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Dhuey S.,Lawrence Berkeley National Laboratory | Peroz C.,Abeam TechNologies, Inc. | Olynick D.,Lawrence Berkeley National Laboratory | Calafiore G.,Lawrence Berkeley National Laboratory | Cabrini S.,Lawrence Berkeley National Laboratory
Nanotechnology | Year: 2013

A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography. © 2013 IOP Publishing Ltd.

Peroz C.,Abeam TechNologies, Inc. | Dhuey S.,Lawrence Berkeley National Laboratory | Volger M.,Micro Resist Technology GmbH | Wu Y.,Oxford Instruments | And 2 more authors.
Nanotechnology | Year: 2010

A step and repeat UV nanoimprint lithography process on pre-spin coated resist film is demonstrated for patterning a large area with features sizes down to sub-15 nm. The high fidelity between the template and imprinted structures is verified with a difference in their line edge roughness of less than 0.5 nm (3s deviation value). The imprinted pattern's residual layer is well controlled to allow direct pattern transfer from the resist into functional materials with very high resolution. The process is suitable for fabricating numerous nanodevices. © 2010 IOP Publishing Ltd.

Shin Y.J.,University of Michigan | Pina-Hernandez C.,University of Michigan | Pina-Hernandez C.,Abeam TechNologies, Inc. | Wu Y.-K.,University of Michigan | And 2 more authors.
Nanotechnology | Year: 2012

In this study, we report a new method to fabricate a wire grid polarizer (WGP) that greatly relaxes the requirement on patterning and etching, and can be easily applied to produce flexible WGPs. The technique is to pattern a high aspect ratio and narrow linewidth grating by nanoimprint lithography followed by two angled aluminum depositions in opposite directions to produce the narrow spacing between the aluminum lines required for a visible band WGP. Anisotropic reactive ion etching is used to remove the aluminum deposited at the top of the grating but leave the aluminum layer on the grating sidewalls, thereby forming a metal wire grid with much smaller spacings than a lithographically defined grating. As a result, the fabricated WGP showed good performance in a wide range of visible wavelength. © 2012 IOP Publishing Ltd.

Agency: Department of Energy | Branch: | Program: STTR | Phase: Phase II | Award Amount: 999.99K | Year: 2015

Metrology is a multi-billion dollar industry that is an indispensable part of science and manufacturing. A variety of techniques including interferometric microscopes, scanning electron microscopes (SEM), X-ray, and atomic force microscopes (AFM) are used in X-ray mirror manufacturing. The performance of any tool directly depends on the ability to characterize and tune it. Modulation Transfer Function (MTF) is the most comprehensive characteristic of any tool; however, it is rarely used because of the complexity of its implementation. There are no suitable test samples with the required spatial frequencies or software. The objective of this proposal is to develop and commercialize an automatic, turn-key solution to enable the calibration of top level metrological instrumentation used in the manufacturing of X-ray optical elements as well as in many other areas of metrology and nanosciences. The heart of this project lies in the design and fabrication of ideal test samples based on pseudo- random line widths. The power spectra of such samples are inherently flat. Any deviation of the measured data from the flat spectra characterizes the signature of the instrument over its entire dynamic range. We have successfully used nanofabrication technology to fabricate a variety of test samples; the worlds best resolution of 1.5 nm lines was achieved. The developed technique was applied to optimally focus and verify the super-high resolution of soft x-ray microscopes, and to precisely calibrate the instruments. The best ever resolution of soft x-ray microscopes was achieved when using our test samples. A variety of test samples suitable for the calibration of TEMs, SEMs, AFMs, optical microscopes and interferometers were also developed and fabricated. The fabrication technology has progressed so immensely: test samples with a resolution down to 250 nm demonstrated in the past are now extended to a resolution of 30 nm. All the test samples were measured using metrology instruments. In Phase II, a turnkey solution will be developed: Fabrication technologies based on nanoimprint will be developed to enable inexpensive manufacturing of pseudo-random test samples for each type of instrumentation, fully automatic software will be developed to calibrate a variety of metrological instrumentation; the software will be adjusted and tuned for each kind of instrumentation. The worlds top companies highly valued our results, requesting the test samples and software immediately after they become commercially available. The solution will improve reliability, exclude the "human factor," and simplify and expedite the calibration. This new technology fits perfectly into aBeam's existing line of products, which are used mostly for metrology and nanofabrication.

Agency: Department of Defense | Branch: Air Force | Program: STTR | Phase: Phase I | Award Amount: 99.71K | Year: 2011

ABSTRACT: aBeam Technologies, Inc. proposes a new type of miniature spectrometer based on digital planar holography (DPH). This may lead to a revolution in optics, similar to the transition from electron tubes to integrated circuits in electronics. The spectrometer is an optical chip just a few millimeters in size; it can be implemented to detect any desired substance. The spectrometer can potentially be integrated with microfluidic circuitry into a laboratory-on-chip or even into cell phones. The fabrication method is compatible with micro/nanofabrication technology, which makes the production inexpensive. We have demonstrated the principle of DPH. The goal of this project is to demonstrate the new class of spectrometer-on-chip with functionality unattainable by common spectrometers, to design and fabricate a spectrometer with ultrahigh resolution in multiple, separated wavelength ranges. This type of device will be ideal for sensing specific materials, for example, for detecting biological and chemical hazards. BENEFIT: Our approach will revolutionize the applications of photo-spectrometers by greatly miniaturizing the sizes of sensors, decreasing their cost, and improving their sensitivity. The first targeted application will be the handheld, low-cost Laser Induced Breakdown Spectroscopy system. It will then be expanded into other areas of spectrometers, such as Raman spectroscopy and for development of laboratory-on-chip. There is a potential for spectrometers-on-chip to be implemented within cell phones for specific biological or chemical hazard detection.

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