Oberkochen, Germany

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The invention relates to a method for training a preferred retinal locus of fixation for a person having an eye with a field of vision comprising an area of partially diminished or entirely degenerated visual acuity. The method is characterized in the steps: a) determining an inefficient retinal region in said field of vision of said eye of said person and b) inducing a preferred retinal locus of fixation for a vision task outside said inefficient retinal region. In addition the invention relates to a device for training a preferred retinal locus of fixation for a person having an eye with a field of vision comprising an area of partially diminished or entirely degenerated visual acuity. The device is characterized in an inducing arrangement for inducing a preferred retinal locus of fixation for a vision task outside an inefficient retinal region in said field of vision of said eye of said person.


Patent
Carl Zeiss GmbH | Date: 2017-01-11

The disclosure provides a method for preparing a cross-section of a sample by milling with a focused ion beam. The cross-section is to be prepared at a pre-defined position (64). The method includes excavating a trench (62) by milling in a first milling direction (67). The first milling direction leads away from the position of the cross-section to be prepared. The method also includes excavating the cross-section by enlarging the trench (63) by milling in the reversed milling direction (66). The second milling direction leads towards the position of the cross-section to be prepared, whereupon the milling is completed at the position where the cross-section is to be cut. The desired largest milling depth is achieved at the completion of this milling step.


Method of determining crystallographic properties of a sample comprises: generating first and second electron beams of electrons having first and second mean kinetic energies, respectively; detecting, for each of first locations of a region of the sample, a two-dimensional spatial distribution of electrons incident onto a detection area while directing the first electron beam onto the first locations; generating, for each of the first locations, first data representing the two-dimensional spatial distribution; detecting, for each of second locations of the region of the sample, a two-dimensional spatial distribution of electrons incident onto the detection area while directing the second electron beam onto the second locations; generating, for each of the second locations, second data representing the two-dimensional spatial distribution; and determining the crystallographic properties for target locations of the region based on the first data of the first locations and the second data of the second locations.


The invention relates to a surgical microscope (10) for producing an observation image of an object region (32) for an observing person. The surgical microscope (10) has an image-recording device (35) for recording an image of the object region (32), a display device (47), and an image-processing and control device (54), which is connected to the image-recording device (35) and to the display device (47) for the visualization of an image of the object region (32) recorded by means of the image-recording device (35). According to the invention, the surgical microscope (10) contains a computing unit (45) for providing object-region image data that are obtained in an imaging method and that can be fed to the display device (47) for display, which computing unit is connected to the image-processing and control device (54). In the surgical microscope (10), there is a switchable imaging optical unit (14), which feeds the observation image of the object region (32) to an eyepiece (22) by means of an optical observation beam path (28) in a first switching state, on which observation image of the object region the object-region image data displayed by means of the display device (47) can be superimposed in a positionally correct manner. In a further switching state different from the first switching state, the switchable imaging optical unit (14) interrupts the purely optical observation beam path (28) from the object region (32) to the eyepiece (22) in order to display in the eyepiece (22) an image of the object region (32) from the optical observation beam path (28), which image is recorded by means of the image-recording device (35) and displayed by means of the display device (47).


The invention relates to a surgical system comprising: an operating microscope having an imaging optic and a control unit for adjusting imaging parameters of the operating microscope; an image processing device for overlaying an overlay image, saved in the image processing device, with an image generated by the operating microscope; and a data processing unit that is connected to the control unit of the operating microscope and to the image processing device, wherein control unit, in the case of a change of at least one imaging parameter, such as adjustment parameters of zoom, focus, position and alignment in the range of the operating microscope, from a first value to a second value, is designed to save both the first value and the second value and to make same available to the data processing unit, and wherein the image processing device is designed in such a way that it modifies the overlay image according to the saved first and second values of the at least one imaging parameter.


Patent
Carl Zeiss GmbH | Date: 2016-12-28

The invention relates to a method for light sheet microscopy. The arrangement comprises: - means for scanning a sample volume (10) to be imaged with a light sheet (9), which encloses an angle 90 with the optical axis (8) of an objective lens (1), wherein - the light sheet (9) penetrates in the propergation direction the entire sample volume (10) to be imaged, and wherein - the depth of focus Sobj of the objective lens (1) is smaller than the depth T of said sample volume (10) in the direction of the optical axis (8), - an optical device downstream of the objective, designed to increase the depth of focus Sobj to a depth of focus Seff, which is greater than or equal to the depth T of said sample volume (10), - means for positioning the sample volume (10) within the region of the depth of focus Seff, - a spatial opto-electronic surface sensor (17) downstream of the optical device, and hardware and software, designed for generating images of the sample volume (10) from the electronic image signals emitted from the surface sensor (17).


