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Fort Collins, CO, United States

Patent
Advanced Energy Industries Inc. | Date: 2015-07-20

This disclosure describes systems, methods, and apparatus for operating a plasma processing chamber. In particular, a periodic voltage function combined with an ion current compensation can be provided as a bias to a substrate support as a modified periodic voltage function. This in turn effects a DC bias on the surface of the substrate that controls an ion energy of ions incident on a surface of the substrate. A peak-to-peak voltage of the periodic voltage function can control the ion energy, while the ion current compensation can control a width of an ion energy distribution function of the ions. Measuring the modified periodic voltage function can provide a means to calculate an ion current in the plasma and a sheath capacitance of the plasma sheath. The ion energy distribution function can be tailored and multiple ion energy peaks can be generated, both via control of the modified periodic voltage function.


Patent
Advanced Energy Industries Inc. | Date: 2015-06-05

An impedance matching network having a plurality of reactance elements is disclosed. Each of the plurality of switching circuits comprises a first node and a second node; a first diode having an anode coupled to the first node and a cathode coupled to the second node; a second diode having an anode to couple to the second voltage line and a cathode to couple to the first node; and a transistor having a first, second, and control terminals. Each of the plurality of reactance elements is switched into the impedance matching network when the transistor in the respective one of the plurality of switching circuits is on and switched out after the transistor in the respective one of the plurality of switching circuits is off.


Patent
Advanced Energy Industries Inc. | Date: 2015-06-16

This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.


Patent
Advanced Energy Industries Inc. | Date: 2015-03-24

Systems and methods for adjusting the source impedance of a generator are disclosed. An exemplary method includes generating a first signal and applying the first signal to a first input of a combiner, generating a second signal and applying the second signal to a second input of said combiner, and combining the first and second signals with the combiner at an output of the combiner to produce power that is delivered to the plasma load. A controllable variable impedance is provided to an isolation port of the combiner, and the controllable variable impedance is adjusted to vary the source impedance of the generator.


This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the loads impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

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