AZ Electronic | Date: 2015-04-22
A copolymerized polysilazane comprising at least repeating units represented by general formula (I): Si(R^(1))(R^(2))NR^(3) and repeating units represented by general formula (II): Si(R^(1))(R^(2))NH (in the formulas, R^(1 )and R^(2 )each independently represent a hydrogen atom, hydrocarbon group, hydrocarbon group-containing silyl group, hydrocarbon group-containing amino group, or hydrocarbon oxy group, and R^(3 )represents an alkyl group, alkenyl group, alkoxy group, cycloalkyl group, aryl group or alkyl silyl group), and the NR^(3)/SiH_(1,2 )ratio (SiH_(1,2 )represents the total amount of SiH_(1 )and SiH_(2)) is 0.005-0.3. Said copolymerized polysilazane can be manufactured by reacting Si(R^(1))(R^(2))X_(2 )(in the formula, X represents a halogen atom) with a primary amine compound: R^(3)NH_(2 )and then reacting with ammonia, and is able to form a siliceous film that has withstand voltage characteristics and solvent resistance by curing at a low temperature.
AZ Electronic | Date: 2015-05-19
[Object] To provide compositions for forming a top coat layer capable of forming patterns with an excellent roughness and pattern shape in a pattern formation method by exposure to extreme ultraviolet rays, and a pattern formation method using the composition. [Means for solving problem] Provided are compositions for forming a top coat layer comprises an aromatic compound having an aromatic hydroxyl group and an aqueous solvent; and a method of forming patterns by applying the composition onto the resist surface and subjecting the resultant to exposure and development. This composition can further comprise binders.
Lopez-Jimenez F.,AZ Electronic
Mayo Clinic proceedings | Year: 2014
The American College of Cardiology/American Heart Association (ACC/AHA) Task Force on Practice Guidelines has recently released the new cholesterol treatment guideline. This update was based on a systematic review of the evidence and replaces the previous guidelines from 2002 that were widely accepted and implemented in clinical practice. The new cholesterol treatment guideline emphasizes matching the intensity of statin treatment to the level of atherosclerotic cardiovascular disease (ASCVD) risk and replaces the old paradigm of pursuing low-density lipoprotein cholesterol targets. The new guideline also emphasizes the primacy of the evidence base for statin therapy for ASCVD risk reduction and lists several patient groups that will not benefit from statin treatment despite their high cardiovascular risk, such as those with heart failure (New York Heart Association class II-IV) and patients undergoing hemodialysis. The guideline has been received with mixed reviews and significant controversy. Because of the evidence-based nature of the guideline, there is room for several questions and uncertainties on when and how to use lipid-lowering therapy in clinical practice. The goal of the Mayo Clinic Task Force in the assessment, interpretation, and expansion of the ACC/AHA cholesterol treatment guideline is to address gaps in information and some of the controversial aspects of the newly released cholesterol management guideline using additional sources of evidence and expert opinion as needed to guide clinicians on key aspects of ASCVD risk reduction. Copyright © 2014 Mayo Foundation for Medical Education and Research. Published by Elsevier Inc. All rights reserved.
AZ Electronic | Date: 2015-02-27
A hybrid material for light emitting diodes, comprising [SiR^(1)R^(2)NR^(3)]_(x)(I) [SiHR^(4)NR^(5)]_(y)(II) wherein the symbols and indices have the following meanings:
Hitachi Kokusai Electrical Inc. and AZ Electronic | Date: 2015-05-08
There is provided a substrate processing method, including: (a) loading a substrate into a processing vessel having a pre-baked film containing a silazane bond; (b) heating the substrate to a first temperature and supplying a process gas to the heated substrate; and (c) heating the substrate to which the process gas has been supplied, to a second temperature which is higher than the first temperature and less than or equal to a temperature at which the pre-bake has been performed.
AZ Electronic | Date: 2014-12-08
[Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane. [Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when ^(1)H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH_(1,2 )based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
AZ Electronic | Date: 2014-02-19
The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
AZ Electronic | Date: 2014-02-14
The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The compositions and processes are useful for fabrication of electronic devices. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R_(1 )is selected from the group consisting of a C_(1)-C_(8 )alkyl, C_(1)-C_(8 )fluoroalkyl moiety, C_(1)-C_(8 )partially fluorinated alkyl, C_(4)-C_(8 )cycloalkyl, C_(4)-C_(8 )cyclofluoroalkyl, C_(4)-C_(8 )partially fluorinated cycloalkyl, and a C_(2)-C_(8 )hydroxyalkyl; R_(2), R_(3 )and R_(5 )are independently selected from a group consisting of H, C_(1)-C_(4 )alkyl, CF_(3 )and F; R_(4 )is selected from the group consisting of H, C_(1)-C_(8 )alkyl, C_(1)-C_(8 )partially fluorinated alkyl and C_(1)-C_(8 )fluoroalkyl, n ranges from 1 to 5, R_(6 )is selected from the group consisting of H, F, C_(1)-C_(8 )alkyl and a C_(1)-C_(8 )fluoroalkyl and m ranges from 1 to 3.
AZ Electronic | Date: 2015-09-02
A hybrid material for light emitting diodes, comprisinga) an organopolysilazane material, comprising repeating units of formulae (I) and (II)R^(1) is C_(2)-C_(6)-alkenyl or C_(4)-C_(6)-alkadienyl;R^(2) is H or an organic group;R^(3) is H or an organic group;R^(4) is H or an organic group;R^(5) is H or an organic group;x is 0.001 to 0.2; andy is 2x to (1-x),with the proviso that x+y1 and that y can be 0 if R^(2) is H, andb) inorganic nanoparticles having a mean diameterin the range of from 1 to 30 nm,which are surface modified with a capping agent comprising a C_(1)-C_(18)-alkyl and/or C_(1)-C_(18)-alkenyl group,is useful as encapsulation material for LEDs.
Samsung and AZ Electronic | Date: 2015-07-16
A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L_(11 )is selected from a single bond, a C_(1)-C_(10 )alkylene group, a C_(2)-C_(10 )alkenylene group, and a C_(2)-C_(10 )alkynylene group; and R_(11 )is selected from a C_(6)-C_(15 )aryl group, or a C_(6)-C_(15 )aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C_(1)-C_(10 )alkyl group, a C_(1)-C_(10 )alkoxy group, and a C_(6)-C_(15 )aryl group.