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Owariasahi, Japan

The disclosed electrostatic coating system (

Asahi Sunac Corporation | Date: 2015-06-26

Paint spraying booths of metal. Painting machines and apparatus. Paint spraying booths not of metal.

Asahi Sunac Corporation | Date: 2012-10-03

An electrostatic spraying device includes a device body having a paint supply passage connected to a paint supply source, a paint nozzle located on a distal end of device body and having a paint flow passage communicating with the paint supply passage and a paint outlet formed through a distal end of the paint flow passage, a high-voltage generating part which generates high voltage with which paint sprayed from the paint outlet is charged, and a high-voltage electrode to which the high voltage generated by the high voltage generating part is applied. The high-voltage electrode is disposed at a position a predetermined distance backwardly away from the paint outlet on an outer periphery of the device body, so as to be separated from the paint flow passage thereby to be insulated from the paint flow passage.

Murata M.,Kyushu University | Doi T.,Kyushu University | Kurokawa S.,Kyushu University | Ohnishi O.,Kyushu University | And 5 more authors.
Proceedings of the 6th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2011 | Year: 2011

This research aims to change the coating method to fabricate organic thin film solar cells from the conventional spin system to spray system. In the spray coating method, sprayed solution consists of poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61 butyric acid methyl ester (PCBM) for solute, and mono chlorobenzene (MCB) for solvent. This paper presents the effect of spray conditions on the deposited organic film characteristics experimentally. As a result, the optimum spray conditions from a viewpoint of discharge rate, spray distance and air pressure were proposed. Moreover, the effect of temperature and humidity as deposition environment was discussed. Finally, several advantages of the spray coating method were performed through the experimental examination. Source

Seike Y.,Asahi Sunac Corporation | Miyachi K.,Asahi Sunac Corporation | Kurokawa S.,Kyushu University | Ohnishi O.,Kyushu University | Doi T.,Kyushu University
Advanced Metallization Conference (AMC) | Year: 2010

A liquid aerosol, which sprays cleaning liquid with a carrier gas, is widely used for cleaning semiconductor devices. The liquid aerosol using a conventional two-fluid nozzle may cause pattern damage on the wafer. To resolve this problem, we have made a prototype new rotary atomizing two-fluid cleaning nozzle (RAC nozzle), which can control the velocity distribution and size distribution of flying liquid droplets separately. It could be atomized to 20 μm or less at a rotational speed of the air turbine of 50,000 min -1 and that the mean velocity of the flying liquid droplets could be controlled in the range under 65 m/s independently. It was confirmed in a cleaning experiment using polystyrene latex (PSL) particles on a wafer that particle removal efficiency increased when shaping air pressure increased. Also, the particle removal efficiency was improved with the finer atomization promoted by a higher rotational speed of the air turbine. Source

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