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Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention provides a gas-liquid two-phase atomizing cleaning device. The cleaning device comprises a gas-liquid two-phase atomizing spray head. The spray head is a double jacket structure and comprises a nozzle, a rotating arm, a gas guide tube and a liquid guide tube; wherein the nozzle is connected with the rotating arm, the gas guide tube and the liquid guide tube are fixed to the rotating arm, the gas guide tube and the liquid guide tube are both provided with pneumatic valves.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-10-02

The present invention provides a new type flow control system comprising a valve control circuit and a power source circuit. Two terminals of the primary coil of the power source circuit transformer are respectively connected with two power source circuit FETs, the secondary coil of the power source circuit transformer is connected to the voltage output terminal of the power source circuit through a rectification circuit. The gates of the power source circuit FETs are connected with a switching regulator. The AC input terminal of the valve control circuit is connected with a valve control circuit transformer. The primary coil of the valve control circuit transformer is connected with a valve control circuit FET, the secondary coil of the transformer is connected to a mechanical valve through a rectification circuit. A microcontroller outputs PWM signals to the gate of the valve control circuit FET.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention provides a cleaning device resistant to liquid backsplash comprises an upper casing and a lower casing. The upper casing moves upward and downward relative to the lower casing. The upper casing comprises an inner wall, an outer wall, and a hollow cavity formed therebetween. The inner wall is provided with a plurality of liquid inlet apertures which are communicated with the hollow cavity. Through the liquid inlet apertures and the hollow cavity provided in the cleaning device and the cleaning system of the present invention, the chemical liquids and/or particles used are introduced into the hollow cavity via the liquid inlet apertures and discharged via the liquid discharging apertures during the high speed rotation of the wafer so as to achieve better cleaning device.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-04-01

The present invention relates to the field of semiconductor manufacturing technology, more particularly to a swing spray device of a cleaning apparatus and a cleaning method. The swing spray device comprises a spray arm, a spray head and a driving unit. The spray head is connected with the spray arm, and is controlled to swim by the driving unit. The spray head is hinged with the spray arm to form a first hinge joint. The driving unit is an air cylinder; the piston rod of the air cylinder is connected with the spray head. The piston rod is hinged with the spray head to form a second hinge joint. Therefore, the better cleaning effects can be achieved both in the center and the edge of the wafer.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-03-27

The present invention provides a liquid replenishing device comprising a liquid storage tank, a chemical liquid supply pipeline, an ultrapure water supply pipeline, an ultrapure water quantitative supplement pipeline and a circulating pipeline. The chemical liquid supply pipeline supplies chemical liquids to the liquid storage tank. The ultrapure water supply pipeline supplies ultrapure water to the liquid storage tank. The ultrapure water quantitative supplement pipeline quantitatively replenishes ultrapure water to the liquid storage tank. One end of the circulating pipeline is connected with the outlet of the liquid storage tank, the other end of the circulating pipeline is connected with the inlet of the liquid storage tank.


Patent
BEIJING SEVENSTAR ELECTRONICS Co. | Date: 2014-05-28

A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first.


Patent
BEIJING SEVENSTAR ELECTRONICS Co. | Date: 2014-05-28

A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for dispensing liquid onto a wafer. There is also a dispensing valve for controlling the dispensing of the liquid.


Patent
Beijing Sevenstar Electronics Co. | Date: 2013-03-27

The present invention provides an etchant which is a reaction product of sulfuric acid and ammonium persulfate, wherein the concentration of the ammonium persulfate is 125%, the concentration of the sulfuric acid is 98%. The etchant is produced by adding the ammonium persulfate into the sulfuric acid at a temperature of 100 to 200 degree Celsius. According to the present invention, the ammonium persulfate substitute the conventional oxidizing agent of hydrogen peroxide. Since the ammonium persulfate is in a powder form, the operation becomes more convenient. Furthermore, since sulfuric acid is formed as a by-product instead of water, the etchant will not be diluted after being used for many times, which reduces the production cost.


Patent
Beijing Sevenstar Electronics Co. | Date: 2015-12-02

A processing chamber includes a base, a cover, and grippers. The base includes a body, a mating surface, an inner zone cavity extending into the body, a divider substantially surrounding the inner zone cavity, and an outer zone cavity extending into the body and substantially surrounding the divider. The cover includes a mating surface that contacts the body mating surface when the processing chamber is closed. The grippers hold the wafer in the inner zone cavity when the processing chamber is closed.


Patent
Beijing Sevenstar Electronics Co. | Date: 2012-06-13

The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.

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