Madison, WI, United States
Madison, WI, United States

Bruker Corporation is a manufacturer of scientific instruments for molecular and materials research, as well as for industrial and applied analysis. It is headquartered in Billerica, Massachusetts and is the publicly traded parent company of Bruker Scientific Instruments and Bruker Energy & Supercon Technologies divisions.In April 2010, Bruker created a Chemical Analysis Division under the Bruker Daltonics subsidiary. This division contains three former Varian product lines: ICPMS systems, laboratory gas chromatography , and GC-triple quadrupole mass spectrometer .In 2012 it sponsored the Fritz Feigl Prize. Wikipedia.


Time filter

Source Type

The invention relates to a method for identifying unknown microbes in a sample, wherein a mass spectrometric determination termination down to the taxonomic level of the genus or species is supplemented by a detailed determination of a lower taxonomic level or variety by means of infrared spectrometry, using restricted reference libraries of infrared spectra. These libraries can be genus-specific, containing only infrared spectra of microbes of one genus, or species-specific, containing only infrared spectra of microbes of one species. In so doing, a robust mass spectrometric identification of the species of unknown microbes is advantageously supplemented with a detailed analysis of the subspecies and varieties by means of infrared spectrometry, primarily in order to identify medically important varieties such as pathovars like EHEC and EPEC, and antibiotic-resistant microbes like MRSA.


The invention relates to optically pumped and pulsed solid-state lasers which are used in mass spectrometers in particular for ionization by matrix-assisted laser desorption (MALDI) and which operate at pulse frequencies of up to 10 kilohertz or even higher. The invention proposes that, instead of interrupting the clocked sequence of the laser operation, individual light pulses or groups of light pulses are blanked out so that subsequent light pulses do not have a higher energy density, in accordance with the requirements for LDI processes. Methods and devices for the blanking out of light pulses are provided which are, in particular, low cost and considerably less complex than other methods.


A monofilament (1) for the production of a superconducting wire (20) has a powder core (3) that contains at least Sn and Cu, an inner tube (2), made of Nb or an alloy containing Nb, that encloses the powder core (3), and an outer tube (4) in which the inner tube (2) is arranged. The outer side of the inner tube (2) is in contact with the inner side of the outer tube (4) and the outer tube (4) is produced from Nb or from an alloy containing Nb. The outer tube is disposed in a cladding tube. The superconducting current carrying capacity of the superconducting wire is thereby improved.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 139.30M | Year: 2015

The proposed pilot line project WAYTOGO FAST objective is to leverage Europe leadership in Fully Depleted Silicon on Insulator technology (FDSOI) so as to compete in leading edge technology at node 14nm and beyond preparing as well the following node transistor architecture. Europe is at the root of this breakthrough technology in More Moore law. The project aims at establishing a distributed pilot line between 2 companies: - Soitec for the fabrication of advanced engineered substrates (UTBB: Ultra Thin Body and BOx (buried oxide)) without and with strained silicon top film. - STMicroelectronics for the development and industrialization of state of the art FDSOI technology platform at 14nm and beyond with an industry competitive Power-Performance-Area-Cost (PPAC) trade-off. The project represents the first phase of a 2 phase program aiming at establishing a 10nm FDSOI technology for 2018-19. A strong added value network is created across this project to enhance a competitive European value chain on a European breakthrough and prepare next big wave of electronic devices. The consortium gathers a large group of partners: academics/institutes, equipment and substrate providers, semiconductor companies, a foundry, EDA providers, IP providers, fabless design houses, and a system manufacturer. E&M will contribute to the objective of installing a pilot line capable of manufacturing both advanced SOI substrates and FDSOI CMOS integrated circuits at 14nm and beyond. Design houses and electronics system manufacturer will provide demonstrator and enabling IP, to spread the FDSOI technology and establish it as a standard in term of leading edge energy efficient CMOS technology for a wide range of applications battery operated (consumer , healthcare, Internet of things) or not. Close collaboration between the design activities and the technology definition will tailor the PPAC trade-off of the next generation of technology to the applications needs.


Grant
Agency: European Commission | Branch: H2020 | Program: MSCA-ITN-ETN | Phase: MSCA-ITN-2014-ETN | Award Amount: 3.32M | Year: 2015

OPATHY is an innovative translational research training network that will explore the potential of omics technologies, including genomics, transcriptomics and proteomics, to study the interactions of yeasts that cause disease to humans (e.g. Candida and Cryptococcus sp.) with their host, and to develop new diagnostic tools to monitor yeast infections in the clinic. Today, these infections are poorly understood, difficult to diagnose, and are becoming increasingly frequent and serious, affecting over 300 million people worldwide. OPATHY will exploit omics technologies to investigate host-pathogen interactions during yeast infection and colonization with a primary focus on their potential to develop innovative diagnostics tools to improve health care. For this proteomics, transcriptomics and genomics measurements of strains and infections will be integrated with state of the art computational analyses to identify novel biomarkers able to determine the infection stage, the infective pathogen, and the potential resistance traits. This knowledge will drive the development of diagnostic tools based on the detection of specific DNA sequences (by PCR) or antibodies (by Elisa or proteomics). These tools will be validated in a clinical study of key patient cohorts. The participation of two clinical centers and four companies is of paramount importance for the network to provide an integrative and transversal research and training environment. Importantly, the methodologies and approaches of OPATHY can be easily extended to the study and identification of other human, animal and plant microbial pathogens, or the tracing of relevant industrial organisms. Grounded on solid individual research projects, OPATHY will train Early Stage Researchers in several scientific technologies and fields and transferable skills, to boost their careers as innovative and creative researchers.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-15-2015 | Award Amount: 150.05M | Year: 2016