Grant
Agency: European Commission | Branch: H2020 | Program: RIA | Phase: NMBP-26-2016 | Award Amount: 7.49M | Year: 2017

The npSCOPE project aims at developing a new integrated instrument (the nanoparticle-scope) optimised for providing a complete physico-chemical characterisation of nanoparticles both in their pristine form or embedded in complex matrices such as biological tissues. Using sophisticated correlative data processing methodologies and algorithms based on statistical methods in conjunction with appropriate visualisation methods of the results, the npSCOPE instrument will allow rapid, accurate and reproducible measurements. The instrument will be based on the Gas Field Ion Source as a key enabling technology, which we will combine with a number of new developments in the field of electron and ion microscopy. We will progressively ramp up the TRL of the instrument and associated methodologies to reach TRL 7 by the end of the project. The new technology, and all related processes and methodologies, will be validated via round-robin studies performed independently by several partner institutions, crosschecked with conventional analysis technologies to demonstrate the advancements and capabilities of the npSCOPE technology and benchmarked in representative case studies. Given the low sample quantities needed and the strong potential of the instrument to generate high-quality physico-chemical data on nanomaterials, both ex situ and in situ, npSCOPE will allow a major step forward in defining key descriptors for read-across, grouping, in silico modelling and creating meaningful relationships with biological activity data for QSAR purposes. To reach these objectives, the project consortium will be composed of research centres internationally recognised for innovative instrument developments, well-established instrument manufacturers and experts in nanotoxicology in various fields of application to demonstrate and validate the applicability of npSCOPE for the risk assessment of nanomaterials in consumer products.


Grant
Agency: European Commission | Branch: H2020 | Program: MSCA-RISE | Phase: MSCA-RISE-2016 | Award Amount: 1.07M | Year: 2017

Space is the foundational characteristic of visual perception and we generally perceive it as continuous and uniform. Behavioural measurements and the properties of our sensory systems however, demonstrate that this is an illusory situation and our percept is constructed by the brain. One example is our lack of awareness of the blind spot that exists in each eye. Space is non-uniformly represented in the visual brain and this representation is dynamically influenced by motor behaviour, in particular by eye movements. The PLATYPUS consortium will investigate the dynamic nature of spatial sensation and perception, focussing on the continuous mutual interaction of motor behaviour and perception. Our research objectives integrate human behavioural and cutting edge non-human primate electrophysiological research techniques and focus on translation of basic into applied research. Focussing on the adaptive nature of vision and action, strategies to perturb and probe perceptual space and geometry will allow measurement of spatial and geometrical perception in humans and the representation of such in non-human primates. This research will extend to applications for people wearing progressive lenses which distort action and space perception, patients with a blind area in their visual field and for virtual reality technology development. PLATYPUS researchers will grow existing and establish new collaborative teams, sharing research techniques, knowledge and mentoring between established and with upcoming researchers in academia and industry. Individuals will benefit from intense scientific and career development training while institutions will benefit from the exchange of state-of-the-art techniques. The ultimate outcome will be increased understanding of the continuously updating neural construction of space and the production of assistive technologies for people needing corrective lenses, with ocular or visual discontinuity and for the growing virtual reality industry.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-15-2015 | Award Amount: 150.05M | Year: 2016

The TAKE5 project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 10nm technology node and the ECSEL JU project SeNaTe aiming at the 7nm technology node. The main objective of the TAKE5 project is the demonstration of 5nm patterning in line with the industry needs and the ITRS roadmap in the Advanced Patterning Center at the imec pilot line using innovative design and technology co-optimization, layout and device architecture exploration, and comprising demonstration of a lithographic platform for EUV technology, advanced process and holistic metrology platforms and new materials. A lithography scanner will be developed based on EUV technology to achieve the 5nm module patterning specification. Metrology platforms need to be qualified for 5nm patterning of 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 5nm technology modules new materials will need to be introduced. Introduction of these new materials brings challenges for all involved deposition processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch steps will be studied. The project will be dedicated to find the best options for patterning. The project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 5nm resolution in high-volume manufacturing and fast prototyping. The project touches the core of the continuation of Moores law which has celebrated its 50th anniversary and covers all aspects of 5nm patterning development.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.

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