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Provided herein are methods of forming thin films. In some embodiments, to form a thin film, a precursor adsorption layer including an organic ligand is formed by supplying a precursor including a metal or silicon central atom, and the organic ligand onto a lower structure. An intermediate result layer is formed by supplying a non-oxidant onto the precursor adsorption layer. In forming the intermediate result layer, the organic ligand included in the precursor adsorption layer is substituted with a substituent. An oxide film including the central atom is formed from the intermediate result layer by supplying an oxidant onto the intermediate result layer.

Adeka Corporation | Date: 2015-03-18

A laminate of layered substances each containing two or more kinds of elements as constituent elements is contained in an ionic liquid containing a specific cation, and the ionic liquid containing the laminate is irradiated with one or both of sonic waves and electric waves.

An alkoxide compound is represented by General Formula (I) below: wherein R^(1 )to R^(3 )each independently represent hydrogen, a C_(1-12 )hydrocarbon group, etc.; R^(4 )represents a C_(1-12 )hydrocarbon group, etc.; L represents hydrogen, halogen, a hydroxyl group, an amino group, an azi group, a phosphido group, a nitrile group, a carbonyl group, a C_(1-12 )hydrocarbon group, etc.; and M represents a metal atom or a silicon atom, n represents an integer of 1 or more, m represents an integer of 0 or more, and n+m represents the valence of the metal atom or silicon atom.

Adeka Corporation | Date: 2015-05-12

A method for loading a support with a compound in an organic solvent, characterized in that the organic solvent contains an amine. The organic solvent preferably has a hydroxy group. The compound preferably has at least one of carboxyl, sulfonic, phosphoric, phosphonic, and alkoxysilyl groups. The support is preferably a metal oxide, such as titanium oxide, zinc oxide, or aluminum oxide. The resulting compound-loaded support is suited for use as an electrode.

Adeka Corporation | Date: 2017-05-24

Provided is a photosensitive composition employing, as a photopolymerization initiator, a compound useful as a highly-sensitive photopolymerization initiator that has excellent stability and low sublimability, and that efficiently absorbs and is activated by near-ultraviolet rays at, for example, 365 nm. A photosensitive composition includes a photopolymerization initiator including General Formula (I) below (A), and a polymerizable compound having an ethylenically unsaturated bond (B). Preferred, among compounds represented by General Formula (I), are compounds in which R^(10) is a hydrogen atom, or a C_(1-12) alkyl group that is not substituted or that is substituted by a hydroxyl group, a carboxyl group, a halogen atom, a cyano group, or a nitro group.

Provided is an -aminoalkylphenone compound that has good stability and low sublimability, efficiently generates radicals when irradiated with a bright line at 365 nm (i line) or the like, and is useful as a polymerization initiator to be used in a radically polymerizable composition. The -aminoalkylphenone compound is represented by Formula (I) mentioned below. In Formula (I) mentioned above, it is preferable that R^(11) is a nitro group, an alkoxy group having 1 to 12 carbon atoms, or an alkoxycarbonyl group having 1 to 12 carbon atoms. The -aminoalkylphenone compound can be preferably used in a polymerization initiator.

The alkoxide compound of the present invention is characteristically represented by the following general formula (I) :

The present invention provides an antioxidant for a thermoplastic resin that provides an excellent oxidation-preventing effect to a thermoplastic resin and that has an excellent effect of preventing a change in color caused by nitrogen oxides. Specifically, a compound represented by any of General Formulae (2) to (4), particularly a compound in which R^(2) in the formulae is an alkyl group having 1 to 8 carbon atoms whose terminal on an oxygen atom side is linked with -CO-O-, is used as the antioxidant for a thermoplastic resin. Details of General Formulae (2) to (4) are as described in the description.

A tantalum compound, a method of forming a thin film, and a method of fabricating an integrated circuit device, the tantalum compound being represented by the following General Formula (I):

Provided are: an antistatic agent and an antistatic agent composition which are capable of providing excellent antistatic effect in a small amount and have sufficient persistence and wiping resistance without impairing the intrinsic physical properties of a resin; and an antistatic resin composition and a molded article using the same. The antistatic agent includes a polymer compound (E) having a structure in which a diol, an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and an epoxy compound (D) having two or more epoxy groups are bound via ester bonds:

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