Wang J.,CENIMAT I3N and CEMOP UNINOVA |
Elamurugu E.,CENIMAT I3N and CEMOP UNINOVA |
Franco N.,Technological and Nuclear Institute of Portugal |
Alves E.,Technological and Nuclear Institute of Portugal |
And 4 more authors.
Journal of Nanoscience and Nanotechnology | Year: 2010
N-doped ZnO films were deposited on glass substrates by RF magnetron sputtering with different deposition pressures. The samples were characterized by X-ray diffraction (XRD), atomic force morphology (AFM), X-ray photoelectron spectroscopy (XPS), Hall measurements and optical spectrophotometer. The XRD patterns confirmed that the films are polycrystalline and the influence of deposition pressure on the structural properties. AFM microstructures also authenticated the change in the size and shape of the grains as a function of deposition pressure; the root mean square (RMS) roughness has reached a maximum (10.65 nm) at 1.5 x 10 -2 mbar. XPS spectra revealed the change in the chemical composition. The amount of adsorbed oxygen and nitrogen at oxide sites has reached the maximum at 9.0 x 10 -3 mbar, where the film showed p-type conductivity. The optical transmittance spectra have indicated that the absorption edge is shifted towards the shorter wavelength at higher deposition pressure. Correspondingly, the optical band gap is increased from 2.17 to 2.80 eV. The average visible transmittance in the wavelength ranging 500-800 nm has been increased from 49% to 82%. Copyright © 2010 American Scientific Publishers All rights reserved. Source
Nolan M.G.,Tyndall National Institute |
Hamilton J.A.,Tyndall National Institute |
Obrien S.,Tyndall National Institute |
Bruno G.,University of Calabria |
And 5 more authors.
Journal of Photochemistry and Photobiology A: Chemistry | Year: 2011
Indium doped, and undoped, zinc oxide films were deposited using aerosol assisted chemical vapour deposition (AACVD) at atmospheric pressure on glass substrates. Electrical measurements (I-V) showed a reduction in resistivity following the addition of indium, and XRD analysis revealed an associated switch to c-axis preferred crystal orientation. The ability of the films to oxidise organic material on their surface was analysed using stearic acid as the model contaminant under ultra-violet (UV, 365 nm) irradiation. The In-doped films displayed a greater rate of organic decomposition, which we attribute to the formation of a platelet surface structure having a larger surface area than the undoped films, on which the UV generated electrons and holes may react to form active photocatalytic species. In addition we suggest that the switch to c-axis crystal orientation may reduce the electron-hole pair recombination rate at the grain boundaries, due to an improvement in crystallinity and related reduction in carrier scattering losses, leading to an increase in photocatalytic organic decomposition rate. © 2011 Elsevier B.V. All rights reserved. Source
Gokulakrishnan V.,Bharathidasan University |
Parthiban S.,Bharathidasan University |
Elangovan E.,CENIMAT I3N and CEMOP UNINOVA |
Ramamurthi K.,Bharathidasan University |
And 5 more authors.
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | Year: 2011
Indium oxide thin films deposited by spray pyrolysis were irradiated by 100 MeV O7+ ions with different fluences of 5 × 1011, 1 × 1012 and 1 × 1013 ions/cm2. X-ray diffraction analysis confirmed the structure of indium oxide with cubic bixbyite. The strongest (2 2 2) orientation observed from the as-deposited films was shifted to (4 0 0) after irradiation. Furthermore, the intensity of the (4 0 0) orientation was decreased with increasing fluence together with an increase in (2 2 2) intensity. Films irradiated with maximum fluence exhibited an amorphous component. The mobility of the as-deposited indium oxide films was decreased from ∼78.9 to 43.0 cm2/V s, following irradiation. Films irradiated with a fluence of 5 × 1011 ions/cm2 showed a better combination of electrical properties, with a resistivity of 4.57 × 10-3 Ω cm, carrier concentration of 2.2 × 1019 cm-3 and mobility of 61.0 cm2/V s. The average transmittance obtained from the as-deposited films decreased from ∼81% to 72%, when irradiated with a fluence of 5 × 1011 ions/cm2. The surface microstructures confirmed that the irregularly shaped grains seen on the surface of the as-deposited films is modified as "radish-like" morphology when irradiated with a fluence of 5 × 1011 ions/cm2. © 2011 Elsevier B.V. All rights reserved. Source