The TAKE5 project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 10nm technology node and the ECSEL JU project SeNaTe aiming at the 7nm technology node. The main objective of the TAKE5 project is the demonstration of 5nm patterning in line with the industry needs and the ITRS roadmap in the Advanced Patterning Center at the imec pilot line using innovative design and technology co-optimization, layout and device architecture exploration, and comprising demonstration of a lithographic platform for EUV technology, advanced process and holistic metrology platforms and new materials. A lithography scanner will be developed based on EUV technology to achieve the 5nm module patterning specification. Metrology platforms need to be qualified for 5nm patterning of 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 5nm technology modules new materials will need to be introduced. Introduction of these new materials brings challenges for all involved deposition processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch steps will be studied. The project will be dedicated to find the best options for patterning. The project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 5nm resolution in high-volume manufacturing and fast prototyping. The project touches the core of the continuation of Moores law which has celebrated its 50th anniversary and covers all aspects of 5nm patterning development.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-IA | Phase: ECSEL-02-2014 | Award Amount: 181.08M | Year: 2015

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.


Grant
Agency: European Commission | Branch: H2020 | Program: ECSEL-RIA | Phase: ECSEL-06-2015 | Award Amount: 23.11M | Year: 2016

The objective of the 3DAM project is to develop a new generation of metrology and characterization tools and methodologies enabling the development of the next semiconductor technology nodes. As nano-electronics technology is moving beyond the boundaries of (strained) silicon in planar or finFETs, new 3D device architectures and new materials bring major metrology and characterization challenges which cannot be met by pushing the present techniques to their limits. 3DAM will be a path-finding project which supports and complements several existing and future ECSEL pilot-line projects and is linked to the MASP area 7.1 (subsection More Moore). Innovative demonstrators and methodologies will be built and evaluated within the themes of metrology and characterization of 3D device architectures and new materials, across the full IC manufacturing cycle from Front to Back-End-Of-Line. 3D structural metrology and defect analysis techniques will be developed and correlated to address challenges around 3D CD, strain and crystal defects at the nm scale. 3D compositional analysis and electrical properties will be investigated with special attention to interfaces, alloys and 2D materials. The project will develop new workflows combining different technologies for more reliable and faster results; fit for use in future semiconductor processes. The consortium includes major European semiconductor equipment companies in the area of metrology and characterization. The link to future needs of the industry, as well as critical evaluation of concepts and demonstrators, is ensured by the participation of IMEC and LETI. The project will directly increase the competitiveness of the strong Europe-based semiconductor Equipment industry. Closely connected European IC manufacturers will benefit by accelerated R&D and process ramp-up. The project will generate technologies essential for future semiconductor processes and for the applications enabled by the new technology nodes.


Grant
Agency: European Commission | Branch: H2020 | Program: RIA | Phase: SFS-03a-2014 | Award Amount: 7.00M | Year: 2015

Insects are the most diverse Class of life on earth, and different insects can be essential for, or highly damaging to, agriculture, horticulture and forestry. There is a pressing need, not just for new insecticides to combat resistance, but more specific, greener insecticides that target deleterious insects while sparing beneficial ones. This proposal aims to identify such insecticides by turning the insects own hormones against them, both by designing artificial neuropeptide mimetic analogs as candidate compounds, and by generating transgenic insects that carry deleterious neuropeptide payloads within them, that can propagate through a population and impact on survival at times of stress. We have assembled an international multi-actor consortium from EU member and associated member states, as well as a third country partner, with unparalleled experience in insect functional genomics, neuropeptide physiology, synthetic chemistry and synthetic biology, and in field-testing of candidates. Established links to agricultural, horticultural and forestry end-users, agencies/advisors and our SME partners ensure relevance to user need; and set out a pathway to exploitation and implementation of our results, for impact across three major economic sectors in the EU and globally. We will deliver novel, green neuropeptide-based insect pest biocontrol tools by: utilising beyond the State-of-the-Art technologies based on two approaches: rational design of neuropeptide hormone analogues; and development of genetically-encoded neuropeptides for translational insect synthetic biology in genetic pest management. bridging outstanding research and technology in neuroendocrinology and genetics to end user need, to ultimately produce neuropeptide hormone analogues and genetic pest management biocontrol tools. validating and demonstrating these novel insect biocontrol agents in laboratory, field and forest applications, based on user need and a market-driven approach.


A phantom system has a housing (2) with a lower part (3) having an opening in the z-direction and a cover part (4) for closing the opening of the housing (2). A first plate-shaped insert element (10a) has at least one depression (11a) for receiving a liquid substance. The lower part (3) and the cover part (4) delimit a cavity (5) with an insert area (8), which is constituted to receive the first insert element (10a). A first sealing element (14a) seals the first insert element (10a) against the cavity (5) and a fixing facility fixes the first insert element (10a) in the cavity (4) of the housing (2) in an operating state of the MPI phantom. The phantom permits good contrast in MPI, MRI, or CT using liquid contrast media.

Loading Bruker collaborators
Loading Bruker collaborators