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Patent
Beijing Sevenstar Electronics Co. | Date: 2012-06-13

The present invention provides a liquid storage device relates to the field of semiconductor manufacturing technology comprising: a liquid storage tank, a liquid intake tube, a liquid discharge tube and a gas discharge tube; the liquid intake tube, the liquid discharge tube and the gas discharge tube are all connected with the liquid storage tank; the liquid storage device also comprises a gas compensating tube connected with the liquid storage tank; the gas compensating tube comprises a differential pressure mechanism and a gas storage tank; one end of the differential pressure mechanism is connected with the liquid storage tank, and the other end is connected with the gas storage tank; the differential pressure mechanism is used for controlling the connection or disconnection between the liquid storage tank and the gas storage tank according to the pressure difference therebetween.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-03-27

The present invention provides an etchant which is a reaction product of sulfuric acid and ammonium persulfate, wherein the concentration of the ammonium persulfate is 125%, the concentration of the sulfuric acid is 98%. The etchant is produced by adding the ammonium persulfate into the sulfuric acid at a temperature of 100 to 200 degree Celsius. According to the present invention, the ammonium persulfate substitute the conventional oxidizing agent of hydrogen peroxide. Since the ammonium persulfate is in a powder form, the operation becomes more convenient. Furthermore, since sulfuric acid is formed as a by-product instead of water, the etchant will not be diluted after being used for many times, which reduces the production cost.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-03-27

The present invention provides a liquid replenishing device comprising a liquid storage tank, a chemical liquid supply pipeline, an ultrapure water supply pipeline, an ultrapure water quantitative supplement pipeline and a circulating pipeline. The chemical liquid supply pipeline supplies chemical liquids to the liquid storage tank. The ultrapure water supply pipeline supplies ultrapure water to the liquid storage tank. The ultrapure water quantitative supplement pipeline quantitatively replenishes ultrapure water to the liquid storage tank. One end of the circulating pipeline is connected with the outlet of the liquid storage tank, the other end of the circulating pipeline is connected with the inlet of the liquid storage tank.


Patent
Beijing Sevenstar Electronics Co. | Date: 2012-06-13

The present invention discloses a device for holding disk-shaped articles and a method thereof. The device comprises a rotatable chuck body and at least two groups of clamping elements arranged at the edge of the chuck body. Each of the clamping elements is mounted to a pivot with the chuck body respectively by means of the rotation of the clamping element with respect to the chuck body. A radial compression spring is connected between the bottom of the clamping element and the chuck body to provide a clamping force for the clamping element. The clamping elements in the same group are provided with magnets with the same polarity, while the clamping elements in different groups are provided with magnets with the opposite polarity. Two sets of electromagnets are arranged on the chuck body and spaced apart evenly.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention provides a cleaning device resistant to liquid backsplash comprises an upper casing and a lower casing. The upper casing moves upward and downward relative to the lower casing. The upper casing comprises an inner wall, an outer wall, and a hollow cavity formed therebetween. The inner wall is provided with a plurality of liquid inlet apertures which are communicated with the hollow cavity. Through the liquid inlet apertures and the hollow cavity provided in the cleaning device and the cleaning system of the present invention, the chemical liquids and/or particles used are introduced into the hollow cavity via the liquid inlet apertures and discharged via the liquid discharging apertures during the high speed rotation of the wafer so as to achieve better cleaning device.

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