Oberkochen, Germany
SEARCH FILTERS
Time filter
Source Type

The invention relates to a surgical system comprising: an operating microscope having an imaging optic and a control unit for adjusting imaging parameters of the operating microscope; an image processing device for overlaying an overlay image, saved in the image processing device, with an image generated by the operating microscope; and a data processing unit that is connected to the control unit of the operating microscope and to the image processing device, wherein control unit, in the case of a change of at least one imaging parameter, such as adjustment parameters of zoom, focus, position and alignment in the range of the operating microscope, from a first value to a second value, is designed to save both the first value and the second value and to make same available to the data processing unit, and wherein the image processing device is designed in such a way that it modifies the overlay image according to the saved first and second values of the at least one imaging parameter.


A method for generating cut surfaces in the cornea of an eye in order to correct ametropia using an apparatus. The method includes providing the apparatus including a laser unit, which focuses pulsed laser radiation into the cornea and moves the focused radiation in the cornea to generate cut surfaces, and a control unit, which controls the laser unit for generating cut surfaces. The method includes forming at least two mutually spaced apart cut surfaces as opening cuts by application of the pulsed laser radiation from the laser unit, each opening cut extending from an anterior corneal surface into the cornea and forming a further cut surface as a relieving cut by application of the pulsed laser radiation from the laser unit, which relieving cut extends from the anterior corneal surface into the cornea. The position and shape of the relieving cut is selected such that the relieving cut contributes to the correction of the ametropia of the eye.


Patent
Carl Zeiss GmbH | Date: 2017-01-30

A probe head for a coordinate measuring machine has a first probe head part with an interface, for coupling the probe head to the coordinate measuring machine. A second probe head part is coupled to the first probe head part and is rotatable relative to the first probe head part about a first axis. A third probe head part is coupled to the second probe head part and is pivotable relative to the second probe head part about a second axis. The first and second axes lie askew in relation to each other. A first actuator pivots the third probe head part about the second axis via a push rod coupled to the third probe head part at a lateral distance from the second axis. The first actuator moves the push rod in a longitudinal direction to pivot the third probe head part relative to the second probe head part.


A method for creating a measurement protocol in a computer, such as the measurement computer of a coordinate-measuring machine or a computer remote therefrom, includes: providing data necessary for creating a measurement protocol generated on the basis of a measurement sequence by the coordinate-measuring machine; providing specification data specifying predefined conditions under which a measurement sequence should be performed and/or specifying predefined conditions under which examination features should be evaluated; checking the data necessary for creating a measurement protocol as to whether the predefined conditions under which the entire measurement sequence should be performed were met and/or as to whether the predefined conditions under which individual examination features to be examined should be evaluated were met, and; creating a measurement protocol in the form of an electronic document, in which compliance and/or non-compliance with the conditions in accordance with the specification data is documented in the measurement protocol.


The invention relates to a method of determining a barrier effect of a coating (4) for a medium (17), which is characterized by the following steps: a) providing a substrate (1) having the coating (4) on its surface, said substrate undergoing a change in volume on contact with the medium (17), b) conditioning the substrate (1) with the coating (4), c) removing the coating (4) from a first part of the surface (6) of the substrate (1), leaving the coating (4) on a second part of the surface of the substrate (1), the first part of the surface (6) having an extent in a first direction delimited by the coating (4) remaining on the second part of the surface, d) determining a first height profile of a surface of the coating (4) on the second part of the surface and the first part of the surface (6) of the substrate (1) on a path in the first direction, e) exposing the surface of the remaining coating (4) and the first part of the surface (6) of the substrate (1) to the medium (17), f) determining a second height profile of the surface of the coating (4) on the second part of the surface and the first part of the surface (6) of the substrate (1) on the path in the first direction and/or determining a first difference in height profile of the surface of the coating (4) on the second part of the surface and the first part of the surface (6) of the substrate (1) on the path in the first direction with respect to the height profile determined beforehand.


