ADEKA Corporation

Japan

ADEKA Corporation

Japan

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Patent
Adeka Corporation | Date: 2015-05-12

A method for loading a support with a compound in an organic solvent, characterized in that the organic solvent contains an amine. The organic solvent preferably has a hydroxy group. The compound preferably has at least one of carboxyl, sulfonic, phosphoric, phosphonic, and alkoxysilyl groups. The support is preferably a metal oxide, such as titanium oxide, zinc oxide, or aluminum oxide. The resulting compound-loaded support is suited for use as an electrode.


Patent
Adeka Corporation | Date: 2017-05-24

Provided is a photosensitive composition employing, as a photopolymerization initiator, a compound useful as a highly-sensitive photopolymerization initiator that has excellent stability and low sublimability, and that efficiently absorbs and is activated by near-ultraviolet rays at, for example, 365 nm. A photosensitive composition includes a photopolymerization initiator including General Formula (I) below (A), and a polymerizable compound having an ethylenically unsaturated bond (B). Preferred, among compounds represented by General Formula (I), are compounds in which R^(10) is a hydrogen atom, or a C_(1-12) alkyl group that is not substituted or that is substituted by a hydroxyl group, a carboxyl group, a halogen atom, a cyano group, or a nitro group.


Provided is an -aminoalkylphenone compound that has good stability and low sublimability, efficiently generates radicals when irradiated with a bright line at 365 nm (i line) or the like, and is useful as a polymerization initiator to be used in a radically polymerizable composition. The -aminoalkylphenone compound is represented by Formula (I) mentioned below. In Formula (I) mentioned above, it is preferable that R^(11) is a nitro group, an alkoxy group having 1 to 12 carbon atoms, or an alkoxycarbonyl group having 1 to 12 carbon atoms. The -aminoalkylphenone compound can be preferably used in a polymerization initiator.


The alkoxide compound of the present invention is characteristically represented by the following general formula (I) :


The present invention provides an antioxidant for a thermoplastic resin that provides an excellent oxidation-preventing effect to a thermoplastic resin and that has an excellent effect of preventing a change in color caused by nitrogen oxides. Specifically, a compound represented by any of General Formulae (2) to (4), particularly a compound in which R^(2) in the formulae is an alkyl group having 1 to 8 carbon atoms whose terminal on an oxygen atom side is linked with -CO-O-, is used as the antioxidant for a thermoplastic resin. Details of General Formulae (2) to (4) are as described in the description.


Provided are: an antistatic agent and an antistatic agent composition which are capable of providing excellent antistatic effect in a small amount and have sufficient persistence and wiping resistance; and an antistatic resin composition and a molded article using the same. The antistatic agent includes a polymer compound (E) having a structure in which a diol, a dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and a polycarboxylic acid compound (D) are bound via ester bonds:-CH_(2)-CH_(2)-O-(1)


Provided are: an antistatic agent and an antistatic agent composition which are capable of providing excellent antistatic effect in a small amount and have sufficient persistence and wiping resistance without impairing the intrinsic physical properties of a resin; and an antistatic resin composition and a molded article using the same. The antistatic agent includes a polymer compound (E) having a structure in which a diol, an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and an epoxy compound (D) having two or more epoxy groups are bound via ester bonds:


Provided are a heterostructured nickel compound including a nickel amidinate ligand and an aliphatic alkoxy group and a method of forming a thin film including the heterostructured nickel compound. The method includes forming a nickel-containing layer on a substrate by using the heterostructured nickel compound including the nickel amidinate ligand and the aliphatic alkoxy group.


Provided are: an antistatic agent and an antistatic agent composition which are capable of providing excellent antistatic effect in a small amount and have sufficient persistence and wiping resistance without impairing the intrinsic physical properties of a resin; and an antistatic resin composition and a molded article using the same. The antistatic agent includes a polymer compound (E) having a structure in which a diol, an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and a polyhydric alcohol (D) having three or more hydroxyl groups are bound via ester bonds:


Provided are: a thermal stabilizer composition which does not generate an odor of a phosphorus-based antioxidant; and a synthetic resin composition comprising the same. The thermal stabilizer composition comprises: 100 parts by mass of a phosphorus-based antioxidant having a phosphite structure; and 0.001 to 10 parts by mass of a phenolic antioxidant having a substructure represented by the following Formula (1):^(1), R^(2), R^(3) and R^(4) each independently represent a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; a represents an integer of 0 to 2; and, when a is 2, plural R^(3)s are optionally the same or different).

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