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An apparatus of mass flow controlling for use in an integrated gas delivery system, comprising an input terminal, an output terminal, a sensor unit, a flow rate control valve, and a control unit. The control unit comprises an A/D converter, a microprocessor, and a valve control circuit. The A/D converter converts an actual setting signal inputted by the input terminal into a first digital signal, and converts a flow rate detection signal outputted by the sensor unit into a second digital signal. The microprocessor further comprises a storage module, a setting signal calibration module and a calculation module. The valve control circuit generates, based on a control signal, an openness control signal, so as to control the flow rate control valve. It is concluded that the flow rate control quality is improved by the present invention.


Patent
Beijing Sevenstar Electronics Co. | Date: 2014-06-25

An apparatus of mass flow controlling for use in an integrated gas delivery system, comprising an input terminal, a sensor unit, an electromagnetic valve, and a control unit. The control unit comprises an A/D converter, a microprocessor, and a valve control circuit. The A/D converter converts a flow rate setting signal inputted by the input terminal into a first digital signal, and converts a flow rate detection signal outputted by the sensor unit into a second digital signal. The microprocessor further comprises a control module and a calculation module. The valve control circuit opens the electromagnetic valve according to the first control signal only, and further regulates an openness of the electromagnetic valve according to the first control signal and the second control signal. It is concluded that response time of the mass flow control apparatus of the present invention is shorten, and control quality is improved.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention provides a gas-liquid two-phase atomizing cleaning device. The cleaning device comprises a gas-liquid two-phase atomizing spray head. The spray head is a double jacket structure and comprises a nozzle, a rotating arm, a gas guide tube and a liquid guide tube; wherein the nozzle is connected with the rotating arm, the gas guide tube and the liquid guide tube are fixed to the rotating arm, the gas guide tube and the liquid guide tube are both provided with pneumatic valves.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-10-02

The present invention provides a new type flow control system comprising a valve control circuit and a power source circuit. Two terminals of the primary coil of the power source circuit transformer are respectively connected with two power source circuit FETs, the secondary coil of the power source circuit transformer is connected to the voltage output terminal of the power source circuit through a rectification circuit. The gates of the power source circuit FETs are connected with a switching regulator. The AC input terminal of the valve control circuit is connected with a valve control circuit transformer. The primary coil of the valve control circuit transformer is connected with a valve control circuit FET, the secondary coil of the transformer is connected to a mechanical valve through a rectification circuit. A microcontroller outputs PWM signals to the gate of the valve control circuit FET.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention provides a cleaning device resistant to liquid backsplash comprises an upper casing and a lower casing. The upper casing moves upward and downward relative to the lower casing. The upper casing comprises an inner wall, an outer wall, and a hollow cavity formed therebetween. The inner wall is provided with a plurality of liquid inlet apertures which are communicated with the hollow cavity. Through the liquid inlet apertures and the hollow cavity provided in the cleaning device and the cleaning system of the present invention, the chemical liquids and/or particles used are introduced into the hollow cavity via the liquid inlet apertures and discharged via the liquid discharging apertures during the high speed rotation of the wafer so as to achieve better cleaning device.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention relates to the field of semiconductor manufacturing technology, more particularly to a swing spray device of a cleaning apparatus and a cleaning method. The swing spray device comprises a spray arm, a spray head and a driving unit. The spray head is connected with the spray arm, and is controlled to swim by the driving unit. The spray head is hinged with the spray arm to form a first hinge joint. The driving unit is an air cylinder; the piston rod of the air cylinder is connected with the spray head. The piston rod is hinged with the spray head to form a second hinge joint. Therefore, the better cleaning effects can be achieved both in the center and the edge of the wafer.


Patent
BEIJING SEVENSTAR ELECTRONICS Co. | Date: 2014-05-28

A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first.


Patent
BEIJING SEVENSTAR ELECTRONICS Co. | Date: 2014-05-28

A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for dispensing liquid onto a wafer. There is also a dispensing valve for controlling the dispensing of the liquid.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-03-27

The present invention provides an etchant which is a reaction product of sulfuric acid and ammonium persulfate, wherein the concentration of the ammonium persulfate is 125%, the concentration of the sulfuric acid is 98%. The etchant is produced by adding the ammonium persulfate into the sulfuric acid at a temperature of 100 to 200 degree Celsius. According to the present invention, the ammonium persulfate substitute the conventional oxidizing agent of hydrogen peroxide. Since the ammonium persulfate is in a powder form, the operation becomes more convenient. Furthermore, since sulfuric acid is formed as a by-product instead of water, the etchant will not be diluted after being used for many times, which reduces the production cost.


Patent
Beijing Sevenstar Electronics Co. | Date: 2015-12-02

A processing chamber includes a base, a cover, and grippers. The base includes a body, a mating surface, an inner zone cavity extending into the body, a divider substantially surrounding the inner zone cavity, and an outer zone cavity extending into the body and substantially surrounding the divider. The cover includes a mating surface that contacts the body mating surface when the processing chamber is closed. The grippers hold the wafer in the inner zone cavity when the processing chamber is closed.

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