasing the pressure of the heat transmission composition at a temperature of 70C or higher, which are performed sequentially. The heat transmission composition contains cis-1,3,3,3-tetrafluoropropene at a mass ratio of 95.0% by mass or more and 99.9% by mass or less, and contains trans-1,3,3,3-tetrafluoropropene or 2,3,3,3-tetrafluoropropene at a mass ratio of 0.1% by mass or more and 5.0% by mass or less; and the heat transmission composition has a condensation temperature of 70C or higher.


Patent
Central Glass Company | Date: 2016-05-18

A production method of an optically active fluorolactic derivative according to the present invention includes asymmetrically reducing a fluoropyruvic acid derivative (or fluoropyruvic acid hydrate) with the use of an -keto acid dehydrogenase or -keto acid reductase. The optically active fluorolactic derivative can be obtained with high optical purity under mild reaction conditions by the asymmetric reduction reaction of the fluoropyruvic acid derivative with the specific enzyme.


Patent
Central Glass Company | Date: 2016-09-14

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.


Patent
Central Glass Company | Date: 2016-05-25

A phosphor-dispersed glass according to one aspect of the present invention includes phosphor particles and a phosphor encapsulant, wherein the phosphor encapsulant is a fluoride glass material containing 1 to 45 mol% of AlF_(3), 30 to 60 mol% of a sum of a fluoride of Hf and a fluoride of Zr, 20 to 65 mol% of alkaline earth fluorides in total, 2 to 25 mol% in total of at least one fluoride of element selected from the group consisting of Y, La, Gd and Lu and 0 to 20 mol% in total of at least one fluoride of element selected from the group consisting of Na, Li and K. It is feasible in this phosphor-dispersed glass to suppress deactivation of the phosphor particles regardless of the kind of the phosphor.

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