The invention relates to an eyeglass lens for a display device (1), which display device can be placed on the head of a user and produces an image, wherein the eyeglass lens (3) has a front side (18) and a back side (15), an incoupling segment (11) and an outcoupling segment (13) spaced apart from the incoupling segment (11), and a light-conducting channel (12), which is suitable for conducting light bundles (9) of pixels of the produced image, which are coupled into the eyeglass lens (3) via the incoupling segment (11) of the eyeglass lens (3), in the eyeglass lens (3) to the outcoupling segment (13), by means of which the light bundles are coupled out of the eyeglass lens (3), wherein the light-conducting channel (12) has a first reflective layer (21, 22), which extends from the incoupling segment (11) to the outcoupling segment (13) and at which the light bundles (9) are reflected in order to conduct the light bundles to the outcoupling segment (13), wherein the first reflective layer (21, 22) has at least one transparent gap (24, 26).


The invention relates to a method for training a preferred retinal locus of fixation for a person having an eye with a field of vision comprising an area of partially diminished or entirely degenerated visual acuity. The method is characterized in the steps: a) determining an inefficient retinal region in said field of vision of said eye of said person and b) inducing a preferred retinal locus of fixation for a vision task outside said inefficient retinal region. In addition the invention relates to a device for training a preferred retinal locus of fixation for a person having an eye with a field of vision comprising an area of partially diminished or entirely degenerated visual acuity. The device is characterized in an inducing arrangement for inducing a preferred retinal locus of fixation for a vision task outside an inefficient retinal region in said field of vision of said eye of said person.


Grant
Agency: European Commission | Branch: H2020 | Program: RIA | Phase: NMBP-26-2016 | Award Amount: 7.49M | Year: 2017

The npSCOPE project aims at developing a new integrated instrument (the nanoparticle-scope) optimised for providing a complete physico-chemical characterisation of nanoparticles both in their pristine form or embedded in complex matrices such as biological tissues. Using sophisticated correlative data processing methodologies and algorithms based on statistical methods in conjunction with appropriate visualisation methods of the results, the npSCOPE instrument will allow rapid, accurate and reproducible measurements. The instrument will be based on the Gas Field Ion Source as a key enabling technology, which we will combine with a number of new developments in the field of electron and ion microscopy. We will progressively ramp up the TRL of the instrument and associated methodologies to reach TRL 7 by the end of the project. The new technology, and all related processes and methodologies, will be validated via round-robin studies performed independently by several partner institutions, crosschecked with conventional analysis technologies to demonstrate the advancements and capabilities of the npSCOPE technology and benchmarked in representative case studies. Given the low sample quantities needed and the strong potential of the instrument to generate high-quality physico-chemical data on nanomaterials, both ex situ and in situ, npSCOPE will allow a major step forward in defining key descriptors for read-across, grouping, in silico modelling and creating meaningful relationships with biological activity data for QSAR purposes. To reach these objectives, the project consortium will be composed of research centres internationally recognised for innovative instrument developments, well-established instrument manufacturers and experts in nanotoxicology in various fields of application to demonstrate and validate the applicability of npSCOPE for the risk assessment of nanomaterials in consumer products.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-15-2015 | Award Amount: 150.05M | Year: 2016

The TAKE5 project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 10nm technology node and the ECSEL JU project SeNaTe aiming at the 7nm technology node. The main objective of the TAKE5 project is the demonstration of 5nm patterning in line with the industry needs and the ITRS roadmap in the Advanced Patterning Center at the imec pilot line using innovative design and technology co-optimization, layout and device architecture exploration, and comprising demonstration of a lithographic platform for EUV technology, advanced process and holistic metrology platforms and new materials. A lithography scanner will be developed based on EUV technology to achieve the 5nm module patterning specification. Metrology platforms need to be qualified for 5nm patterning of 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 5nm technology modules new materials will need to be introduced. Introduction of these new materials brings challenges for all involved deposition processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch steps will be studied. The project will be dedicated to find the best options for patterning. The project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 5nm resolution in high-volume manufacturing and fast prototyping. The project touches the core of the continuation of Moores law which has celebrated its 50th anniversary and covers all aspects of 5nm patterning development.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.

Loading Carl Zeiss GmbH collaborators
Loading Carl Zeiss GmbH collaborators