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Mesic B.,Julich Research Center | Mesic B.,Cemecon AG | Schroeder H.,Julich Research Center
Thin Solid Films

TaSiN is a promising material for application as electrically conductive diffusion barrier for the integration of high permittivity perovskite materials in integrated circuits. TaSiN thin films were deposited by reactive radio frequency magnetron sputtering using TaSi and TaSi 2.7 targets in an Ar/N 2 atmosphere. The sputter power was varied in order to achieve different TaSiN compositions. The stoichiometry of as-deposited films was estimated using Rutherford backscattering spectroscopy. The as-deposited TaSiN thin films are amorphous. Their crystallization temperature is above 700 °C and increases with higher nitrogen content. They have metallic conduction and ohmic behavior. The resistivity of as deposited films is in the range from 10 - 6 Ω m up to 10 - 3 Ω m and increases with nitrogen content. It was found that p ++-Si/Ta 21Si 57N 21 develops unacceptable high contact resistance. Introducing an intermediate Pt layer the stack p ++-Si/Pt/Ta 21Si 57N 21 had a good conductive properties and good thermal stability at 700 °C. © 2012 Elsevier B.V. All rights reserved. Source

Keunecke M.,Fraunhofer Institute for Surface Engineering and Thin Films | Stein C.,Fraunhofer Institute for Surface Engineering and Thin Films | Bewilogua K.,Fraunhofer Institute for Surface Engineering and Thin Films | Koelker W.,Cemecon AG | And 2 more authors.
Surface and Coatings Technology

Coatings like TiN or TiAlN are well established as hard and wear resistant tool coatings. These coatings often are prepared by PVD techniques like arc evaporation or d.c. magnetron sputtering. Typical micro hardness values of such hard coatings are in the range of 30. GPa. Compared to d.c. magnetron sputtering processes the pulsed magnetron sputter deposition technique could be shown as a clear advancement. Furthermore pure TiAlN hard coatings as well as TiAlN coatings modified by addition of elements like Si and Cr were prepared in order to improve the coating properties using the pulsed magnetron sputter technique in a batch coater equipped with 4 targets. Coatings prepared with the pulsed sputter process showed both high hardness and high wear resistance. The application potential of pulsed sputtered TiAlN coatings is demonstrated by turning test results of coated cemented carbide cutting inserts.Beside hardness and wear, other properties like adhesion or high temperature stability were determined. Cross sectional SEM images revealed the growth structure in dependence of the applied substrate bias and of the added elements. The chemical composition of the coatings was investigated by electron microprobe analysis and the phase and crystal size were determined by X-ray diffraction. Using the pulsed magnetron sputter process the coating properties, especially the hardness and the morphology, could be significantly improved. With indentation hardness values in the range of 40. GPa the region of super hard materials could be reached. © 2010 Elsevier B.V. Source

Panjan M.,Jozef Stefan Institute | Cekada M.,Jozef Stefan Institute | Panjan P.,Jozef Stefan Institute | Zupanic F.,University of Maribor | Kolker W.,Cemecon AG

In industrial PVD deposition systems the substrates usually move in a so-called planetary rotation in order to deposit a homogeneous coating on the whole surface area of the tools. In this study we compared microstructure, surface topography and hardness of the coatings, deposited in the same batch but using different types of rotation: one-fold, two-fold and three-fold. The coating was a multilayer TiAlN/VN, deposited by magnetron sputtering. Microstructure was studied on cross-sectioned samples using SEM, prepared either by fracture or by focused ion beam. Coatings prepared by two-fold and three-fold rotation were very similar, both in microstructure and in hardness. They had dense, only slightly columnar microstructure. In contrast, coatings prepared by single rotation had a pronounced columnar microstructure, and substantially lower hardness. © 2011 Elsevier Ltd. All rights reserved. Source

Rovere F.,University of Leoben | Rovere F.,RWTH Aachen | Music D.,RWTH Aachen | Ershov S.,RWTH Aachen | And 4 more authors.
Journal of Physics D: Applied Physics

The phase stability of Al-containing cubic transition metal (TM) nitrides, where Al substitutes for TM (i.e. TM1-xAlxN), is studied as a function of the TM valence electron concentration (VEC). X-ray diffraction and thermal analyses data of magnetron sputtered Ti1-xAl xN, V1-xAlxN and Cr1-xAl xN films indicate increasing phase stability of cubic TM 1-xAlxN at larger Al contents and higher temperatures with increasing TM VEC. These experimental findings can be understood based on first principle investigations of ternary cubic TM1-xAlxN with TM = Sc, Ti, V, Cr, Y, Zr and Nb where the TM VEC and the lattice strain are systematically varied. However, our experimental data indicate that, in addition to the decomposition energetics (cubic TM1-xAlxN → cubic TMN + hexagonal AlN), future stability models have to include nitrogen release as one of the mechanisms that critically determine the overall phase stability of TM1-xAlxN. © 2010 IOP Publishing Ltd. Source

CemeCon AG | Date: 2015-10-26

A device and method for generating an electrical discharge are described. A first electrode (

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